Abstract: Provided is a hydrocracking process with a recycle loop for converting a petroleum feed to lower boiling products, which process comprises reacting a stream over a non-zeolite noble metal catalyst at a temperature of about 650° F. (343° C.) or less in a reactor positioned in the recycle loop of the hydrocracking reactor.

Abstract: A securing apparatus configured to mount a data storage device in an enclosure includes a shielding assembly configured to be secured to a panel of the enclosure and a sliding pole. The shielding assembly includes a frame and a rotating plate rotatably mounted to the frame. The sliding pole is slidably mounted to the frame and defines a plurality of latching slots. The frame defines an aperture for the data storage device to pass through; the rotating plate comprises a plurality of hooks. The sliding pole is slidable relative to the frame to engage the hooks in the latching slots. The rotating plate is secured to the frame and shields the aperture, preventing the data storage device from being taken out of the enclosure.

Abstract: A securing apparatus configured to mount a data storage device in an enclosure includes a shielding assembly configured to be secured to a panel of the enclosure and a sliding pole. The shielding assembly includes a frame and a rotating plate rotatably mounted to the frame. The sliding pole is slidably mounted to the frame and defines a plurality of latching slots. The frame defines an aperture for the data storage device to pass through; the rotating plate comprises a plurality of hooks. The sliding pole is slidable relative to the frame to engage the hooks in the latching slots. The rotating plate is secured to the frame and shields the aperture, preventing the data storage device from being taken out of the enclosure.

Abstract: Example embodiments relate to an overlay measurement device and method of forming an overlay pattern. The overlay measurement device includes a tray part with a substrate having a first region and a second region, a measurement part which measures an overlay of a first or second element, and a processor part which receives data measured by the measurement part and corrects the position of the first or second element, wherein the substrate comprises a first layer comprising the first overlay marks, a second layer comprising the second overlay marks, which intersects the first direction, in the second region and not comprising overlay marks which are used to measure the overlay of the second element; and the photoresist pattern which is formed on the first and second layers and overlaps the first and second overlay marks.