Patents by Inventor Bikram Baidva

Bikram Baidva has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photolithography mask design simplification
    Patent number: 8881071
    Abstract: A photolithography mask design is simplified. In one example, a target mask design is optimized for a photolithography mask. Medial axes of the design and assist features on the optimized mask are identified. These are simplified to lines. Lines that are distant from a respective design feature are pruned. The remaining lines are simplified and then thickened to form assist features.
    Type: Grant
    Filed: December 29, 2011
    Date of Patent: November 4, 2014
    Assignee: Intel Corporation
    Inventors: Vivek K. Singh, Bikram Baidva, Omkar S. Dandekar, Hale Erten