Patents by Inventor Bikram Baidya

Bikram Baidya has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Sub-wavelength diffractive elements to reduce corner rounding
    Patent number: 7892706
    Abstract: The present invention discloses a mask including: a first region near a corner of a feature, the first region including a first element, the first element being transparent to a light, the first element having a side that is smaller than a wavelength of said light; a second region near the corner of the feature, the second region including a second element, the second element being transparent to the light, the second element having a side that is smaller than the wavelength of the light; and a third region near the corner of the feature, the third region including a third element, the third element being opaque to the light, the third element having a side that is smaller than the wavelength of the light.
    Type: Grant
    Filed: December 19, 2008
    Date of Patent: February 22, 2011
    Assignee: Intel Corporation
    Inventors: Bikram Baidya, Vivek Singh, Yan Borodovsky
  • Sub-wavelength diffractive elements to reduce corner rounding
    Patent number: 7611806
    Abstract: The present invention discloses a mask including: a first region near a corner of a feature, the first region including a first element, the first element being transparent to a light, the first element having a side that is smaller than a wavelength of said light; a second region near the corner of the feature, the second region including a second element, the second element being transparent to the light, the second element having a side that is smaller than the wavelength of the light; and a third region near the corner of the feature, the third region including a third element, the third element being opaque to the light, the third element having a side that is smaller than the wavelength of the light.
    Type: Grant
    Filed: September 30, 2005
    Date of Patent: November 3, 2009
    Assignee: Intel Corporation
    Inventors: Bikram Baidya, Vivek Singh, Yan Borodovsky
  • Sub-wavelength diffractive elements to reduce corner rounding
    Publication number: 20090148779
    Abstract: The present invention discloses a mask including: a first region near a corner of a feature, the first region including a first element, the first element being transparent to a light, the first element having a side that is smaller than a wavelength of said light; a second region near the corner of the feature, the second region including a second element, the second element being transparent to the light, the second element having a side that is smaller than the wavelength of the light; and a third region near the corner of the feature, the third region including a third element, the third element being opaque to the light, the third element having a side that is smaller than the wavelength of the light.
    Type: Application
    Filed: December 19, 2008
    Publication date: June 11, 2009
    Inventors: Bikram Baidya, Vivek Singh, Yan Borodovsky
  • Sub-wavelength diffractive elements to reduce corner rounding
    Publication number: 20070077500
    Abstract: The present invention discloses a mask including: a first region near a corner of a feature, the first region including a first element, the first element being transparent to a light, the first element having a side that is smaller than a wavelength of said light; a second region near the corner of the feature, the second region including a second element, the second element being transparent to the light, the second element having a side that is smaller than the wavelength of the light; and a third region near the corner of the feature, the third region including a third element, the third element being opaque to the light, the third element having a side that is smaller than the wavelength of the light.
    Type: Application
    Filed: September 30, 2005
    Publication date: April 5, 2007
    Inventors: Bikram Baidya, Vivek Singh, Yan Borodovsky
  • Determining an optimizaton for generating a pixelated photolithography mask with high resolution imaging capability
    Publication number: 20070006113
    Abstract: A pixelated photolithography mask is optimized for high resolution microelectronic processing. In one embodiment, the invention includes synthesizing a pixelated photolithography mask, applying a pixel flipping function to the mask, comparing the resulting mask to a desired result, and synthesizing an optimized pixelated binary photolithography mask using the function.
    Type: Application
    Filed: June 30, 2005
    Publication date: January 4, 2007
    Inventors: Bin Hu, Vivek Singh, Bikram Baidya, Kenny Toh, Srinivas Bollepalli, Yan Borodovsky