Patents by Inventor Bikrsm Baidva

Bikrsm Baidva has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • PHOTOLITHOGRAPHY MASK DESIGN SIMPLIFICATION
    Publication number: 20140237434
    Abstract: A photolithography mask design in simplified. In one example, a target mask design is optimized for a photolithography mask. Medial axes of the design and assist features on the optimized mask are identified. These are simplified to lines. Lines that are distant from a respective design feature are pruned. The remaining lines are simplified and then thickened to form assist features.
    Type: Application
    Filed: December 29, 2011
    Publication date: August 21, 2014
    Inventors: Vivek K. Singh, Bikrsm Baidva, Omkar S. Dandekar, Hale Erten