Patents by Inventor Bill Bowden

Bill Bowden has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for selective removal of organometallic and organosilicon residues and damaged oxides using anhydrous ammonium fluoride solution
    Patent number: 5320709
    Abstract: A method for selectively removing oxidized organometallic residues, oxidized organosilicon residues, native oxides, and damaged oxides created in plasma-etching through emersion of plasma-etched silicon wafers in a solution of anhydrous ammonium fluoride and a polyhydric alcohol, which is substantially free of hydrogen fluoride and water.
    Type: Grant
    Filed: February 24, 1993
    Date of Patent: June 14, 1994
    Assignee: Advanced Chemical Systems International Incorporated
    Inventors: Bill Bowden, Debbie Switalski