Patents by Inventor Bill Pierson

Bill Pierson has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • System and method for field-by-field overlay process control using measured and estimated field parameters
    Patent number: 10466596
    Abstract: The present disclosure is directed to a method of determining at least one correctable for a process tool. In an embodiment, the method includes the steps of: measuring one or more parameter values at one or more measurement locations of each field of a selection of measured fields of a wafer; estimating one or more parameter values for one or more locations of each field of a selection of unmeasured fields of the wafer; and determining at least one correctable for a process tool based upon the one or more parameter values measured at the one or more measurement locations of each field of the selection of measured fields of the wafer and the one or more parameter values estimated for the one or more locations of each field of the selection of unmeasured fields of the wafer.
    Type: Grant
    Filed: February 21, 2014
    Date of Patent: November 5, 2019
    Assignee: KLA-Tencor Corporation
    Inventors: Bill Pierson, Ramkumar Karur-Shanmugam, Chin-Chou Huang, Ady Levy, John Charles Robinson
  • Focus monitoring method using asymmetry embedded imaging target
    Patent number: 9466100
    Abstract: A method for monitoring mask focus includes measuring profile asymmetries in a target feature including sub-resolution assist features and deriving a focus response based on a known correlation between the profile and focus of a corresponding mask. A computer system in a lithographic process may adjust mask focus based on such derived information to conform to a desired fabrication process.
    Type: Grant
    Filed: June 3, 2013
    Date of Patent: October 11, 2016
    Assignee: KLA-Tencor Corporation
    Inventors: DongSub Choi, Bill Pierson, David Tien, James Manka, Dongsuk Park
  • System and Method for Field-By-Field Overlay Process Control Using Measured and Estimated Field Parameters
    Publication number: 20150241790
    Abstract: The present disclosure is directed to a method of determining at least one correctable for a process tool. In an embodiment, the method includes the steps of: measuring one or more parameter values at one or more measurement locations of each field of a selection of measured fields of a wafer; estimating one or more parameter values for one or more locations of each field of a selection of unmeasured fields of the wafer; and determining at least one correctable for a process tool based upon the one or more parameter values measured at the one or more measurement locations of each field of the selection of measured fields of the wafer and the one or more parameter values estimated for the one or more locations of each field of the selection of unmeasured fields of the wafer.
    Type: Application
    Filed: February 21, 2014
    Publication date: August 27, 2015
    Applicant: KLA-Tencor Corporation
    Inventors: Bill Pierson, Ramkumar Karur-Shanmugam, Chin-Chou Huang, Ady Levy, John Charles Robinson
  • Focus Monitoring Method Using Asymmetry Embedded Imaging Target
    Publication number: 20130336572
    Abstract: A method for monitoring mask focus includes measuring profile asymmetries in a target feature including sub-resolution assist features and deriving a focus response based on a known correlation between the profile and focus of a corresponding mask. A computer system in a lithographic process may adjust mask focus based on such derived information to conform to a desired fabrication process.
    Type: Application
    Filed: June 3, 2013
    Publication date: December 19, 2013
    Inventors: DongSub Choi, Bill Pierson, David Tien, James Manka, Dongsuk Park