Abstract: An apparatus for measuring a plasma parameter in a plasma processing reactor comprises a probe including a dielectric tube, a coaxial cable inserted in the dielectric tube, the coaxial cable having an open antenna tip, and a plurality of spacers disposed between the coaxial cable and the dielectric tube. The plurality of spacers define a plurality of ducts through which a cooling fluid is adapted to be circulated to control a temperature of the probe.

Abstract: An apparatus for measuring plasma density of a plasma processing reactor, comprises a probe having a dielectric tube with a coaxial cable inserted therein. The coaxial cable has an open antenna tip, distance constancy is kept between the antenna tip and the dielectric tube despite varying thermal conditions. The probe can be utilized to determine resonant plasma frequency near its tip location and the corresponding plasma density.

Abstract: A high-density plasma source (100) is disclosed. The source includes an annular insulating body (300) with an annular cavity (316) formed within. An inductor coil (340) serving as an antenna is arranged within the annular cavity and is operable to generate a first magnetic field within a plasma duct (60) interior region (72) and inductively couple to the plasma when the annular body is arranged to surround a portion of the plasma duct. A grounded conductive housing (400) surrounds the annular insulating body. An electrostatic shield (360) is arranged adjacent the inner surface of the insulating body and is grounded to the conductive housing. Upper and lower magnet rings (422 and 424) are preferably arranged adjacent the upper and lower surfaces of the annular insulating body outside of the conductive housing. A T-match network is in electrical communication with said inductor coil and is adapted to provide for efficient transfer of RF power from an RF power source to the plasma.