Abstract: Methods include operating a reactant precursor vapor flux control and delivery system located in a vacuum deposition chamber comprising conveying feedstock from a feedstock buffer reservoir to an evaporation source reservoir coupled to the feedstock buffer reservoir, the evaporation source reservoir having a cavity shape that defines a evaporant pool surface area that increases as a function of fill level and conveying reactant precursor vapor from the evaporation source reservoir to a deposition zone. Apparatus includes a reactant precursor vapor flux control and delivery system located in a vacuum deposition chamber, the reactant precursor vapor flux control and delivery system comprising a feedstock buffer reservoir and an evaporation source reservoir coupled to the feedstock buffer reservoir, the evaporation source reservoir having a cavity shape that defines a evaporant pool surface area that increases as a function of fill level.

Abstract: A method includes operating a reactant precursor vapor flux control and delivery system located in a vacuum deposition chamber comprising conveying feedstock from a feedstock buffer reservoir to an evaporation source reservoir coupled to the feedstock buffer reservoir, the evaporation source reservoir having a cavity shape that defines a evaporant pool surface area that increases as a function of fill level and conveying reactant precursor vapor from the evaporation source reservoir to a deposition zone. An apparatus includes a reactant precursor vapor flux control and delivery system located in a vacuum deposition chamber, the reactant precursor vapor flux control and delivery system comprising a feedstock buffer reservoir and an evaporation source reservoir coupled to the feedstock buffer reservoir, the evaporation source reservoir having a cavity shape that defines a evaporant pool surface area that increases as a function of fill level.

Abstract: A method includes directing a first flux plume from a first evaporation source to a first reactive codeposition zone; directing a first vapor flux plume from a first vapor distribution manifold to the first reactive codeposition zone, wherein the first vapor distribution manifold is integrated with the first evaporation source to form a first integrated evaporation and vapor distribution manifold; directing a second flux plume from a second evaporation source to a second reactive codeposition zone; and directing a second vapor flux plume from a second vapor distribution manifold to the second reactive codeposition zone, wherein the second vapor distribution manifold is integrated with the second evaporation source to form a second integrated evaporation and vapor distribution manifold.

Abstract: A photovoltaic structure includes: a hole-selective contact comprising an anodized aluminum layer overlaying a different electrode metal and a plurality of contact vias that extend through the anodized aluminum layer to the different electrode metal, wherein locations of the plurality of contact vias define an ordered array; an absorber comprising a chalcopyrite (Ag,Cu)(Ga, In)S,Se:Alk, where Alk represents at least one alkali element, the absorber comprising at least a residual of a contiguous nucleation template over the anodized aluminum layer; an electron-selective contact; and a plurality of nanorods located in the plurality of contact vias, the plurality of nanorods providing ohmic contacts between the hole-selective contact and the different electrode metal at their interface at a bottom of each contact via, and comprising at least a residual of at least one surfactant and at least a residual of at least one minority alloy constituent.

Abstract: A method includes operating movable reactor shielding located in a vacuum deposition chamber comprising at least one of operating movable source debris shields and operating movable reactor zone debris shields. An apparatus includes movable reactor shielding located in a vacuum deposition chamber, the movable reactor shielding comprising at least one of movable source debris shields and movable reactor zone debris shields.