Patents by Inventor Bin-Chang Chang

Bin-Chang Chang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Repair of photolithography masks by sub-wavelength artificial grating technology
    Patent number: 7303841
    Abstract: A method is disclosed for repairing mask damage defects. After determining topographical information of a defect on a mask, one or more grating repair specifications are determined based on an optical simulation using the topographical information. One or more artificial grating areas are formed on one or more sides of the defect based on the grating repair specification.
    Type: Grant
    Filed: March 26, 2004
    Date of Patent: December 4, 2007
    Assignee: Taiwan Semiconductor Manufacturing Company
    Inventors: Ming Lu, King-chang Shu, Bin-chang Chang, Li-wei Kung
  • Multi-step phase shift mask and methods for fabrication thereof
    Patent number: 7135257
    Abstract: A phase shift mask comprises a transparent substrate having a patterned opaque material layer formed thereupon to form a non-transmissive region of the transparent substrate and an adjoining transmissive region of the transparent substrate. A pit is formed within the transmissive region of the transparent substrate. The pit has a stepped sidewall such as to provide the phase shift mask with enhanced optical performance. The phase shift mask may be fabricated employing a self aligned method.
    Type: Grant
    Filed: October 22, 2003
    Date of Patent: November 14, 2006
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd
    Inventors: Ming Lu, Bin-Chang Chang, Li-Wei Kung
  • Repair of photolithography masks by sub-wavelength artificial grating technology
    Publication number: 20050214653
    Abstract: A method is disclosed for repairing mask damage defects. After determining topographical information of a defect on a mask, one or more grating repair specifications are determined based on an optical simulation using the topographical information. One or more artificial grating areas are formed on one or more sides of the defect based on the grating repair specification.
    Type: Application
    Filed: March 26, 2004
    Publication date: September 29, 2005
    Inventors: Ming Lu, King-chang Shu, Bin-chang Chang, Li-wei Kung
  • Multi-step phase shift mask and methods for fabrication thereof
    Publication number: 20050089764
    Abstract: A phase shift mask comprises a transparent substrate having a patterned opaque material layer formed thereupon to form a non-transmissive region of the transparent substrate and an adjoining transmissive region of the transparent substrate. A pit is formed within the transmissive region of the transparent substrate. The pit has a stepped sidewall such as to provide the phase shift mask with enhanced optical performance. The phase shift mask may be fabricated employing a self aligned method.
    Type: Application
    Filed: October 22, 2003
    Publication date: April 28, 2005
    Inventors: Ming Lu, Bin-Chang Chang, Li-Wei Kung