Patents by Inventor Bing-Shan Hong

Bing-Shan Hong has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20140231876
    Abstract: An improved pseudomorphic high electron mobility transistor (pHEMT) and heterojunction bipolar transistor (HBT) integrated epitaxial structure, in which the structure comprises a substrate, a pHEMT structure, an etching-stop spacer layer, and an HBT structure. The pHEMT structure comprises a buffer layer, a bottom barrier layer, a first channel spacer layer, a channel layer, a second channel spacer layer, a Schottky spacer layer, a Schottky donor layer, a Schottky barrier layer, an etching-stop layer, and at least one cap layer. By introducing the first channel spacer layer and the second channel spacer layer to reduce the density of the dislocations and to reduce the compressive strain in the pseudomorphic channel layer.
    Type: Application
    Filed: April 29, 2014
    Publication date: August 21, 2014
    Applicant: WIN Semiconductors Corp.
    Inventors: Shu-Hsiao TSAI, Cheng-Kuo LIN, Bing-Shan HONG, Shinichiro Takatani
  • Publication number: 20130320402
    Abstract: An improved pseudomorphic high electron mobility transistor (pHEMT) and heterojunction bipolar transistor (HBT) integrated epitaxial structure and the fabrication method thereof, in which the structure comprises a substrate, a pHEMT structure, an etching-stop spacer layer, and an HBT structure. The pHEMT's structure comprises a buffer layer, a barrier layer, a first channel spacer layer, a channel layer, a second channel spacer layer, a Schottky barrier layer, an etching-stop layer, and at least one cap layer. The fabrication method of an HBT and a pHEMT are also included.
    Type: Application
    Filed: October 26, 2012
    Publication date: December 5, 2013
    Applicant: WIN SEMICONDUCTORS CORP.
    Inventors: Shu-Hsiao TSAI, Cheng-Kuo LIN, Bing-Shan HONG, Shinichiro TAKATANI
  • Patent number: 7759710
    Abstract: An oxidized low density lipoprotein sensing device for a gallium nitride process is a GaN HEMT device including: a gateless AlGaN/GaN sensing transistor device, a testing window, a source, a drain, two metal connecting wires and a passivation layer. The gateless AlGaN/GaN sensing transistor device has an epitaxial wafer structure including a GaN layer and an aluminum gallium nitride layer. The testing window is disposed on the epitaxial wafer structure. The metal connecting wire is disposed on a source and a drain. The passivation layer is covered onto a surface of the sensing device except the testing window. A built-in piezoelectric field is created by the properties of FET and the polarization effect of AlGaN/GaN to achieve the effect of sensing the level of oxidizing proteins in human body quickly, accurately and easily.
    Type: Grant
    Filed: May 5, 2009
    Date of Patent: July 20, 2010
    Assignee: Chang Gung University
    Inventors: Hsien-Chin Chiu, Chao-Sung Lai, Bing-Shan Hong, Chao-Wei Lin, S. E. Chow, Ray-Ming Lin, Yung-Hsiang Lin, Hsin-Shun Huang