Patents by Inventor Bing-Siang Chen

Bing-Siang Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9305843
    Abstract: An embodiment of the invention provides a chip package which includes: a first chip; a second chip disposed on the first chip, wherein a side surface of the second chip is a chemically-etched surface; and a bonding bulk disposed between the first chip and the second chip such that the first chip and the second chip are bonded with each other.
    Type: Grant
    Filed: January 13, 2015
    Date of Patent: April 5, 2016
    Assignee: XINTEC INC.
    Inventors: Bing-Siang Chen, Chien-Hui Chen, Shu-Ming Chang, Tsang-Yu Liu, Yen-Shih Ho
  • Publication number: 20150162245
    Abstract: An embodiment of the invention provides a chip package which includes: a first chip; a second chip disposed on the first chip, wherein a side surface of the second chip is a chemically-etched surface; and a bonding bulk disposed between the first chip and the second chip such that the first chip and the second chip are bonded with each other.
    Type: Application
    Filed: January 13, 2015
    Publication date: June 11, 2015
    Inventors: Bing-Siang CHEN, Chien-Hui CHEN, Shu-Ming CHANG, Tsang-Yu LIU, Yen-Shih HO
  • Patent number: 8878367
    Abstract: A substrate structure with through vias is provided. The substrate structure with through vias includes a semiconductor substrate having a back surface and a via penetrating the back surface, a metal layer, a first insulating layer and a second insulating layer. The first insulating layer is formed on the back surface of the semiconductor substrate and has an opening connected to the through via. The second insulating layer is formed on the first insulating layer and has a portion extending into the opening and the via to form a trench insulating layer. The bottom of the trench insulating layer is etched back to form a footing portion at the corner of the via. The footing portion has a height less than a total height of the first and second insulating layers.
    Type: Grant
    Filed: November 23, 2011
    Date of Patent: November 4, 2014
    Assignee: Xintec Inc.
    Inventors: Chia-Sheng Lin, Chien-Hui Chen, Bing-Siang Chen, Tzu-Hsiang Hung
  • Patent number: 8836134
    Abstract: A method of fabricating a semiconductor stacked package is provided. A singulation process is performed on a wafer and a substrate, on which the wafer is stacked. A portion of the wafer on a cutting region is removed, to form a stress concentrated region on an edge of a chip of the wafer. The wafer and the substrate are then cut, and a stress is forced to be concentrated on the edge of the chip of the wafer. As a result, the edge of the chip is warpaged. Therefore, the stress is prevented from extending to the inside of the chip. A semiconductor stacked package is also provided.
    Type: Grant
    Filed: January 10, 2013
    Date of Patent: September 16, 2014
    Assignee: Xintec Inc.
    Inventors: Po-Shen Lin, Chuan-Jin Shiu, Bing-Siang Chen, Chen-Han Chiang, Chien-Hui Chen, Hsi-Chien Lin, Yen-Shih Ho
  • Publication number: 20120267780
    Abstract: An embodiment of the invention provides a chip package which includes: a first chip; a second chip disposed on the first chip, wherein a side surface of the second chip is a chemically-etched surface; and a bonding bulk disposed between the first chip and the second chip such that the first chip and the second chip are bonded with each other.
    Type: Application
    Filed: April 20, 2012
    Publication date: October 25, 2012
    Inventors: Bing-Siang CHEN, Chien-Hui CHEN, Shu-Ming CHANG, Tsang-Yu LIU, Yen-Shih HO
  • Publication number: 20120133049
    Abstract: A method of fabricating a semiconductor device, a process of fabricating a through substrate via and a substrate with through vias are provided. The substrate with through vias includes a semiconductor substrate having a back surface and a via penetrating the back surface, a metal layer, a first insulating layer and a second insulating layer. The first insulating layer is formed on the back surface of the substrate and has an opening connected to the through via. The second insulating layer is formed on the first insulating layer and has a portion extending into the opening and the via to form a trench insulating layer. The bottom of the trench insulating layer is etched back to form a footing portion at the corner of the via. The footing portion has a height less than a total height of the first and second insulating layers.
    Type: Application
    Filed: November 23, 2011
    Publication date: May 31, 2012
    Inventors: Chia-Sheng Lin, Chien-Hui Chen, Bing-Siang Chen, Tzu-Hsiang Hung