Patents by Inventor Binh Bui

Binh Bui has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240321123
    Abstract: Techniques are provided for rule-based flight management system logging. In one aspect, the techniques involve receiving a rule set, wherein the rule set represents an indicator of a flight management system bug, error, or flight safety concern, writing log data to a first memory, wherein the log data is generated by the flight management system, and upon determining that an error indicator associated with the log data violates a rule of the rule set, writing the log data of the first memory to a second memory.
    Type: Application
    Filed: March 22, 2023
    Publication date: September 26, 2024
    Inventors: Maxim Constantijn VOS, Barend-Jan VAN BRUCHEM, Jonathan Fung Wah YU, Binh BUI
  • Patent number: 6190113
    Abstract: A wafer support device is provided. The wafer support device includes a susceptor having a surface configured to support a bottom surface of a wafer. The susceptor has a plurality of guiding recesses. The wafer support device also includes a pin lift that has a plurality of pins extending therefrom. The plurality of pins is configured to be passed via the plurality of guiding recesses of the susceptor to engage the bottom surface of the wafer. The susceptor is configured to be moved relative to the plurality of pins in a direction substantially orthogonal to the surface of the susceptor.
    Type: Grant
    Filed: April 30, 1997
    Date of Patent: February 20, 2001
    Assignee: Applied Materials, Inc.
    Inventors: Binh Bui, Roger N. Anderson
  • Patent number: 6143084
    Abstract: An apparatus comprising a semiconductor processing chamber, a plasma generator, and a pipe connecting a semiconductor processing chamber and the plasma generator. The plasma generator includes a generation chamber, a radio frequency generator which generates an ion plasma within the generation chamber, and a magnetic device which confines the plasma primarily within a center region of the generation chamber.
    Type: Grant
    Filed: March 19, 1998
    Date of Patent: November 7, 2000
    Assignee: Applied Materials, Inc.
    Inventors: Steven T. Li, Andrew J. Ruspini, Henry Ho, Yu Chang, Aihua Chen, Binh Bui