Patents by Inventor Binh Tran

Binh Tran has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20190354319
    Abstract: An image forming apparatus includes a switch, a receiving section, an acquisition section, a determination section, and a transition section. The receiving section receives an operation on the switch. The acquisition section acquires operation state information indicating a first operation state. The determination section determines a second operation state based on the operation state information. The second operation state differs from the first operation state. The transition section causes the image forming apparatus to transition from the first operation state to the second operation state in response to the operation on the switch. The first operation state is a state in which the image forming apparatus is operating. The second operation state is a state in which the image forming apparatus is to operate.
    Type: Application
    Filed: May 16, 2019
    Publication date: November 21, 2019
    Applicant: KYOCERA Document Solutions Inc.
    Inventor: Van Binh TRAN
  • Patent number: 9892941
    Abstract: Apparatus, reactors, and methods for heating substrates are disclosed. The apparatus comprises a stage comprising a body and a surface having an area to support a substrate, a shaft coupled to the stage, a first heating element disposed within a central region of the body of the stage, and at least second and third heating elements disposed within the body of the stage, the at least second and third heating elements each partially surrounding the first heating element and wherein the at least second and third heating elements are circumferentially adjacent to each other.
    Type: Grant
    Filed: June 16, 2009
    Date of Patent: February 13, 2018
    Assignee: Applied Materials, Inc.
    Inventors: Anqing Cui, Binh Tran, Alexander Tam, Jacob W. Smith, R. Suryanarayanan Iyer, Joseph Yudovsky, Sean M. Seutter
  • Patent number: 9312154
    Abstract: Embodiments of the invention provide improved apparatus for depositing layers on substrates, such as by chemical vapor deposition (CVD). The inventive apparatus disclosed herein may advantageously facilitate one or more of depositing films having reduced film thickness non-uniformity within a given process chamber, improved particle performance (e.g., reduced particles on films formed in the process chamber), chamber-to-chamber performance matching amongst a plurality of process chambers, and improved process chamber serviceability.
    Type: Grant
    Filed: April 20, 2010
    Date of Patent: April 12, 2016
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Binh Tran, Anqing Cui, Bernard L. Hwang, Son T. Nguyen, Anh N. Nguyen, Sean M. Seutter, Xianzhi Tao
  • Patent number: 9292257
    Abstract: Example systems and methods for estimating range for a vehicle are provided. In an example, a server remotely located from a vehicle receives vehicle status information from the vehicle as well as reference data from sources other than the vehicle. An estimated range for the vehicle is computed based on both the vehicle status information and the reference data, and then this estimated range is transmitted to the vehicle.
    Type: Grant
    Filed: September 12, 2012
    Date of Patent: March 22, 2016
    Assignee: SAP SE
    Inventors: Aaron Williams, Mary Long, Henrik Paesler, Binh Tran, Jens Lehmann, Kim Srea Phorn, Natalia Shmoilova, Geoff Ryder, Vivek Balasubramanian
  • Patent number: 8815340
    Abstract: The subject of the invention is a heat treatment process by flame treatment of at least one thin film deposited on a glass substrate (1) running in the path of at least one flame treatment device comprising at least one burner (2), said treatment being able to increase the degree of crystallization of said at least one thin film and/or to increase the size of the crystallites in said at least one thin film, said process being characterized in that the maximum transient bending “b” is less than 150 mm and respects the following condition: b?0.
    Type: Grant
    Filed: March 10, 2010
    Date of Patent: August 26, 2014
    Assignee: Saint-Gobain Glass France
    Inventors: Guillaume Bignon, Nicolas Nadaud, Binh Tran, Se-Jong Kim
  • Publication number: 20140074390
    Abstract: Example systems and methods for estimating range for a vehicle are provided. In an example, a server remotely located from a vehicle receives vehicle status information from the vehicle as well as reference data from sources other than the vehicle. An estimated range for the vehicle is computed based on both the vehicle status information and the reference data, and then this estimated range is transmitted to the vehicle.
    Type: Application
    Filed: September 12, 2012
    Publication date: March 13, 2014
    Applicant: SAP AG
    Inventors: Aaron Williams, Mary Long, Henrik Paesler, Binh Tran, Jens Lehmann, Kim Srea Phorn, Natalia Shmoilova, Geoff Ryder, Vivek Balasubramanian
  • Publication number: 20140058805
    Abstract: Example systems and methods for authorizing a financial charge from the head unit of a vehicle are shown, in m example, vehicle position information is received from the head unit at a cloud server. The cloud server can also receive purchase information from the head unit of the vehicle. The cloud server can then verify that the purchase is appropriate given a location of the vehicle, based on the purchase information and the vehicle position information, and pass the purchase information to a credit or debit card processor when the purchase has been verified.
    Type: Application
    Filed: August 24, 2012
    Publication date: February 27, 2014
    Applicant: SAP AG
    Inventors: Henrik Paesler, Aaron Williams, Prerna Jindia, Isuru Warnakulasooriya, Binh Tran, Kitty Yue, Wei-Wei Lin, Kim Srea Phorn, Geoff Ryder
  • Patent number: 8408742
    Abstract: The invention discloses an LED daylight lamp tube, comprising a tube body and caps fixedly connected to two ends of the tube body, wherein the tube body comprises: an axial bar-shaped radiator, a radiating face of which is fan-shaped and a heat conducting face of which is provided with at least two axial bar-shaped slots forming included angle; an illuminant, which comprises PCB aluminum substrates corresponding in amount to the bar-shaped slots of the radiator, wherein the front face of each of the PCB aluminum substrates is equipped with a plurality of LED illuminants and the PCB aluminum substrates are clamped in the bar-shaped slots of the radiator; a bar-shaped heat conducting gasket, which is adhered to the back face of the PCB aluminum substrate in a fitting manner and clamped between the PCB aluminum substrate and a heat conducting face of the bar-shaped slot; and a circular arc lampshade, which is in clamped connection with two sides of the radiator and forms the cylindrical tube body with the radiat
    Type: Grant
    Filed: March 14, 2011
    Date of Patent: April 2, 2013
    Assignee: Shenzhen Eviteo Imp&Exp Co., Ltd.
    Inventor: Binh Tran
  • Publication number: 20120291709
    Abstract: A method and apparatus for processing a substrate utilizing a rotating substrate support are disclosed herein. In one embodiment, an apparatus for processing a substrate includes a chamber having a substrate support assembly disposed within the chamber. The substrate support assembly includes a substrate support having a support surface and a heater disposed beneath the support surface. A shaft is coupled to the substrate support and a motor is coupled to the shaft through a rotor to provide rotary movement to the substrate support. A seal block is disposed around the rotor and forms a seal therewith. The seal block has at least one seal and at least one channel disposed along the interface between the seal block and the shaft. A port is coupled to each channel for connecting to a pump. A lift mechanism is coupled to the shaft for raising and lowering the substrate support.
    Type: Application
    Filed: July 26, 2012
    Publication date: November 22, 2012
    Applicant: Applied Materials, Inc.
    Inventors: Jacob Smith, ALEXANDER TAM, R. SURYANARAYANAN IYER, SEAN SEUTTER, BINH TRAN, NIR MERRY, ADAM BRAILOVE, ROBERT SHYDO, JR., ROBERT ANDREWS, FRANK ROBERTS, THEODORE SMICK, GEOFFREY RYDING
  • Publication number: 20120236562
    Abstract: The invention discloses an LED daylight lamp tube, comprising a tube body and caps fixedly connected to two ends of the tube body, wherein the tube body comprises: an axial bar-shaped radiator, a radiating face of which is fan-shaped and a heat conducting face of which is provided with at least two axial bar-shaped slots forming included angle; an illuminant, which comprises PCB aluminum substrates corresponding in amount to the bar-shaped slots of the radiator, wherein the front face of each of the PCB aluminum substrates is equipped with a plurality of LED illuminants and the PCB aluminum substrates are clamped in the bar-shaped slots of the radiator; a bar-shaped heat conducting gasket, which is adhered to the back face of the PCB aluminum substrate in a fitting manner and clamped between the PCB aluminum substrate and a heat conducting face of the bar-shaped slot; and a circular arc lampshade, which is in clamped connection with two sides of the radiator and forms the cylindrical tube body with the radiat
    Type: Application
    Filed: March 14, 2011
    Publication date: September 20, 2012
    Applicant: Bestone Global Electronics, Inc.
    Inventor: Binh Tran
  • Publication number: 20110311732
    Abstract: The subject of the invention is a heat treatment process by flame treatment of at least one thin film deposited on a glass substrate (1) running in the path of at least one flame treatment device comprising at least one burner (2), said treatment being able to increase the degree of crystallization of said at least one thin film and/or to increase the size of the crystallites in said at least one thin film, said process being characterized in that the maximum transient bending “b” is less than 150 mm and respects the following condition: b?0.
    Type: Application
    Filed: March 10, 2010
    Publication date: December 22, 2011
    Applicant: SAINT-GOBAIN GLASS FRANCE
    Inventors: Guillaume Bignon, Nicolas Nadaud, Binh Tran, Se-Jong Kim
  • Publication number: 20100294199
    Abstract: Embodiments of the invention provide improved apparatus for depositing layers on substrates, such as by chemical vapor deposition (CVD). The inventive apparatus disclosed herein may advantageously facilitate one or more of depositing films having reduced film thickness non-uniformity within a given process chamber, improved particle performance (e.g., reduced particles on films formed in the process chamber), chamber-to-chamber performance matching amongst a plurality of process chambers, and improved process chamber serviceability.
    Type: Application
    Filed: April 20, 2010
    Publication date: November 25, 2010
    Applicant: APPLIED MATERIALS, INC.
    Inventors: BINH TRAN, ANQING CUI, BERNARD L. HWANG, SON T. NGUYEN, ANH N. NGUYEN, SEAN M. SEUTTER, XIANZHI TAO
  • Publication number: 20100224130
    Abstract: A method and apparatus for processing a substrate utilizing a rotating substrate support are disclosed herein. In one embodiment, an apparatus for processing a substrate includes a chamber having a substrate support assembly disposed within the chamber. The substrate support assembly includes a substrate support having a support surface and a heater disposed beneath the support surface. A shaft is coupled to the substrate support and a motor is coupled to the shaft through a rotor to provide rotary movement to the substrate support. A seal block is disposed around the rotor and forms a seal therewith. The seal block has at least one seal and at least one channel disposed along the interface between the seal block and the shaft. A port is coupled to each channel for connecting to a pump. A lift mechanism is coupled to the shaft for raising and lowering the substrate support.
    Type: Application
    Filed: May 13, 2010
    Publication date: September 9, 2010
    Inventors: Jacob Smith, Alexander Tam, R. Suryanarayanan Iyer, Sean Seutter, Binh Tran, Nir Merry, Adam Brailove, Robert Shydo, JR., Robert Andrews, Frank Roberts, Theodore Smick, Geoffrey Ryding
  • Publication number: 20090314762
    Abstract: Apparatus, reactors, and methods for heating substrates are disclosed. The apparatus comprises a stage comprising a body and a surface having an area to support a substrate, a shaft coupled to the stage, a first heating element disposed within a central region of the body of the stage, and at least second and third heating elements disposed within the body of the stage, the at least second and third heating elements each partially surrounding the first heating element and wherein the at least second and third heating elements are circumferentially adjacent to each other.
    Type: Application
    Filed: June 16, 2009
    Publication date: December 24, 2009
    Applicant: Applied Materials, Inc.
    Inventors: Anqing Cui, Binh Tran, Alexander Tam, Jacob W. Smith, R. Suryanarayanan Iyer, Joseph Yudovsky, Sean M. Seutter
  • Publication number: 20070125762
    Abstract: Apparatus, reactors, and methods for heating substrates are disclosed. The apparatus comprises a stage comprising a body and a surface having an area to support a substrate, a shaft coupled to the stage, a first heating element disposed within a central region of the body of the stage, and at least second and third heating elements disposed within the body of the stage, the at least second and third heating elements each partially surrounding the first heating element and wherein the at least second and third heating elements are circumferentially adjacent to each other.
    Type: Application
    Filed: December 1, 2005
    Publication date: June 7, 2007
    Inventors: Anqing Cui, Binh Tran, Alexander Tam, Jacob Smith, R. Iyer, Joseph Yudovsky, Sean Seutter
  • Publication number: 20060281310
    Abstract: A method and apparatus for processing a substrate utilizing a rotating substrate support are disclosed herein. In one embodiment, an apparatus for processing a substrate includes a chamber having a substrate support assembly disposed within the chamber. The substrate support assembly includes a substrate support having a support surface and a heater disposed beneath the support surface. A shaft is coupled to the substrate support and a motor is coupled to the shaft through a rotor to provide rotary movement to the substrate support. A seal block is disposed around the rotor and forms a seal therewith. The seal block has at least one seal and at least one channel disposed along the interface between the seal block and the shaft. A port is coupled to each channel for connecting to a pump. A lift mechanism is coupled to the shaft for raising and lowering the substrate support.
    Type: Application
    Filed: June 8, 2005
    Publication date: December 14, 2006
    Inventors: Jacob Smith, Alexander Tam, R. Iyer, Sean Seutter, Binh Tran, Nir Merry, Adam Brailove, Robert Shydo, Robert Andrews, Frank Roberts, Theodore Smick, Geoffrey Ryding
  • Publication number: 20060102076
    Abstract: A method and apparatus for a chemical vapor deposition (CVD) chamber provides uniform heat distribution, uniform distribution of process chemicals in the CVD chamber, and minimization of by-product and condensate residue in the chamber. The improvements include a processing chamber comprising a chamber body, a base, and a chamber lid defining a processing region, a substrate support disposed in the processing region, a gas delivery system mounted on a chamber lid, the gas delivery system comprising an adapter ring and two blocker plates that define a gas mixing region, and a face plate fastened to the adapter ring, an exhaust system mounted at the base, a heating element positioned to heat the adapter ring; and a heating element positioned to heat a portion of the exhaust system.
    Type: Application
    Filed: October 7, 2005
    Publication date: May 18, 2006
    Inventors: Jacob Smith, Sean Seutter, R. Iyer, Binh Tran, Alexander Tam, James Wilson
  • Publication number: 20050109276
    Abstract: A method and apparatus for a CVD chamber that provides uniform heat distribution, efficient precursor delivery, uniform distribution of process and inert chemicals, and thermal management of residues in the chamber and exhaust surfaces by changing the mechanical design of a single wafer thermal CVD chamber. The improvements include a processing chamber comprising a chamber body and a chamber lid defining a processing region, a substrate support disposed in the processing region, a gas delivery system mounted on the chamber lid, the gas delivery system comprising a lid, an adapter ring and two blocker plates that define a gas mixing region, and a face plate fastened to the adapter ring, a heating element positioned to heat the adapter ring to a desired temperature, and a temperature controlled exhaust system.
    Type: Application
    Filed: August 4, 2004
    Publication date: May 26, 2005
    Inventors: R. Iyer, Sean Seutter, Jacob Smith, Gregory Dibello, Alexander Tam, Binh Tran, Sanjeev Tandon
  • Patent number: D866964
    Type: Grant
    Filed: October 16, 2018
    Date of Patent: November 19, 2019
    Assignee: Dango Products, Inc.
    Inventors: Thuan Tran, Charlie Carroll, Binh Tran
  • Patent number: D868463
    Type: Grant
    Filed: October 16, 2018
    Date of Patent: December 3, 2019
    Assignee: Dango Products
    Inventors: Thuan Tran, Charlie Carroll, Binh Tran