Patents by Inventor Binod De

Binod De has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Process for highly purified polyhedral oligomeric silsesquioxane monomers
    Publication number: 20070065750
    Abstract: A synthesis process for polyhedral oligomeric silsesquioxanes that produces in high yield a low resin content, solvent free, and trace metal free monomer suitable for use in microelectronic applications. POSS silanols are reacted with a silane coupling agent in the presence of a solvent and a superbase.
    Type: Application
    Filed: December 7, 2005
    Publication date: March 22, 2007
    Inventors: Joseph Schwab, Yi-Zhong An, Sanjay Malik, Binod De
  • Thermally cured undercoat for lithographic application
    Publication number: 20050238997
    Abstract: Thermally curable undercoat composition comprising for producing a bilayer relief image comprising: a) a polymer of Structure I comprising repeating units of Structure II, III, and IV b) a phenolic crosslinker; c) a thermal acid generator (TAG); and d) a solvent.
    Type: Application
    Filed: March 9, 2005
    Publication date: October 27, 2005
    Inventors: Binod De, Sanjay Malik, J. Kocab, Thomas Sarubbi
  • Novel photosensitive bilayer composition
    Publication number: 20050042542
    Abstract: Polymers and co-polymers having monomeric units formed by the polymerization of monomers of the Structure I where R1 is a moiety containing an ethylenically unsaturated polymerizable group, R2 is a C1-C3 alkylene group, and R3 is a C1-10 linear or cyclic alkyl group, a C6-10 aromatic or substituted aromatic group, a C1-8 alkoxy methyl, or a C1-8 alkoxy ethyl group, are useful as binder resins for photosensitive compositions, and processes for photolithography in the production of semiconductor devices and materials.
    Type: Application
    Filed: August 19, 2004
    Publication date: February 24, 2005
    Inventors: Patrick Foster, Gregory Spaziano, Binod De
  • Process for producing anhydride-containing polymers for radiation sensitive compositions
    Patent number: 6803434
    Abstract: A synthetic process comprising the following steps: providing a reaction mixture comprising: an ethylenically unsaturated anhydride monomer, at least one ethylenically unsaturated non-anhydride monomer, a free radical initiator, and an alkyl substituted THF solvent having the general structure of formula 1: where R1, R2, R3, and R4 are independently chosen from the group hydrogen and C1-C4 linear or branched alkyl with the proviso that at least one of R1, R2, R3, and R4 is not H; polymerizing the reaction mixture; and removing, by distillation, unreacted monomers, the alkyl substituted THF solvent, and any low boiling volatile reaction products.
    Type: Grant
    Filed: February 27, 2003
    Date of Patent: October 12, 2004
    Assignee: Arch Specialty Chemicals, Inc.
    Inventors: Stephanie Dilocker, Sanjay Malik, Binod De, Ashok Reddy
  • Novel process for producing anhydride-containing polymers for radiation sensitive compositions
    Publication number: 20030225233
    Abstract: A synthetic process comprising the following steps: providing a reaction mixture comprising: an ethylenically unsaturated anhydride monomer, at least one ethylenically unsaturated non-anhydride monomer, a free radical initiator, and an alkyl substituted THF solvent having the general structure of formula 1: 1
    Type: Application
    Filed: February 27, 2003
    Publication date: December 4, 2003
    Applicant: ARCH SPECIALTY CHEMICALS, INC.
    Inventors: Stephanie Dilocker, Sanjay Malik, Binod De, Ashok Reddy