Patents by Inventor Birgit Enkisch
Birgit Enkisch has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7672044Abstract: As a preliminary stage in manufacturing a lens or lens part for an objective, in particular a projection objective for a microlithography projection system, an optical blank is made from a crystal material. As a first step in manufacturing the optical blank, one determines the orientation of a first crystallographic direction that is defined in the crystallographic structure of the material. The material is then machined into an optical blank so that the first crystallographic direction is substantially perpendicular to an optical blank surface of the optical blank. Subsequently, a marking is applied to the optical blank or to a mounting element of the optical blank. The marking has a defined relationship to a second crystallographic direction which is oriented at a non-zero angle relative to the first crystallographic direction.Type: GrantFiled: September 28, 2007Date of Patent: March 2, 2010Assignee: Carl Zeiss SMT AGInventors: Birgit Enkisch, Hartmut Enkisch, Toralf Gruner
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Patent number: 7411656Abstract: A retardation arrangement for converting an input radiation beam, incident from an input side of the retardation arrangement, into an output radiation beam which has over its cross section a spatial distribution of polarization states which can be influenced by the retardation arrangement and differs from the spatial distribution of polarization states of the input radiation, is designed as a reflective retardation arrangement. A useful cross section of the retardation arrangement has a multiplicity of retardation zones of different retardation effect. Such a mirror arrangement having a retardation effect varying as a function of location can be used to compensate undesired fluctuations in the polarization state over the cross section of an input radiation beam and/or to set specific output polarization states, for example in order to set radial or tangential polarization.Type: GrantFiled: January 24, 2006Date of Patent: August 12, 2008Assignee: Carl Zeiss SMT AGInventors: Michael Totzeck, Birgit Enkisch, Karl-Heinz Schuster
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Patent number: 7382536Abstract: An objective for a microlithography projection system has at least one fluoride crystal lens. The effects of birefringence, which are detrimental to the image quality, are reduced if the lens axis of the crystal lens is oriented substantially perpendicular to the {100}-planes or {100}-equivalent crystallographic planes of the fluoride crystal. If two or more fluoride crystal lenses are used, they should have lens axes oriented in the (100)-, (111)-, or (110)-direction of the crystallographic structure, and they should be oriented at rotated positions relative to each other. The birefringence-related effects are further reduced by using groups of mutually rotated (100)-lenses in combination with groups of mutually rotated (111)- or (110)-lenses. A further improvement is also achieved by applying a compensation coating to at least one optical element of the objective.Type: GrantFiled: March 29, 2006Date of Patent: June 3, 2008Assignee: Carl Zeiss SMT AGInventors: Daniel Krähmer, Toralf Gruner, Wilhelm Ulrich, Birgit Enkisch, Michael Gerhard, Martin Brunotte, Christian Wagner, Winfried Kaiser, Manfred Maul, Christof Zaczek
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Publication number: 20080019013Abstract: As a preliminary stage in manufacturing a lens or lens part for an objective, in particular a projection objective for a microlithography projection system, an optical blank is made from a crystal material. As a first step in manufacturing the optical blank, one determines the orientation of a first crystallographic direction that is defined in the crystallographic structure of the material. The material is then machined into an optical blank so that the first crystallographic direction is substantially perpendicular to an optical blank surface of the optical blank. Subsequently, a marking is applied to the optical blank or to a mounting element of the optical blank. The marking has a defined relationship to a second crystallographic direction which is oriented at a non-zero angle relative to the first crystallographic direction.Type: ApplicationFiled: September 28, 2007Publication date: January 24, 2008Applicant: CARL ZEISS SMT AGInventors: Birgit Enkisch, Hartmut Enkisch, Toralf Gruner
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Patent number: 7292388Abstract: As a preliminary stage in manufacturing a lens or lens part for an objective, in particular a projection objective for a microlithography projection system, an optical blank is made from a crystal material. As a first step in manufacturing the optical blank, one determines the orientation of a first crystallographic direction that is defined in the crystallographic structure of the material. The material is then machined into an optical blank so that the first crystallographic direction is substantially perpendicular to an optical blank surface of the optical blank. Subsequently, a marking is applied to the optical blank or to a mounting element of the optical blank. The marking has a defined relationship to a second crystallographic direction which is oriented at a non-zero angle relative to the first crystallographic direction.Type: GrantFiled: November 8, 2004Date of Patent: November 6, 2007Assignee: Carl Zeiss SMT AGInventors: Birgit Enkisch, Hartmut Enkisch, Toralf Gruner
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Patent number: 7180667Abstract: An objective for a microlithography projection system has at least one fluoride crystal lens. The effects of birefringence, which are detrimental to the image quality, are reduced if the lens axis of the crystal lens is oriented substantially perpendicular to the {100}-planes or {100}-equivalent crystallographic planes of the fluoride crystal. If two or more fluoride crystal lenses are used, they should have lens axes oriented in the (100)-, (111)-, or (110)-direction of the crystallographic structure, and they should be oriented at rotated positions relative to each other. The birefringence-related effects are further reduced by using groups of mutually rotated (100)-lenses in combination with groups of mutually rotated (111)- or (110)-lenses. A further improvement is also achieved by applying a compensation coating to at least one optical element of the objective.Type: GrantFiled: April 1, 2004Date of Patent: February 20, 2007Assignee: Carl Zeiss SMT AGInventors: Daniel Krähmer, Toralf Gruner, Wilhelm Ulrich, Birgit Enkisch, Michael Gerhard, Martin Brunotte, Christian Wagner, Winfried Kaiser, Manfred Maul, Christof Zaczek
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Patent number: 7145720Abstract: An objective for a microlithography projection system has at least one fluoride crystal lens. The effects of birefringence, which are detrimental to the image quality, are reduced if the lens axis of the crystal lens is oriented substantially perpendicular to the {100}-planes or {100}-equivalent crystallographic planes of the fluoride crystal. If two or more fluoride crystal lenses are used, they should have lens axes oriented in the (100)-, (111)-, or (110)-direction of the crystallographic structure, and they should be oriented at rotated positions relative to each other. The birefringence-related effects are further reduced by using groups of mutually rotated (100)-lenses in combination with groups of mutually rotated (111)- or (110)-lenses. A further improvement is also achieved by applying a compensation coating to at least one optical element of the objective.Type: GrantFiled: February 12, 2003Date of Patent: December 5, 2006Assignee: Carl Zeiss SMT AGInventors: Daniel Krähmer, Toralf Gruner, Wilhelm Ulrich, Birgit Enkisch, Michael Gerhard, Martin Brunotte, Christian Wagner, Winfried Kaiser, Manfred Maul, Christof Zaczek
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Patent number: 7126765Abstract: An objective for a microlithography projection system has at least one fluoride crystal lens. The effects of birefringence, which are detrimental to the image quality, are reduced if the lens axis of the crystal lens is oriented substantially perpendicular to the {100}-planes or {100}-equivalent crystallographic planes of the fluoride crystal. If two or more fluoride crystal lenses are used, they should have lens axes oriented in the (100)-, (111)-, or (110)-direction of the crystallographic structure, and they should be oriented at rotated positions relative to each other. The birefringence-related effects are further reduced by using groups of mutually rotated (100)-lenses in combination with groups of mutually rotated (111)- or (110)-lenses. A further improvement is also achieved by applying a compensation coating to at least one optical element of the objective.Type: GrantFiled: January 5, 2005Date of Patent: October 24, 2006Assignee: Carl Zeiss SMT AGInventors: Daniel Krähmer, Toralf Gruner, Wilhelm Ulrich, Birgit Enkisch, Michael Gerhard, Martin Brunotte, Christian Wagner, Winfried Kaiser, Manfred Maul, Christof Zaczek
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Publication number: 20060171020Abstract: An objective for a microlithography projection system has at least one fluoride crystal lens. The effects of birefringence, which are detrimental to the image quality, are reduced if the lens axis of the crystal lens is oriented substantially perpendicular to the {100}-planes or {100}-equivalent crystallographic planes of the fluoride crystal. If two or more fluoride crystal lenses are used, they should have lens axes oriented in the (100)-, (111)-, or (110)-direction of the crystallographic structure, and they should be oriented at rotated positions relative to each other. The birefringence-related effects are further reduced by using groups of mutually rotated (100)-lenses in combination with groups of mutually rotated (111)- or (110)-lenses. A further improvement is also achieved by applying a compensation coating to at least one optical element of the objective.Type: ApplicationFiled: March 29, 2006Publication date: August 3, 2006Applicant: Carl Zeiss SMT AGInventors: Daniel Krahmer, Toralf Gruner, Wilhelm Ulrich, Birgit Enkisch, Michael Gerhard, Martin Brunotte, Christian Wagner, Winfried Kaiser, Manfred Maul, Christoph Zaczek
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Publication number: 20060152701Abstract: A retardation arrangement for converting an input radiation beam, incident from an input side of the retardation arrangement, into an output radiation beam which has over its cross section a spatial distribution of polarization states which can be influenced by the retardation arrangement and differs from the spatial distribution of polarization states of the input radiation, is designed as a reflective retardation arrangement. A useful cross section of the retardation arrangement has a multiplicity of retardation zones of different retardation effect. Such a mirror arrangement having a retardation effect varying as a function of location can be used to compensate undesired fluctuations in the polarization state over the cross section of an input radiation beam and/or to set specific output polarization states, for example in order to set radial or tangential polarization.Type: ApplicationFiled: January 24, 2006Publication date: July 13, 2006Inventors: Michael Totzeck, Birgit Enkisch, Karl-Heinz Schuster
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Patent number: 7053988Abstract: A retardation arrangement for converting an input radiation beam, incident from an input side of the retardation arrangement, into an output radiation beam which has over its cross section a spatial distribution of polarization states which can be influenced by the retardation arrangement and differs from the spatial distribution of polarization states of the input radiation, is designed as a reflective retardation arrangement. A useful cross section of the retardation arrangement has a multiplicity of retardation zones of different retardation effect. Such a mirror arrangement having a retardation effect varying as a function of location can be used to compensate undesired fluctuations in the polarization state over the cross section of an input radiation beam and/or to set specific output polarization states, for example in order to set radial or tangential polarization.Type: GrantFiled: November 26, 2003Date of Patent: May 30, 2006Assignee: Carl Zeiss SMT AG.Inventors: Michael Totzeck, Birgit Enkisch, Karl-Heinz Schuster
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Publication number: 20050170748Abstract: As a preliminary stage in manufacturing a lens or lens part for an objective, in particular a projection objective for a microlithography projection system, an optical blank is made from a crystal material. As a first step in manufacturing the optical blank, one determines the orientation of a first crystallographic direction that is defined in the crystallographic structure of the material. The material is then machined into an optical blank so that the first crystallographic direction is substantially perpendicular to an optical blank surface of the optical blank. Subsequently, a marking is applied to the optical blank or to a mounting element of the optical blank. The marking has a defined relationship to a second crystallographic direction which is oriented at a non-zero angle relative to the first crystallographic direction.Type: ApplicationFiled: November 8, 2004Publication date: August 4, 2005Inventors: Birgit Enkisch, Hartmut Enkisch, Toralf Gruner
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Publication number: 20050122594Abstract: An objective for a microlithography projection system has at least one fluoride crystal lens. The effects of birefringence, which are detrimental to the image quality, are reduced if the lens axis of the crystal lens is oriented substantially perpendicular to the {100}-planes or {100}-equivalent crystallographic planes of the fluoride crystal. If two or more fluoride crystal lenses are used, they should have lens axes oriented in the (100)-, (111)-, or (110)-direction of the crystallographic structure, and they should be oriented at rotated positions relative to each other. The birefringence-related effects are further reduced by using groups of mutually rotated (100)-lenses in combination with groups of mutually rotated (111)- or (110)-lenses. A further improvement is also achieved by applying a compensation coating to at least one optical element of the objective.Type: ApplicationFiled: January 5, 2005Publication date: June 9, 2005Inventors: Daniel Krahmer, Toralf Gruner, Wilhelm Ulrich, Birgit Enkisch, Michael Gerhard, Martin Brunotte, Christian Wagner, Winfried Kaiser, Manfred Maul, Christoph Zaczek
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Publication number: 20040190151Abstract: An objective for a microlithography projection system has at least one fluoride crystal lens. The effects of birefringence, which are detrimental to the image quality, are reduced if the lens axis of the crystal lens is oriented substantially perpendicular to the {100}-planes or {100}-equivalent crystallographic planes of the fluoride crystal. If two or more fluoride crystal lenses are used, they should have lens axes oriented in the (100)-, (111)-, or (110)-direction of the crystallographic structure, and they should be oriented at rotated positions relative to each other. The birefringence-related effects are further reduced by using groups of mutually rotated (100)-lenses in combination with groups of mutually rotated (111)- or (110)-lenses. A further improvement is also achieved by applying a compensation coating to at least one optical element of the objective.Type: ApplicationFiled: April 1, 2004Publication date: September 30, 2004Inventors: Daniel Krahmer, Toralf Gruner, Wilheim Ulrich, Birgit Enkisch, Michael Gerhard, Martin Brunotte, Christian Wagner, Winfried Kaiser, Manfred Maul, Christoph Zaczek
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Publication number: 20040184019Abstract: A retardation arrangement for converting an input radiation beam, incident from an input side of the retardation arrangement, into an output radiation beam which has over its cross section a spatial distribution of polarization states which can be influenced by the retardation arrangement and differs from the spatial distribution of polarization states of the input radiation, is designed as a reflective retardation arrangement. A useful cross section of the retardation arrangement has a multiplicity of retardation zones of different retardation effect. Such a mirror arrangement having a retardation effect varying as a function of location can be used to compensate undesired fluctuations in the polarization state over the cross section of an input radiation beam and/or to set specific output polarization states, for example in order to set radial or tangential polarization.Type: ApplicationFiled: November 26, 2003Publication date: September 23, 2004Applicant: CARL ZEISS SMT AGInventors: Michael Totzeck, Birgit Enkisch, Karl-Heinz Schuster
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Publication number: 20040105170Abstract: An objective for a microlithography projection system has at least one fluoride crystal lens. The effects of birefringence, which are detrimental to the image quality, are reduced if the lens axis of the crystal lens is oriented substantially perpendicular to the {100}-planes or {100}-equivalent crystallographic planes of the fluoride crystal. If two or more fluoride crystal lenses are used, they should have lens axes oriented in the (100)-, (111)-, or (110)-direction of the crystallographic structure, and they should be oriented at rotated positions relative to each other. The birefringence-related effects are further reduced by using groups of mutually rotated (100)-lenses in combination with groups of mutually rotated (111)- or (110)-lenses. A further improvement is also achieved by applying a compensation coating to at least one optical element of the objective.Type: ApplicationFiled: February 12, 2003Publication date: June 3, 2004Applicant: Carl Zeiss SMT AGInventors: Daniel Krahmer, Toralf Gruner, Wilhelm Ulrich, Birgit Enkisch, Michael Gerhard, Martin Brunotte, Christian Wagner, Winfried Kaiser, Manfred Maul, Christoph Zaczek