Abstract: A device for the plasma treatment of containers comprises a process gas producer for producing a process gas mixture and at least one coating station, which comprises at least one plasma chamber having a treatment place, in which plasma chamber at least one container having a container interior can be inserted and positioned on the treatment place, each plasma chamber being at least partially evacuable in order to suck the process gas provided by the process gas producer through the container, the interior thereof thus being provided with an inner coating by means of plasma treatment, and pressure-measuring apparatuses being provided at predefined points of the device in order to ensure the process stability. The pressure-measuring apparatuses at least at some of the predefined points of the device comprise gas-type-dependent pressure transducers.