Abstract: A high-voltage connection system is described. The HV connection system includes a HV plug-connector and a HV socket-connector. The HV plug-connector is installed in an electrical HV unit to form an electrical connection between a second portion of a conductive core of the HV plug-connector and the electrical HV unit in a way that a plug extends outwards of the electrical HV unit. A HV cable with a cable lug is inserted in the HV socket-connector. One opening of the HV socket-connector is plugged on the plug of the HV plug-connector to align the conductive core with a center line of a second channel. An electric connection is created between the cable lug and the conductive core.

Abstract: An emergency break cable lug device is described. The cable lug device includes a pin element for fixing a cable; and a socket element, in which the pin element is insertable and which is configured to be connected to an external conductor, in particular an external cable or wire. The pin element is adapted to exit the socket element upon a predefined threshold value of force acting on the pin element and/or the socket element. Further, a pin element for a cable lug device, a socket element for a cable lug device and a method for mounting a cable lug device are described.

Abstract: A method for generating a technical system model executable on a test unit, wherein the test unit and the executable model are designed for real-time-capable testing of a control unit connected to the test unit, and wherein the executable model is constructed from a plurality of executable submodels communicating with each other, wherein each executable submodel has a separate address space and/or is executed on a separate processor or separate processor core when a test of a control unit connected to the test unit is being run.

Abstract: A method for determining a physical connection topology of a test device with real-time capability and set up for control device development includes: determining logical communication links between a plurality of simulation models; and automatically determining the physical connection topology by specifying direct physical communication links between the plurality of data processing units based on the respective specified quantities of physical interfaces of the plurality of data processing units. Specifying the direct physical communication links includes determining, for each of the logical communication links, whether a direct physical communication link corresponding to the logical communication link forms part of the physical connection topology.

Abstract: A method for generating a technical system model executable on a test unit, wherein the test unit and the executable model are designed for real-time-capable testing of a control unit connected to the test unit, and wherein the executable model is constructed from a plurality of executable submodels communicating with each other, wherein each executable submodel has a separate address space and/or is executed on a separate processor or separate processor core when a test of a control unit connected to the test unit is being run.

Abstract: Methods are provided for modifying a transparent and electrically conductive metal-oxide coating deposited on a plastic substrate. At least one surface region of the metal oxide coating is impinged by a pulse-driven electron beam. The impingement of the surface region of the metal oxide coating by the pulse-driven electron beam occurs inside a vacuum chamber into which hydrogen, argon, nitrogen, or oxygen, or a gas mixture of at least two of the above-mentioned gasses has been introduced.

Abstract: Methods are provided for modifying a transparent and electrically conductive metal-oxide coating deposited on a plastic substrate. At least one surface region of the metal oxide coating is impinged by a pulse-driven electron beam. The impingement of the surface region of the metal oxide coating by the pulse-driven electron beam occurs inside a vacuum chamber into which hydrogen, argon, nitrogen, or oxygen, or a gas mixture of at least two of the above-mentioned gasses has been introduced.

Abstract: A method for depositing a LiPON coating on a substrate is provided, wherein the vaporization material, which is located in a vessel and which includes at least the chemical elements lithium, phosphorus and oxygen, is vaporized within a vacuum chamber. Here the vaporization material is heated by means of a thermal vaporization apparatus, and simultaneously either a nitrogen-containing component is introduced into the vacuum chamber or a nitrogen-containing material is co-vaporized, and wherein the vapor particle mist rising from the vessel is permeated by a plasma before the deposition on the substrate.

Abstract: The invention relates to a method for producing a transparent bather layer system, wherein in a vacuum chamber at least two transparent barrier layers and a transparent intermediate layer disposed between the two barrier layers are deposited on a transparent plastic film, wherein for deposition of the barrier layers aluminium is vaporised and simultaneously at least one first reactive gas is introduced into the vacuum chamber and wherein for deposition of the intermediate layer aluminium is vaporised and simultaneously at least one second reactive gas and a gaseous or vaporous organic component are introduced into the vacuum chamber.

Abstract: The invention relates to a method for producing a transparent barrier layer system, wherein in a vacuum chamber at least two transparent barrier layers and a transparent intermediate layer disposed between the two barrier layers are deposited on a transparent plastic film, wherein for deposition of the barrier layers aluminium is vaporised and simultaneously at least one first reactive gas is introduced into the vacuum chamber and wherein for deposition of the intermediate layer aluminium is vaporised and simultaneously at least one second reactive gas is introduced into the vacuum chamber, and a silicon-containing layer is deposited as intermediate layer by means of a PECVD process.

Abstract: The invention relates to a method for producing a firm bond between a polymer substrate and an inorganic layer, wherein the substrate surface is exposed to a precursor before the deposition of the inorganic layer which is to be produced by means of a PVD process.