Patents by Inventor Björn Sundman

Björn Sundman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Aligning and focusing an electron beam in an X-ray source
    Patent number: 9947502
    Abstract: A technique for indirectly measuring the degree of alignment of a beam in an electron-optical system including aligning means, focusing means and deflection means. To carry out the measurements, a simple sensor may be used, even a single-element sensor, provided it has a well-defined spatial extent. When practiced in connection with an X-ray source which is operable to produce an X-ray target, further, a technique for determining and controlling a width of an electron-beam at its intersection point with the target.
    Type: Grant
    Filed: May 5, 2016
    Date of Patent: April 17, 2018
    Assignee: EXCILLUM AB
    Inventors: Oscar Hemberg, Tomi Tuohimaa, Björn Sundman
  • ALIGNING AND FOCUSING AN ELECTRON BEAM IN AN X-RAY SOURCE
    Publication number: 20160247656
    Abstract: A technique for indirectly measuring the degree of alignment of a beam in an electron-optical system including aligning means, focusing means and deflection means. To carry out the measurements, a simple sensor may be used, even a single-element sensor, provided it has a well-defined spatial extent. When practiced in connection with an X-ray source which is operable to produce an X-ray target, further, a technique for determining and controlling a width of an electron-beam at its intersection point with the target.
    Type: Application
    Filed: May 5, 2016
    Publication date: August 25, 2016
    Applicant: Excillum AB
    Inventors: Oscar HEMBERG, Tomi TUOHIMAA, Björn SUNDMAN
  • Aligning and focusing an electron beam in an X-ray source
    Patent number: 9380690
    Abstract: A technique for indirectly measuring the degree of alignment of a beam in an electron-optical system including aligning means, focusing means and deflection means. To carry out the measurements, a simple sensor may be used, even a single-element sensor, provided it has a well-defined spatial extent. When practiced in connection with an X-ray source which is operable to produce an X-ray target, further, a technique for determining and controlling a width of an electron-beam at its intersection point with the target.
    Type: Grant
    Filed: December 21, 2011
    Date of Patent: June 28, 2016
    Assignee: EXCILLUM AB
    Inventors: Oscar Hemberg, Tomi Tuohimaa, Björn Sundman
  • ALIGNING AND FOCUSING AN ELECTRON BEAM IN AN X-RAY SOURCE
    Publication number: 20130301805
    Abstract: A technique for indirectly measuring the degree of alignment of a beam in an electron-optical system including aligning means, focusing means and deflection means. To carry out the measurements, a simple sensor may be used, even a single-element sensor, provided it has a well-defined spatial extent. When practiced in connection with an X-ray source which is operable to produce an X-ray target, further, a technique for determining and controlling a width of an electron-beam at its intersection point with the target.
    Type: Application
    Filed: December 21, 2011
    Publication date: November 14, 2013
    Applicant: Excillum AB
    Inventors: Oscar Hemberg, Tomi Tuohimaa, Björn Sundman