Patents by Inventor Bjoern Eggenstein

Bjoern Eggenstein has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • ENHANCING LITHOGRAPHY FOR VIAS AND CONTACTS BY USING DOUBLE EXPOSURE BASED ON LINE-LIKE FEATURES
    Publication number: 20080241756
    Abstract: By performing a double exposure process on the basis of bar-like or line-like features, critical via and contact openings may be defined as an intersection, thereby obtaining the desired design dimension on the basis of less critical lithography process windows. Hence, process flexibility may be enhanced while overall throughput may not be substantially negatively affected.
    Type: Application
    Filed: November 7, 2007
    Publication date: October 2, 2008
    Inventors: Matthias Lehr, Bjoern Eggenstein