Abstract: An apparatus for the continuous coating of band-type substrates in a vacuum chamber comprises a plurality of evaporation vessels 1, 1', . . . of the same size and configuration. These vessels form a row of evaporation vessels aligned with the direction of movement of the band and are spaced approximately equally apart. All vessels are made of an electrically conductive, ceramic material and can be heated by directly passing a current. Provision is made for a device for the continuous supply of wire to be evaporated to the evaporator vessels. The individual evaporator vessels 1, 1', . . . of the row are offset with respect to one another. Together, they cover a small coating zone B which extends transversely to the direction of movement A of the band.