Abstract: A vehicle occupant detection system and method for using the same. The vehicle occupant detection system includes: a controller; a plurality of life detection sensors, wherein the plurality of life detection sensors are installed within an interior cabin of a mass-transit vehicle and are each associated with a life detection zone; a local warning system having at least one human-machine interface (HMI) output device; and a vehicle interface that communicatively couples the controller to a vehicle electrical system of the mass-transit vehicle. The vehicle occupant detection system is configured to: (i) acquire sensor data by scanning the life detection zone using the plurality of life detection sensors; (ii) determine whether an occupant is present based on the sensor data; and (iii) provide an indication to a user that an occupant is present using the HMI output device when it is determined that an occupant is present.

Abstract: A vehicle occupant detection system and method for using the same. The vehicle occupant detection system includes: a controller; a plurality of life detection sensors, wherein the plurality of life detection sensors are installed within an interior cabin of a mass-transit vehicle and are each associated with a life detection zone; a local warning system having at least one human-machine interface (HMI) output device; and a vehicle interface that communicatively couples the controller to a vehicle electrical system of the mass-transit vehicle. The vehicle occupant detection system is configured to: (i) acquire sensor data by scanning the life detection zone using the plurality of life detection sensors; (ii) determine whether an occupant is present based on the sensor data; and (iii) provide an indication to a user that an occupant is present using the HMI output device when it is determined that an occupant is present.

Abstract: A vehicle occupant detection system and method for using the same. The vehicle occupant detection system includes: a controller; a plurality of life detection sensors, wherein the plurality of life detection sensors are installed within an interior cabin of a mass-transit vehicle and are each associated with a life detection zone; a local warning system having at least one human-machine interface (HMI) output device; and a vehicle interface that communicatively couples the controller to a vehicle electrical system of the mass-transit vehicle. The vehicle occupant detection system is configured to: (i) acquire sensor data by scanning the life detection zone using the plurality of life detection sensors; (ii) determine whether an occupant is present based on the sensor data; and (iii) provide an indication to a user that an occupant is present using the HMI output device when it is determined that an occupant is present.

Abstract: The various implementations described herein include methods, devices, and systems for starting-up a vehicle air-conditioning system. In one aspect, a method is performed at a vehicle air-conditioning system including a blower fan, a condenser fan, and a compressor electrically coupled to a battery system. The method includes: (1) starting the blower fan; (2) after starting the blower fan, measuring a first current drawn from the battery system, the first current indicative of current drawn by the blower fan; (3) in accordance with a determination that the first current meets predefined criteria, starting the condenser fan; (4) after starting the condenser fan, measuring a second current drawn from the battery system, where the difference between the second current and the first current is indicative of current drawn by the condenser fan; and (5) in accordance with a determination that the second current meets predefined second criteria, starting the compressor.

Abstract: The various implementations described herein include methods, devices, and systems for starting-up a vehicle air-conditioning system. In one aspect, a method is performed at a vehicle air-conditioning system including a blower fan, a condenser fan, and a compressor electrically coupled to a battery system. The method includes: (1) starting the blower fan; (2) after starting the blower fan, measuring a first current drawn from the battery system, the first current indicative of current drawn by the blower fan; (3) in accordance with a determination that the first current meets predefined criteria, starting the condenser fan; (4) after starting the condenser fan, measuring a second current drawn from the battery system, where the difference between the second current and the first current is indicative of current drawn by the condenser fan; and (5) in accordance with a determination that the second current meets predefined second criteria, starting the compressor.

Abstract: An EUV light source is disclosed which may comprise a plurality of targets, e.g., tin droplets, and a system generating pre-pulses and main-pulses with the pre-pulses for irradiating targets to produce expanded targets. The system may further comprise a continuously pumped laser device generating the main pulses with the main pulses for irradiating expanded targets to produce a burst of EUV light pulses. The system may also have a controller varying at least one pre-pulse parameter during the burst of EUV light pulses. In addition, the EUV light source may also include an instrument measuring an intensity of at least one EUV light pulse within a burst of EUV light pulses and providing a feedback signal to the controller to vary at least one pre-pulse parameter during the burst of EUV light pulses to produce a burst of EUV pulses having a pre-selected dose.

Abstract: An EUV light source is disclosed which may comprise a plurality of targets, e.g., tin droplets, and a system generating pre-pulses and main-pulses with the pre-pulses for irradiating targets to produce expanded targets. The system may further comprise a continuously pumped laser device generating the main pulses with the main pulses for irradiating expanded targets to produce a burst of EUV light pulses. The system may also have a controller varying at least one pre-pulse parameter during the burst of EUV light pulses. In addition, the EUV light source may also include an instrument measuring an intensity of at least one EUV light pulse within a burst of EUV light pulses and providing a feedback signal to the controller to vary at least one pre-pulse parameter during the burst of EUV light pulses to produce a burst of EUV pulses having a pre-selected dose.

Abstract: An EUV light source is disclosed which may comprise a plurality of targets, e.g., tin droplets, and a system generating pre-pulses and main-pulses with the pre-pulses for irradiating targets to produce expanded targets. The system may further comprise a continuously pumped laser device generating the main pulses with the main pulses for irradiating expanded targets to produce a burst of EUV light pulses. The system may also have a controller varying at least one pre-pulse parameter during the burst of EUV light pulses. In addition, the EUV light source may also include an instrument measuring an intensity of at least one EUV light pulse within a burst of EUV light pulses and providing a feedback signal to the controller to vary at least one pre-pulse parameter during the burst of EUV light pulses to produce a burst of EUV pulses having a pre-selected dose.

Abstract: Systems and methods are disclosed for reducing the influence of plasma generated debris on internal components of an EUV light source. In one aspect, an EUV metrology monitor is provided which may have a heater to heat an internal multi-layer filtering mirror to a temperature sufficient to remove deposited debris from the mirror. In another aspect, a device is disclosed for removing plasma generated debris from an EUV light source collector mirror having a different debris deposition rate at different zones on the collector mirror. In a particular aspect, an EUV collector mirror system may comprise a source of hydrogen to combine with Li debris to create LiH on a collector surface; and a sputtering system to sputter LiH from the collector surface. In another aspect, an apparatus for etching debris from a surface of a EUV light source collector mirror with a controlled plasma etch rate is disclosed.

Abstract: An EUV light source and method of operating same is disclosed which may comprise: an EUV plasma production chamber comprising a chamber wall comprising an exit opening for the passage of produced EUV light focused to a focus point; a first EUV exit sleeve comprising a terminal end comprising an opening facing the exit opening; a first exit sleeve chamber housing the first exit sleeve and having an EUV light exit opening; a gas supply mechanism supplying gas under a pressure higher than the pressure within the plasma production chamber to the first exit sleeve chamber. The first exit sleeve may be tapered toward the terminal end opening, and may, e.g., be conical in shape comprising a narrowed end at the terminal end.

Abstract: An EUV light source is disclosed which may comprise a plurality of targets, e.g., tin droplets, and a system generating pre-pulses and main-pulses with the pre-pulses for irradiating targets to produce expanded targets. The system may further comprise a continuously pumped laser device generating the main pulses with the main pulses for irradiating expanded targets to produce a burst of EUV light pulses. The system may also have a controller varying at least one pre-pulse parameter during the burst of EUV light pulses. In addition, the EUV light source may also include an instrument measuring an intensity of at least one EUV light pulse within a burst of EUV light pulses and providing a feedback signal to the controller to vary at least one pre-pulse parameter during the burst of EUV light pulses to produce a burst of EUV pulses having a pre-selected dose.

Abstract: Systems and methods are disclosed for protecting an EUV light source plasma production chamber optical element surface from debris generated by plasma formation. In one aspect of an embodiment of the present invention, a shield is disclosed which comprises at least one hollow tube positioned between the optical element and a plasma formation site. The tube is oriented to capture debris while allowing light to pass through the tube's lumen via reflection at relatively small angles of grazing incidence. In another aspect of an embodiment of the present invention, a shield is disclosed which is heated to a temperature sufficient to remove one or more species of debris material that has deposited on the shield. In yet another aspect of an embodiment of the present invention, a system is disclosed which a shield is moved from a light source plasma chamber to a cleaning chamber where the shield is cleaned.

Abstract: Systems and methods are disclosed for protecting an EUV light source plasma production chamber optical element surface from debris generated by plasma formation. In one aspect of an embodiment of the present invention, a shield is disclosed which comprises at least one hollow tube positioned between the optical element and a plasma formation site. The tube is oriented to capture debris while allowing light to pass through the tube's lumen via reflection at relatively small angles of grazing incidence. In another aspect of an embodiment of the present invention, a shield is disclosed which is heated to a temperature sufficient to remove one or more species of debris material that has deposited on the shield. In yet another aspect of an embodiment of the present invention, a system is disclosed which a shield is moved from a light source plasma chamber to a cleaning chamber where the shield is cleaned.

Abstract: In a method of generating X-ray or EUV radiation, a substance is urged through an outlet to generate a jet in a direction from the outlet, at least one energy beam is directed onto the jet, the energy beam interacting with the jet to generate the X-ray or EUV radiation, and the temperature of the outlet is controlled, such that the stability of the jet is improved. An apparatus is also disclosed.

Abstract: A method and an apparatus is designed to produce X-ray or EUV radiation for use in lithography, microscopy, materials science, or medical diagnostics. The radiation is produced by urging a substance through an outlet (6) to generate a microscopic jet (2) in a direction from the outlet (6), and by directing at least one energy beam (1′) onto the jet (2), wherein the energy beam (1′) interacts with the jet (2) to produce the X-ray or EUV radiation. The temperature of the outlet (6) is controlled to increase the directional stability of the jet (2). The thus-achieved directional stability of the jet (2) provides for reduced pulse-to-pulse fluctuations of the produced radiation, improved spatial stability of the radiation source, as well as high average power since the energy beam (1′) can be tightly focused on the jet (2), even at a comparatively large distance from the jet-generating outlet (6).