Patents by Inventor Bo Chen CHEN
Bo Chen CHEN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11958090Abstract: The present disclosure relates to an apparatus and a method for wafer cleaning. The apparatus can include a wafer holder configured to hold a wafer; a cleaning nozzle configured to dispense a cleaning fluid onto a first surface (e.g., front surface) of the wafer; and a cleaning brush configured to clean a second surface (e.g., back surface) of the wafer. Using the cleaning fluid, the cleaning brush can clean the second surface of the wafer with a scrubbing motion and ultrasonic vibration.Type: GrantFiled: July 28, 2022Date of Patent: April 16, 2024Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Bo Chen Chen, Sheng-Wei Wu, Yung-Li Tsai
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Patent number: 11930663Abstract: A display panel includes a first substrate, pixel structures, a first common pad, a second substrate, a second common electrode, a display medium and a conductive particle. The pixel structures are disposed on an active area of the first substrate. The first common pad is disposed on a peripheral area of the first substrate, and is electrically connected to first common electrodes of the pixel structures. The second common electrode is disposed on the second substrate. The conductive particle is disposed on the first common pad, and is electrically connected to the first common pad and the second common electrode. The conductive particle includes a core and a conductive film disposed on a surface of the core, where the conductive film has a main portion and raised portions, and a film thickness of each of the raised portions is greater than a film thickness of the main portion.Type: GrantFiled: April 9, 2021Date of Patent: March 12, 2024Assignee: Au Optronics CorporationInventors: Bo-Chen Chen, Yun-Ru Cheng, Ya-Ling Hsu, Chia-Hsuan Pai, Cheng-Wei Huang, Wei-Shan Chao
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Publication number: 20230317497Abstract: A display apparatus includes a carrier base, a pixel driving circuit, an insulating layer, a pad group, a light-emitting element, and a first fixing element. The pixel driving circuit is disposed on the carrier base. The insulating layer is disposed on the pixel driving circuit. The pad group is disposed on the insulating layer and is electrically connected to the pixel driving circuit. The light-emitting element is electrically connected to the pad group. The first fixing element is disposed on the insulating layer and at least located on two opposite sides of the pad group. In a direction perpendicular to the carrier base, the light-emitting element has a height HLED, the first fixing element has a height HPS1, a pad of the pad group has a thickness HPAD. HLED, HPS1, and HPAD satisfy: H L E D ? _ H P S 1 ? _ 1.4 ? H L E D + H P A D . Or, HLED, HPS1, and HPAD satisfy: H L E D + 90 ? m ? _ H P S 1 ? _ 1.4 ? H L E D + H P A D + 90 ? m .Type: ApplicationFiled: December 7, 2022Publication date: October 5, 2023Applicant: AUO CorporationInventors: Bo-Chen Chen, Yu Ting Chen
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Patent number: 11766703Abstract: The present disclosure relates to an apparatus and a method for wafer cleaning. The apparatus can include a wafer holder configured to hold a wafer; a cleaning nozzle configured to dispense a cleaning fluid onto a first surface (e.g., front surface) of the wafer; and a cleaning brush configured to clean a second surface (e.g., back surface) of the wafer. Using the cleaning fluid, the cleaning brush can clean the second surface of the wafer with a scrubbing motion and ultrasonic vibration.Type: GrantFiled: August 6, 2019Date of Patent: September 26, 2023Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Bo Chen Chen, Sheng-Wei Wu, Yung-Li Tsai
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Publication number: 20230017404Abstract: The present disclosure relates to an apparatus and a method for wafer cleaning. The apparatus can include a wafer holder configured to hold a wafer; a cleaning nozzle configured to dispense a cleaning fluid onto a first surface (e.g., front surface) of the wafer; and a cleaning brush configured to clean a second surface (e.g., back surface) of the wafer. Using the cleaning fluid, the cleaning brush can clean the second surface of the wafer with a scrubbing motion and ultrasonic vibration.Type: ApplicationFiled: July 28, 2022Publication date: January 19, 2023Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: BO CHEN CHEN, Sheng-Wei Wu, Yung-Li Tsai
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Publication number: 20220208581Abstract: The present disclosure relates to a contamination controlled semiconductor processing system. The contamination controlled semiconductor processing system includes a processing chamber, a contamination detection system, and a contamination removal system. The processing chamber is configured to process a wafer. The contamination detection system is configured to determine whether a contamination level on a surface of the door is greater than a baseline level. The contamination removal system is configured to remove contaminants from the surface of the door in response to the contamination level being greater than the baseline level.Type: ApplicationFiled: March 21, 2022Publication date: June 30, 2022Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Bo Chen CHEN, Sheng-Wei Wu, Yung-Li Tsai
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Patent number: 11282728Abstract: The present disclosure relates to a contamination controlled semiconductor processing system. The contamination controlled semiconductor processing system includes a processing chamber, a contamination detection system, and a contamination removal system. The processing chamber is configured to process a wafer. The contamination detection system is configured to determine whether a contamination level on a surface of the door is greater than a baseline level. The contamination removal system is configured to remove contaminants from the surface of the door in response to the contamination level being greater than the baseline level.Type: GrantFiled: June 10, 2019Date of Patent: March 22, 2022Inventors: Bo Chen Chen, Sheng-Wei Wu, Yung-Li Tsai
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Publication number: 20220013592Abstract: A display panel includes a first substrate, pixel structures, a first common pad, a second substrate, a second common electrode, a display medium and a conductive particle. The pixel structures are disposed on an active area of the first substrate. The first common pad is disposed on a peripheral area of the first substrate, and is electrically connected to first common electrodes of the pixel structures. The second common electrode is disposed on the second substrate. The conductive particle is disposed on the first common pad, and is electrically connected to the first common pad and the second common electrode. The conductive particle includes a core and a conductive film disposed on a surface of the core, where the conductive film has a main portion and raised portions, and a film thickness of each of the raised portions is greater than a film thickness of the main portion.Type: ApplicationFiled: April 9, 2021Publication date: January 13, 2022Applicant: Au Optronics CorporationInventors: Bo-Chen Chen, Yun-Ru Cheng, Ya-Ling Hsu, Chia-Hsuan Pai, Cheng-Wei Huang, Wei-Shan Chao
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Patent number: 10943804Abstract: The present disclosure describes a method for controlling a wet processing system includes dispensing one or more chemicals into a processing chamber according to one or more process parameters. The method also includes injecting one or more illumination markers into the processing chamber and obtaining images representing locations of the one or more illumination markers. The method further includes determining a trajectory of an illumination marker of the one or more illumination markers based on the images and determining whether the determined trajectory is outside a predetermined trajectory range. In response to the determined trajectory being outside the predetermined trajectory range, the method further includes adjusting the one or more process parameters.Type: GrantFiled: June 27, 2019Date of Patent: March 9, 2021Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Bo-Chen Chen, Sheng-Wei Wu, Yung-Li Tsai
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Publication number: 20200058521Abstract: In an embodiment, a system includes: a pedestal configured to secure a wafer; a nozzle configured to deposit a cleaning solution on the wafer disposed on the pedestal during a cleaning session; and a plurality of contacts configured to secure the wafer to the pedestal while the cleaning solution is deposited on the wafer, wherein a first subset of the plurality of contacts is configured to contact the wafer at a first time interval and a second subset of the plurality of contacts is configured to contact the wafer at a second time interval.Type: ApplicationFiled: August 13, 2019Publication date: February 20, 2020Inventors: Kun-Hsiung SHIH, Bo-Chen CHEN, Yung-Li TSAI, Chui-Ya PENG
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Publication number: 20200055099Abstract: The present disclosure relates to an apparatus and a method for wafer cleaning. The apparatus can include a wafer holder configured to hold a wafer; a cleaning nozzle configured to dispense a cleaning fluid onto a first surface (e.g., front surface) of the wafer; and a cleaning brush configured to clean a second surface (e.g., back surface) of the wafer. Using the cleaning fluid, the cleaning brush can clean the second surface of the wafer with a scrubbing motion and ultrasonic vibration.Type: ApplicationFiled: August 6, 2019Publication date: February 20, 2020Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Bo Chen CHEN, Sheng-Wei WU, Yung-Li TSAI
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Publication number: 20200006101Abstract: The present disclosure describes a method for controlling a wet processing system includes dispensing one or more chemicals into a processing chamber according to one or more process parameters. The method also includes injecting one or more illumination markers into the processing chamber and obtaining images representing locations of the one or more illumination markers. The method further includes determining a trajectory of an illumination marker of the one or more illumination markers based on the images and determining whether the determined trajectory is outside a predetermined trajectory range. In response to the determined trajectory being outside the predetermined trajectory range, the method further includes adjusting the one or more process parameters.Type: ApplicationFiled: June 27, 2019Publication date: January 2, 2020Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Bo Chen CHEN, Sheng-Wei Wu, Yung-Li Tsai
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Publication number: 20200006104Abstract: The present disclosure relates to a contamination controlled semiconductor processing system. The contamination controlled semiconductor processing system includes a processing chamber, a contamination detection system, and a contamination removal system. The processing chamber is configured to process a wafer. The contamination detection system is configured to determine whether a contamination level on a surface of the door is greater than a baseline level. The contamination removal system is configured to remove contaminants from the surface of the door in response to the contamination level being greater than the baseline level.Type: ApplicationFiled: June 10, 2019Publication date: January 2, 2020Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Bo Chen Chen, Sheng-Wei Wu, Yung-Li Tsai