Patents by Inventor Bo-Gyu Lim

Bo-Gyu Lim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230399581
    Abstract: A detergent composition may include 10 to 30% by weight of octylphenol ethoxylate, 0.1 to 5% by weight of 2-ethylhexyl alcohol ethoxylate, 0.1 to 5% by weight of ethylene oxide-propylene oxide block copolymer, and the balance of water, based on a total 100% by weight of the composition. The detergent composition may have an excellent virus removal effect in which more than 99.99% of corona virus is removed in 30 seconds. At the same time, provided is a safe detergent composition which has selective properties of not killing various bacteria, and satisfies skin hypoallergenic properties. In addition, the detergent composition is used for various purposes, such as removal of corona virus, removal of oil stains, removal of kitchen dirt, bathroom cleaning, cleaning of mechanical equipment and parts, and removal of oil stains on clothes, and exhibits excellent cleaning ability.
    Type: Application
    Filed: October 22, 2021
    Publication date: December 14, 2023
    Inventors: Jong Mok PARK, Ho Youl KONG, Bo Gyu LIM, Seo Hyun JUNG, Yu Jin JUNG, Sung Chul KIM
  • Patent number: 7719002
    Abstract: Disclosed herein are a perfluoroalkyleneoxy group-substituted phenylethylsilane compound and a polymer thereof. The perfluoroalkyleneoxy group-substituted phenylethylsilane compound represented by Formula 1 has excellent thermal and chemical stability to be solution-processed in a monomer state, and the polymer prepared by thermally crosslinking the compound has a high resistance to organic solvents. Moreover, since an insulating layer prepared by applying the same shows improved thermal and physical properties, it is possible to manufacture organic thin-film transistors having a high on/off ratio in a simple process such as a photolithography for a large-size substrate: wherein R1, R2, R3, Z1, Z2, Z3, and n are the same as defined in the detailed description of the invention.
    Type: Grant
    Filed: August 31, 2007
    Date of Patent: May 18, 2010
    Assignee: Gwangju Institute of Science and Technology
    Inventors: Dong-Yu Kim, Ji-Eun Ghim, Chae-Min Chun, Bo-Gyu Lim
  • Publication number: 20080139766
    Abstract: Disclosed herein are a perfluoroalkyleneoxy group-substituted phenylethylsilane compound and a polymer thereof. The perfluoroalkyleneoxy group-substituted phenylethylsilane compound represented by Formula 1 has excellent thermal and chemical stability to be solution-processed in a monomer state, and the polymer prepared by thermally crosslinking the compound has a high resistance to organic solvents. Moreover, since an insulating layer prepared by applying the same shows improved thermal and physical properties, it is possible to manufacture organic thin-film transistors having a high on/off ratio in a simple process such as a photolithography for a large-size substrate: wherein R1, R2, R3, Z1, Z2, Z3, and n are the same as defined in the detailed description of the invention.
    Type: Application
    Filed: August 31, 2007
    Publication date: June 12, 2008
    Inventors: Dong-Yu Kim, Ji-Eun Ghim, Chae-Min Chun, Bo-Gyu Lim