Patents by Inventor Bo-Nan LIN

Bo-Nan LIN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Black photosensitive resin composition and light-blocking layer using the same
    Patent number: 9085696
    Abstract: The present invention provides a novel black photosensitive resin composition, which includes: a polysiloxane, a black pigment, an alkali-soluble resin, a photopolymerizable compound, a photopolymerization initiator and a solvent. Accordingly, the black photosensitive resin composition of the present invention can meet the requirements for optical density and resistance under high temperature and is advantageous to the application in a touch panel. In addition, the present invention further provides a light-blocking layer that is manufactured from the black photosensitive resin composition.
    Type: Grant
    Filed: April 10, 2013
    Date of Patent: July 21, 2015
    Assignee: EVERLIGHT USA, INC.
    Inventors: Fan-Sen Lin, Hui-Huan Hsu, Bo-Nan Lin, Chih-Yi Chang
  • BLACK PHOTOSENSITIVE RESIN COMPOSITION AND LIGHT-BLOCKING LAYER USING THE SAME
    Publication number: 20140100301
    Abstract: The present invention provides a novel black photosensitive resin composition, which includes: a polysiloxane, a black pigment, an alkali-soluble resin, a photopolymerizable compound, a photopolymerization initiator and a solvent. Accordingly, the black photosensitive resin composition of the present invention can meet the requirements for optical density and resistance under high temperature and is advantageous to the application in a touch panel. In addition, the present invention further provides a light-blocking layer that is manufactured from the black photosensitive resin composition.
    Type: Application
    Filed: April 10, 2013
    Publication date: April 10, 2014
    Applicant: Everlight USA, Inc.
    Inventors: Fan-Sen LIN, Hui-Huan HSU, Bo-Nan LIN, Chih-Yi CHANG