Abstract: The present invention is related to a novel positive electrode active material for lithium-ion battery. The positive electrode active material is expressed by the following formula: Li1.2NixMn0.8-x-yZnyO2, wherein x and y satisfy 0<x?0.8 and 0<y?0.1. In addition, the present invention provides a method of manufacturing the positive electrode active material. The present invention further provides a lithium-ion battery which uses said positive electrode active material.

Abstract: A method and a system for simulating contact and interaction between a support member and a chamber surrounding rock mass are provided in the application.

Abstract: A display panel includes an active area and a peripheral area surrounding the active area, and the display panel further includes: a substrate and a plurality of light emitting devices arranged on the substrate in array, wherein the plurality of light emitting devices are located at least in the active area; a conducting layer comprising a cathode ring and cathodes of the plurality of light emitting devices, wherein the cathode ring is located in the peripheral area, and the cathode ring surrounds the active area; and a lens layer located at a side of the light emitting devices away from the substrate, wherein the lens layer extends from the active area to the peripheral area; wherein an orthographic projection of the lens layer on the substrate is located within an area delineated by an outer contour of an orthographic projection of the cathode ring on the substrate.

Abstract: A semiconductor package may comprise: a first passivation layer forming an electrical connection with one or more first bumps; a substrate layer including a second passivation layer and a silicon layer; a back-end-of-line (BEOL) layer formed on the substrate layer; and a third passivation layer formed on the BEOL layer forming an electrical connection with one or more second bumps, wherein the substrate layer includes a first signal TSV (Through Silicon Via) which transmits a first signal between the BEOL layer and a first lower pad, a second signal TSV which transmits a second signal between the BEOL layer and a second lower pad, and a ground TSV which is disposed between the first signal TSV and the second signal TSV and formed so that one end thereof is connected to the BEOL layer and the other end thereof floats.

Abstract: A stack package may include a first substrate package, a second substrate package, an interposer and at least one semiconductor chip. The first substrate package may include a plurality of first pads isolated from direct contact with each other by a first pitch. The second substrate package may be under the first substrate package. The second substrate package may include a plurality of second pads isolated from direct contact with each other by a second pitch. The second pitch may be different from the first pitch. The interposer may be above the first substrate package. The interposer may include a plurality of third pads isolated from direct contact with each other by a third pitch. The semiconductor chip may be arranged above the interposer.

Abstract: A method of modeling a high speed channel in a semiconductor package, the high speed channel including a plurality of first connection wirings on an upper surface of a semiconductor substrate and a plurality of through electrodes penetrating the semiconductor substrate, includes: receiving design information of the high speed channel, dividing the design information into a first layout including the plurality of first connection wirings and a second layout including the plurality of through electrodes; performing a first modeling operation on the first layout using a first modeling scheme and a first modeling tool; performing a second modeling operation on the second layout using a second modeling scheme, a second modeling tool, and at least a portion of the first layout; and obtaining an integrated modeling result of an entirety of the high speed channel by combining results of the first and second modeling operations.

Abstract: A method of modeling a high speed channel in a semiconductor package, the high speed channel including a plurality of first connection wirings on an upper surface of a semiconductor substrate and a plurality of through electrodes penetrating the semiconductor substrate, includes: receiving design information of the high speed channel, dividing the design information into a first layout including the plurality of first connection wirings and a second layout including the plurality of through electrodes; performing a first modeling operation on the first layout using a first modeling scheme and a first modeling tool; performing a second modeling operation on the second layout using a second modeling scheme, a second modeling tool, and at least a portion of the first layout; and obtaining an integrated modeling result of an entirety of the high speed channel by combining results of the first and second modeling operations.

Abstract: A stack package may include a first substrate package, a second substrate package, an interposer and at least one semiconductor chip. The first substrate package may include a plurality of first pads isolated from direct contact with each other by a first pitch. The second substrate package may be under the first substrate package. The second substrate package may include a plurality of second pads isolated from direct contact with each other by a second pitch. The second pitch may be different from the first pitch. The interposer may be above the first substrate package. The interposer may include a plurality of third pads isolated from direct contact with each other by a third pitch. The semiconductor chip may be arranged above the interposer.

Abstract: A semiconductor package may comprise: a first passivation layer forming an electrical connection with one or more first bumps; a substrate layer including a second passivation layer and a silicon layer; a back-end-of-line (BEOL) layer formed on the substrate layer; and a third passivation layer formed on the BEOL layer forming an electrical connection with one or more second bumps, wherein the substrate layer includes a first signal TSV (Through Silicon Via) which transmits a first signal between the BEOL layer and a first lower pad, a second signal TSV which transmits a second signal between the BEOL layer and a second lower pad, and a ground TSV which is disposed between the first signal TSV and the second signal TSV and formed so that one end thereof is connected to the BEOL layer and the other end thereof floats.

Abstract: A media diversion apparatus for a printing system is described. In an example implementation, the apparatus comprises a media diverter to route media printed by a print assembly of a printing system. The media diverter, in a first position, is to route cut-sheet media from the print assembly to a first output region. The media diverter, in a second position, is to route roll media from the print assembly to a second output region.

Abstract: A media diversion apparatus for a printing system is described. In an example implementation, the apparatus comprises a media diverter to route media printed by a print assembly of a printing system. The media diverter, in a first position, is to route cut-sheet media from the print assembly to a first output region. The media diverter, in a second position, is to route roll media from the print assembly to a second output region.