Patents by Inventor Bo-Wei Wu

Bo-Wei Wu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210020816
    Abstract: A semiconductor structure includes a substrate, a plurality of micro semiconductor devices and a fixing structure. The micro semiconductor devices are disposed on the substrate. The fixing structure is disposed between the substrate and the micro semiconductor devices. The fixing structure includes a plurality of conductive layers and a plurality of supporting layers. The conductive layers are disposed on the lower surfaces of the micro semiconductor devices. The supporting layers are connected to the conductive layers and the substrate. The material of each of the conductive layers is different from the material of each of the supporting layers.
    Type: Application
    Filed: September 27, 2019
    Publication date: January 21, 2021
    Applicant: PlayNitride Display Co., Ltd.
    Inventors: Shiang-Ning YANG, Chih-Ling WU, Yi-Min SU, Bo-Wei WU
  • Publication number: 20200259050
    Abstract: A micro light emitting device display apparatus including a circuit substrate, a plurality of micro light emitting devices, a first common electrode layer, and a second common electrode layer is provided. The micro light emitting devices are disposed on the circuit substrate and individually include an epitaxial structure and a first-type electrode and a second-type electrode respectively disposed on two side surfaces of the epitaxial structure opposite to each other. The first common electrode layer is disposed on the circuit substrate and directly covers the plurality of first-type electrodes of the micro light emitting devices. The second common electrode layer is disposed between the micro light emitting devices. The first common electrode layer is electrically connected to the second common electrode layer.
    Type: Application
    Filed: April 30, 2020
    Publication date: August 13, 2020
    Applicant: PlayNitride Display Co., Ltd.
    Inventors: Chih-Ling Wu, Yen-Yeh Chen, Yi-Min Su, Yi-Chun Shih, Bo-Wei Wu, Yu-Yun Lo, Ying-Ting Lin, Tzu-Yang Lin
  • Patent number: 10446694
    Abstract: A field-effect transistor structure having two-dimensional transition metal dichalcogenides includes a substrate, a source/drain structure, a two-dimensional (2D) channel layer, and a gate layer. The source/drain structure is disposed on the substrate and has a surface higher than a surface of the substrate. The 2D channel layer is disposed on the source and the drain and covers the space between the source and the drain. The gate layer is disposed between the source and the drain and covers the 2D channel layer. The field-effect transistor having two-dimensional transition metal dichalcogenides is a planar field-effect transistor or a fin field-effect transistor.
    Type: Grant
    Filed: June 13, 2017
    Date of Patent: October 15, 2019
    Assignee: National Applied Research Laboratories
    Inventors: Kai-Shin Li, Bo-Wei Wu, Min-Cheng Chen, Jia-Min Shieh, Wen-Kuan Yeh
  • Publication number: 20180358474
    Abstract: A field-effect transistor structure having two-dimensional transition metal dichalcogenides includes a substrate, a source/drain structure, a two-dimensional (2D) channel layer, and a gate layer. The source/drain structure is disposed on the substrate and has a surface higher than a surface of the substrate. The 2D channel layer is disposed on the source and the drain and covers the space between the source and the drain. The gate layer is disposed between the source and the drain and covers the 2D channel layer. The field-effect transistor having two-dimensional transition metal dichalcogenides is a planar field-effect transistor or a fin field-effect transistor.
    Type: Application
    Filed: June 13, 2017
    Publication date: December 13, 2018
    Inventors: Kai-Shin Li, Bo-Wei Wu, Min-Cheng Chen, Jia-Min Shieh, Wen-Kuan Yeh
  • Publication number: 20180312791
    Abstract: A reaction device for a tiny organism includes a chamber, a first support plate, a second support plate and a separation plate. The tiny organism and a culture medium are added in the chamber. The first support plate is disposed on an opening of the chamber. The second support plate is disposed on one side opposite to the side on which the first support plate is disposed, and a third hole and a fourth hole separately correspond to a first hole and a second hole of the first support plate. A first end of the separation plate is located inside the chamber, the first end of the separation plate is spaced from the bottom of the chamber by a predetermined distance, a second end of the separation plate passes through the first support plate to connect to the second support plate.
    Type: Application
    Filed: December 5, 2017
    Publication date: November 1, 2018
    Inventors: Yu-Tzu Huang, Wen-Yaw Chung, Bo-Wei Wu, Jyun-Ting Lai, Jie-Ru Xu