Abstract: Disclosed herein are an apparatus and method for processing vehicle data security based on a cloud.

Abstract: An image processing device including: a gain value manager for generating white gain values corresponding to a plurality of positions, based on a sensing result of a predetermined white image; a target pixel manager for detecting saturated pixels, based on pixel values received from an external device, and determining target pixels as saturated white pixels of which each have a pixel value that indicates that the saturated white pixel is saturated, based on peripheral pixels of the saturated white pixels among the detected saturated pixels; and a target pixel corrector for changing pixel values of the target pixels, based on the white gain values and pixel values of the peripheral pixels.

Abstract: A display device includes a scan driver to supply scan signals to first and second scan lines, a data driver to supply a data signal to data lines, a sensor connected to sensing lines, and pixels including a light-emitting element, a driving transistor to control an amount of current supplied to the light-emitting element in response to a voltage of a first node, a switching transistor between a j-th data line and the first node, and including a gate electrode coupled to an i-th first scan line, and a sensing transistor coupled between a second node, which is between the light-emitting element and the driving transistor, and a k-th sensing line, and including a gate electrode coupled to an i-th second scan line, and wherein the sensor is to sense deterioration information of the light-emitting element in a state in which the switching and sensing transistors are turned on.

Abstract: A display device includes pixels each including a driving transistor and a light-emitting element, a sensing unit which generates a digital data by receiving a sensing voltage corresponding to a characteristic of a driving transistor from a predetermined pixel among the pixels during a sensing period, and generates sensing data using the digital data, and a timing controller which receives input data from an outside, corrects the input data using the sensing data and generates output data, and the sensing unit generates one sensing data using two or more digital data corresponding to the predetermined pixel.

Abstract: A cleaning solution for a quartz part and a method for cleaning the quartz part are provided. The cleaning solution includes from about 5 to about 35 wt % of an ammonium compound, from about 7 to about 55 wt % of an acidic oxidizing agent, from about 5 to about 30 wt % of a fluorine compound and a remaining amount of water. Residual thin films and impurities on the surface of the quartz part may be removed while reducing the damage onto the quartz part.

Abstract: A cleaning solution for a quartz part and a method for cleaning the quartz part are provided. The cleaning solution includes from about 5 to about 35 wt % of an ammonium compound, from about 7 to about 55 wt % of an acidic oxidizing agent, from about 5 to about 30 wt % of a fluorine compound and a remaining amount of water. Residual thin films and impurities on the surface of the quartz part may be removed while reducing the damage onto the quartz part.

Abstract: A composition for cleaning a probe card that may be a part of a semiconductor probe system and a method of cleaning the probe card using the composition is provided. In one embodiment, the composition includes a basic compound, an alcohol compound, and water. The composition for cleaning the probe card may prevent the probe card from being worn away or corroded, and may effectively remove impurities such as aluminum, aluminum oxide, or organic impurities from the probe card.

Abstract: A drying system for drying a semiconductor substrate is provided. The drying system includes: a chamber for housing a vapor distributor and a fluid bath, said fluid bath being disposed in a lower portion of the chamber and said distributor being disposed in an upper portion of the chamber for distributing vapor for drying the substrate; and a fluid flow system for supplying fluid flow into said fluid bath for cleaning and drying the substrate and for draining said fluid from the fluid bath, wherein the chamber includes a plurality of exhaust vents disposed at the upper portion for venting the vapor.

Abstract: A drying system for drying a semiconductor substrate is provided. The drying system includes: a chamber for housing a vapor distributor and a fluid bath, said fluid bath being disposed in a lower portion of the chamber and said distributor being disposed in an upper portion of the chamber for distributing vapor for drying the substrate; and a fluid flow system for supplying fluid flow into said fluid bath for cleaning and drying the substrate and for draining said fluid from the fluid bath, wherein the chamber includes a plurality of exhaust vents disposed at the upper portion for venting the vapor.

Abstract: A thinner composition for removing photoresist, a rework method for wafers, and a method of manufacturing semiconductor devices are provided. The thinner composition is applied for removing excess photoresist coated on the edge side or back side of wafer. The thinner may be a mixture of ethyl lactate (EL), ethyl-3-ethoxy propionate (EEP), and .tau.-butyro lactone (GBL), or a mixture of ethyl lactate (EL), and ethyl-3-ethoxy propionate (EEP), or a mixture of ethyl lactate (EL), and ethyl-3-ethoxy propionate (EEP). The rework process is carried out, using the above thinner compositions, on the wafers having excess coated photoresist due to an etching failure. The method of manufacturing semiconductor devices includes a rinsing step for removing the excess coated photoresist on the edge side or back side of wafer by using the above thinner compositions.