Patents by Inventor Bo Yun Choi

Bo Yun Choi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8334092
    Abstract: The present invention relates to a photo-sensitive resin composition having superior heat-resistant and mechanical property, and a protective film for printed circuit board, and particularly provides a photo-sensitive resin composition including an acid-modified oligomer, a photo-polymerizable monomer, a photo-initiator, an epoxy resin, and a butadiene-modified epoxy resin including epoxy group and at least one double bond in the main chain, and a protective film for printed circuit board prepared by using the composition.
    Type: Grant
    Filed: June 20, 2011
    Date of Patent: December 18, 2012
    Assignee: LG Chem, Ltd.
    Inventors: Bo-Yun Choi, Byung-Ju Choi, Woo-Jae Jeong, Kwang-Joo Lee, Min-Su Jeong
  • Publication number: 20120070780
    Abstract: The present invention relates to a photosensitive resin composition including an acid modified oligomer, a photopolymerizable monomer, a thermosetting binder resin, a photoinitiator, and a thioxanthone compound, a dry film solder resist obtained from the resin composition, and a circuit board including the dry film solder resist.
    Type: Application
    Filed: September 16, 2011
    Publication date: March 22, 2012
    Applicant: LG CHEM, LTD.
    Inventors: Bo-Yun CHOI, Byung-Ju CHOI, Woo-Jae JEONG, Kwang-Joo LEE, Min-Su JEONG
  • Publication number: 20110269866
    Abstract: The present invention relates to a photo-curable and thermo-curable resin composition and a dry film solder resist make it possible to provide the dry film solder resist having superior heat-resistance and dimensional stability while exhibiting more improved alkali developing property. The resin composition may comprises an acid-modified oligomer having carboxyl group (—COOH) and photo-curable functional group; a photo-polymerizable monomer comprising a compound having a structure of that 3- or more functional epoxy acrylate groups are bonded to a heterocyclic structure containing nitrogen, and a functional group having carboxyl group is bonded to at least one epoxy acrylate group; a thermo-curable binder having thermo-curable functional group; and a photo-initiator.
    Type: Application
    Filed: July 11, 2011
    Publication date: November 3, 2011
    Applicant: LG CHEM, LTD.
    Inventors: Woo-Jae JEONG, Byung-Ju CHOI, Bo-Yun CHOI, Kwang-Joo LEE, Min-Su JEONG
  • Publication number: 20110245363
    Abstract: The present invention relates to a photo-sensitive resin composition having superior heat-resistant and mechanical property, and a protective film for printed circuit board, and particularly provides a photo-sensitive resin composition including an acid-modified oligomer, a photo-polymerizable monomer, a photo-initiator, an epoxy resin, and a butadiene-modified epoxy resin including epoxy group and at least one double bond in the main chain, and a protective film for printed circuit board prepared by using the composition.
    Type: Application
    Filed: June 20, 2011
    Publication date: October 6, 2011
    Applicant: LG CHEM, LTD.
    Inventors: Bo-Yun CHOI, Byung-Ju CHOI, Woo-Jae JEONG, Kwang-Joo LEE, Min-Su JEONG
  • Publication number: 20100055401
    Abstract: A method of efficiently manufacturing a film having micro-patterns and an optical film manufactured using the same are used for various optical purposes. The method includes forming a first micro-pattern on one face of the film, and forming a second micro-pattern, which has a geometry equal to that of the first micro-pattern, on the other face of the film by a photo-lithography method using the first micro-pattern formed on one face of the film as a photomask.
    Type: Application
    Filed: March 28, 2008
    Publication date: March 4, 2010
    Applicant: LG CHEM, LTD.
    Inventors: Hyun Seok Choi, Yeon Keun Lee, Chan Hyo Park, Bo Yun Choi, Kwang Joo Lee
  • Patent number: 5657521
    Abstract: A suede-like woven fabric exhibiting a superior resilient elasticity and superior bulkiness may be obtained by a method in which an ultrafine filament yarn, which contains sea and island components having considerably different solubilities to alkali, is mixed with a hollow, high-shrinkable yarn having a greater fineness than the ultrafine filament yarn. The mixed yarn is used as warp and/or weft, thereby obtaining a gray which is then treated to eliminate easy-soluble components. After completing such a micronization, the gray is subjected to a continuous process including a sanding treatment and a dyeing treatment.
    Type: Grant
    Filed: February 8, 1996
    Date of Patent: August 19, 1997
    Assignee: Sunkyong Industries
    Inventors: Young Taek Gwon, Young Soo Oh, Bo Yun Choi, Byoung In Hong, Jong Man Lee