Patents by Inventor Boaz Kenan
Boaz Kenan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 7599075Abstract: Apparatus and techniques for automated optical inspection (AOI) utilizing image scanning modules with multiple objectives for each camera are provided. A scanning mechanism includes optical components to sequentially steer optical signals from each of the multiple objectives to the corresponding camera.Type: GrantFiled: April 8, 2008Date of Patent: October 6, 2009Assignee: Applied Materials, Israel, Ltd.Inventors: Gilad Almogy, Bryan C. Bolt, Oded Arnon, Boaz Kenan, Ehud Tirosh, Michael Corliss
-
Patent number: 7463352Abstract: A method and apparatus for reducing speckle during inspection of articles used in the manufacture of semiconductor devices, including wafers, masks, photomasks, and reticles. The coherence of a light beam output by a coherent light source, such as a pulsed laser, is reduced by disposing elements in a light path. Examples of such elements include optical fiber bundles; optical light guides; optical gratings; an integrating sphere; and an acousto-optic modulator. These various elements may be combined as desired, such that light beams output by the element combinations have optical path length differences that are greater than a coherence length of the light beam output by the coherent light source.Type: GrantFiled: January 21, 2005Date of Patent: December 9, 2008Assignee: Applied Materials, Inc.Inventors: Avner Karpol, Silviu Reinhorn, Emanuel Elysaf, Shimon Yalov, Boaz Kenan
-
Publication number: 20080186556Abstract: Apparatus and techniques for automated optical inspection (AOI) utilizing image scanning modules with multiple objectives for each camera are provided. A scanning mechanism includes optical components to sequentially steer optical signals from each of the multiple objectives to the corresponding camera.Type: ApplicationFiled: April 8, 2008Publication date: August 7, 2008Inventors: Gilad Almogy, Bryan C. Bolt, Oded Arnon, Boaz Kenan, Ehud Tirosh, Michael Corliss
-
Patent number: 7394531Abstract: An automated optical inspection system, comprising at least one camera having a field of view; and at least one image scanning module comprising a plurality of objective modules arranged to have fields of view covering a portion of an article during inspection, and an image selection mirror mechanism, such as a pentaprism movable to sequentially select and transfer images of the fields of view from the objective modules to the at least one camera, and a beam splitter operative to simultaneously direct illumination from at least one illumination source to a portion of the article and to direct an image of the portion of the article to at least one camera, wherein the beam splitter is operative to pivot about at least one axis, thereby to create motion of the image of the article within the field of view of the camera. The objective modules may be arranged in a pair of back-to-back arcs each served by and partially encircling its own optical head.Type: GrantFiled: October 30, 2006Date of Patent: July 1, 2008Assignee: Applied Materials, Inc.Inventors: Ehud Tirosh, Boaz Kenan
-
Patent number: 7355689Abstract: Apparatus and techniques for automated optical inspection (AOI) utilizing image scanning modules with multiple objectives for each camera are provided. A scanning mechanism includes optical components to sequentially steer optical signals from each of the multiple objectives to the corresponding camera.Type: GrantFiled: January 31, 2005Date of Patent: April 8, 2008Assignee: Applied Materials, Inc.Inventors: Gilad Almogy, Bryan C. Bolt, Oded Arnon, Boaz Kenan, Ehud Tirosh, Michael Corliss
-
Publication number: 20070159623Abstract: An automated optical inspection system, comprising at least one camera having a field of view; and at least one image scanning module comprising a plurality of objective modules arranged to have fields of view covering a portion of an article during inspection, and an image selection mirror mechanism, such as a pentaprism movable to sequentially select and transfer images of the fields of view from the objective modules to the at least one camera, and a beam splitter operative to simultaneously direct illumination from at least one illumination source to a portion of the article and to direct an image of the portion of the article to at least one camera, wherein the beam splitter is operative to pivot about at least one axis, thereby to create motion of the image of the article within the field of view of the camera. The objective modules may be arranged in a pair of back-to-back arcs each served by and partially encircling its own optical head.Type: ApplicationFiled: October 30, 2006Publication date: July 12, 2007Inventors: EHUD TIROSH, Boaz Kenan
-
Patent number: 7133548Abstract: A reticle inspection system for inspecting reticles can be used as an incoming inspection tool, and as a periodic and pre-exposure inspection tool. Mask shops can use it as an inspection tool compatible to their customers, and as a printable error detection tool. The inventive system detects two kinds of defects: (1) line width errors in the printed image; (2) surface defects. The line width errors are detected on the die area. The detection is performed by acquiring the image of the reticle under the same optical conditions as the exposure conditions, (i.e. wavelength, numerical aperture, sigma, and illumination aperture type) and by comparing multiple dies to find errors in the line width. Surface defects are detected all over the reticle. The detection of surface defects is performed by acquiring transmission and dark-field reflection images of the reticle and using the combined information to detect particles, and other surface defects.Type: GrantFiled: May 8, 2001Date of Patent: November 7, 2006Assignee: Applied Materials, Inc.Inventors: Boaz Kenan, Yair Eran, Avner Karpol, Emanuel Elyasaf, Ehud Tirosh
-
Publication number: 20060170910Abstract: Apparatus and techniques for automated optical inspection (AOI) utilizing image scanning modules with multiple objectives for each camera are provided. A scanning mechanism includes optical components to sequentially steer optical signals from each of the multiple objectives to the corresponding camera.Type: ApplicationFiled: January 31, 2005Publication date: August 3, 2006Inventors: Gilad Almogy, Bryan Bolt, Oded Arnon, Boaz Kenan, Ehud Tirosh, Michael Corliss
-
Patent number: 7072502Abstract: A reticle inspection system and method for complete and fast inspection of phase shift mask reticles, both for incoming inspection and for periodic and pre-exposure inspection tool, is employable by facilities such as mask shops as an inspection tool compatible to the mask shop's customers. The inventive system and method detect phase errors in an aerial image by acquiring the image of the phase shift mask under the same optical conditions as the exposure conditions (i.e. wavelength, numerical aperture, sigma, and illumination aperture type). Images are acquired at a positive out-of-focus and a negative out-of-focus, and are compared in order to enhance possible phase error. The term “phase error” refers to the acceptable range of the phase deviation from the programmed 180° on the phase shift mask, by using the exposure system to achieve the image on the photoresist, satisfying the requirements of the wafer specification.Type: GrantFiled: June 7, 2001Date of Patent: July 4, 2006Assignee: Applied Materials, Inc.Inventors: Shirley Hemar, Alex Goldenshtein, Gadi Greenberg, Mula Friedman, Boaz Kenan
-
Patent number: 6924891Abstract: A method and apparatus for reducing speckle during inspection of articles used in the manufacture of semiconductor devices, including wafers, masks, photomasks, and reticles. The coherence of a light beam output by a coherent light source, such as a pulsed laser, is reduced by disposing elements in a light path. Examples of such elements include optical fiber bundles; optical light guides; optical gratings; an integrating sphere; and an acousto-optic modulator. These various elements may be combined as desired, such that light beams output by the element combinations have optical path length differences that are greater than a coherence length of the light beam output by the coherent light source.Type: GrantFiled: April 29, 2004Date of Patent: August 2, 2005Assignee: Applied Materials, Inc.Inventors: Avner Karpol, Silviu Reinhorn, Emanuel Elysaf, Shimon Yalov, Boaz Kenan
-
Publication number: 20050128473Abstract: A method and apparatus for reducing speckle during inspection of articles used in the manufacture of semiconductor devices, including wafers, masks, photomasks, and reticles. The coherence of a light beam output by a coherent light source, such as a pulsed laser, is reduced by disposing elements in a light path. Examples of such elements include optical fiber bundles; optical light guides; optical gratings; an integrating sphere; and an acousto-optic modulator. These various elements may be combined as desired, such that light beams output by the element combinations have optical path length differences that are greater than a coherence length of the light beam output by the coherent light source.Type: ApplicationFiled: January 21, 2005Publication date: June 16, 2005Applicant: APPLIED MATERIALS, INC.Inventors: Avner Karpol, Silviu Reinhorn, Emanuel Elysaf, Shimon Yalov, Boaz Kenan
-
Publication number: 20040201842Abstract: A method and apparatus for reducing speckle during inspection of articles used in the manufacture of semiconductor devices, including wafers, masks, photomasks, and reticles. The coherence of a light beam output by a coherent light source, such as a pulsed laser, is reduced by disposing elements in a light path. Examples of such elements include optical fiber bundles; optical light guides; optical gratings; an integrating sphere; and an acousto-optic modulator. These various elements may be combined as desired, such that light beams output by the element combinations have optical path length differences that are greater than a coherence length of the light beam output by the coherent light source.Type: ApplicationFiled: April 29, 2004Publication date: October 14, 2004Applicant: APPLIED MATERIALS, INCInventors: Avner Karpol, Silviu Reinhorn, Emanuel ElYasaf, Shimon Yalov, Boaz Kenan
-
Patent number: 6798505Abstract: A method and apparatus for reducing speckle during inspection of articles used in the manufacture of semiconductor devices, including wafers, masks, photomasks, and reticles. The coherence of a light beam output by a coherent light source, such as a pulsed laser, is reduced by disposing elements in a light path. Examples of such elements include optical fiber bundles; optical light guides; optical gratings; an integrating sphere; and an acousto-optic modulator. These various elements may be combined as desired, such that light beams output by the element combinations have optical path length differences that are greater than a coherence length of the light beam output by the coherent light source.Type: GrantFiled: May 12, 2003Date of Patent: September 28, 2004Assignee: Applied Materials, Inc.Inventors: Avner Karpol, Silviu Reinhorn, Emanuel Elyasaf, Shimon Yalov, Boaz Kenan
-
Publication number: 20030197858Abstract: A method and apparatus for reducing speckle during inspection of articles used in the manufacture of semiconductor devices, including wafers, masks, photomasks, and reticles. The coherence of a light beam output by a coherent light source, such as a pulsed laser, is reduced by disposing elements in a light path. Examples of such elements include optical fiber bundles; optical light guides; optical gratings; an integrating sphere; and an acousto-optic modulator. These various elements may be combined as desired, such that light beams output by the element combinations have optical path length differences that are greater than a coherence length of the light beam output by the coherent light source.Type: ApplicationFiled: May 12, 2003Publication date: October 23, 2003Applicant: APPLIED MATERIALS, INCInventors: Avner Karpol, Silviu Reinhorn, Emanuel Elysaf, Shimon Yalov, Boaz Kenan
-
Patent number: 6587194Abstract: A method and apparatus for reducing speckle during inspection of articles used in the manufacture of semiconductor devices, including wafers, masks, photomasks, and reticles. The coherence of a light beam output by a coherent light source, such as a pulsed laser, is reduced by disposing elements in a light path. Examples of such elements include optical fiber bundles; optical light guides; optical gratings; an integrating sphere; and an acousto-optic modulator. These various elements may be combined as desired, such that light beams output by the element combinations have optical path length differences that are greater than a coherence length of the light beam output by the coherent light source.Type: GrantFiled: January 11, 2002Date of Patent: July 1, 2003Assignee: Applied Materials, Inc.Inventors: Avner Karpol, Silviu Reinhorn, Emanuel Elysaf, Shimon Yalov, Boaz Kenan
-
Patent number: 6556294Abstract: A method and apparatus for reducing speckle during inspection of articles used in the manufacture of semiconductor devices, including wafers, masks, photomasks, and reticles. The coherence of a light beam output by a coherent light source, such as a pulsed laser, is reduced by disposing elements in a light path. Examples of such elements include optical fiber bundles; optical light guides; optical gratings; an integrating sphere; and an acousto-optic modulator. These various elements may be combined as desired, such that light beams output by the element combinations have optical path length differences that are greater than a coherence length of the light beam output by the coherent light source.Type: GrantFiled: January 11, 2002Date of Patent: April 29, 2003Assignee: Applied Materials, Inc.Inventors: Avner Karpol, Silviu Reinhorn, Emanuel Elysaf, Shimon Yalov, Boaz Kenan
-
Publication number: 20020186879Abstract: A reticle inspection system and method for complete and fast inspection of phase shift mask reticles, both for incoming inspection and for periodic and pre-exposure inspection tool, is employable by facilities such as mask shops as an inspection tool compatible to the mask shop's customers. The inventive system and method detect phase errors in an aerial image by acquiring the image of the phase shift mask under the same optical conditions as the exposure conditions (i.e. wavelength, numerical aperture, sigma, and illumination aperture type). Images are acquired at a positive out-of-focus and a negative out-of-focus, and are compared in order to enhance possible phase error. The term “phase error” refers to the acceptable range of the phase deviation from the programmed 180° on the phase shift mask, by using the exposure system to achieve the image on the photoresist, satisfying the requirements of the wafer specification.Type: ApplicationFiled: June 7, 2001Publication date: December 12, 2002Inventors: Shirley Hemar, Alex Goldenshtein, Gadi Greenberg, Mula Friedman, Boaz Kenan
-
Patent number: 6466315Abstract: A system and method are presented for optical inspection of reticles by simulating the operation of a selected stepper. The system utilizes a flying spot inspection technique and includes a scanning apparatus and a detection unit. The scanning apparatus uses a laser source similar to that of the stepper of interest. First and second light directing assemblies are accommodated in the optical paths of, respectively, incident and transmitted light, and are designed so as to provide coherence of the light substantially equal to that of the stepper.Type: GrantFiled: September 3, 1999Date of Patent: October 15, 2002Assignee: Applied Materials, Inc.Inventors: Avner Karpol, Boaz Kenan
-
Patent number: 6429931Abstract: A method and apparatus for reducing speckle during inspection of articles used in the manufacture of semiconductor devices, including wafers, masks, photomasks, and reticles. The coherence of a light beam output by a coherent light source, such as a pulsed laser, is reduced by disposing elements in a light path. Examples of such elements include optical fiber bundles; optical light guides; optical gratings; an integrating sphere; and an acousto-optic modulator. These various elements may be combined as desired, such that light beams output by the element combinations have optical path length differences that are greater than a coherence length of the light beam output by the coherent light source.Type: GrantFiled: January 11, 2002Date of Patent: August 6, 2002Assignee: Applied Materials, Inc.Inventors: Avner Karpol, Silviu Reinhorn, Emanuel Elysaf, Shimon Yalov, Boaz Kenan
-
Publication number: 20020080348Abstract: A method and apparatus for reducing speckle during inspection of articles used in the manufacture of semiconductor devices, including wafers, masks, photomasks, and reticles. The coherence of a light beam output by a coherent light source, such as a pulsed laser, is reduced by disposing elements in a light path. Examples of such elements include optical fiber bundles; optical light guides; optical gratings; an integrating sphere; and an acousto-optic modulator. These various elements may be combined as desired, such that light beams output by the element combinations have optical path length differences that are greater than a coherence length of the light beam output by the coherent light source.Type: ApplicationFiled: January 11, 2002Publication date: June 27, 2002Applicant: APPLIED MATERIALS, INC.Inventors: Avner Karpol, Silviu Reinhorn, Emanuel Elysaf, Shimon Yalov, Boaz Kenan