Patents by Inventor Boaz Kenan

Boaz Kenan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7599075
    Abstract: Apparatus and techniques for automated optical inspection (AOI) utilizing image scanning modules with multiple objectives for each camera are provided. A scanning mechanism includes optical components to sequentially steer optical signals from each of the multiple objectives to the corresponding camera.
    Type: Grant
    Filed: April 8, 2008
    Date of Patent: October 6, 2009
    Assignee: Applied Materials, Israel, Ltd.
    Inventors: Gilad Almogy, Bryan C. Bolt, Oded Arnon, Boaz Kenan, Ehud Tirosh, Michael Corliss
  • Patent number: 7463352
    Abstract: A method and apparatus for reducing speckle during inspection of articles used in the manufacture of semiconductor devices, including wafers, masks, photomasks, and reticles. The coherence of a light beam output by a coherent light source, such as a pulsed laser, is reduced by disposing elements in a light path. Examples of such elements include optical fiber bundles; optical light guides; optical gratings; an integrating sphere; and an acousto-optic modulator. These various elements may be combined as desired, such that light beams output by the element combinations have optical path length differences that are greater than a coherence length of the light beam output by the coherent light source.
    Type: Grant
    Filed: January 21, 2005
    Date of Patent: December 9, 2008
    Assignee: Applied Materials, Inc.
    Inventors: Avner Karpol, Silviu Reinhorn, Emanuel Elysaf, Shimon Yalov, Boaz Kenan
  • Publication number: 20080186556
    Abstract: Apparatus and techniques for automated optical inspection (AOI) utilizing image scanning modules with multiple objectives for each camera are provided. A scanning mechanism includes optical components to sequentially steer optical signals from each of the multiple objectives to the corresponding camera.
    Type: Application
    Filed: April 8, 2008
    Publication date: August 7, 2008
    Inventors: Gilad Almogy, Bryan C. Bolt, Oded Arnon, Boaz Kenan, Ehud Tirosh, Michael Corliss
  • Patent number: 7394531
    Abstract: An automated optical inspection system, comprising at least one camera having a field of view; and at least one image scanning module comprising a plurality of objective modules arranged to have fields of view covering a portion of an article during inspection, and an image selection mirror mechanism, such as a pentaprism movable to sequentially select and transfer images of the fields of view from the objective modules to the at least one camera, and a beam splitter operative to simultaneously direct illumination from at least one illumination source to a portion of the article and to direct an image of the portion of the article to at least one camera, wherein the beam splitter is operative to pivot about at least one axis, thereby to create motion of the image of the article within the field of view of the camera. The objective modules may be arranged in a pair of back-to-back arcs each served by and partially encircling its own optical head.
    Type: Grant
    Filed: October 30, 2006
    Date of Patent: July 1, 2008
    Assignee: Applied Materials, Inc.
    Inventors: Ehud Tirosh, Boaz Kenan
  • Patent number: 7355689
    Abstract: Apparatus and techniques for automated optical inspection (AOI) utilizing image scanning modules with multiple objectives for each camera are provided. A scanning mechanism includes optical components to sequentially steer optical signals from each of the multiple objectives to the corresponding camera.
    Type: Grant
    Filed: January 31, 2005
    Date of Patent: April 8, 2008
    Assignee: Applied Materials, Inc.
    Inventors: Gilad Almogy, Bryan C. Bolt, Oded Arnon, Boaz Kenan, Ehud Tirosh, Michael Corliss
  • Publication number: 20070159623
    Abstract: An automated optical inspection system, comprising at least one camera having a field of view; and at least one image scanning module comprising a plurality of objective modules arranged to have fields of view covering a portion of an article during inspection, and an image selection mirror mechanism, such as a pentaprism movable to sequentially select and transfer images of the fields of view from the objective modules to the at least one camera, and a beam splitter operative to simultaneously direct illumination from at least one illumination source to a portion of the article and to direct an image of the portion of the article to at least one camera, wherein the beam splitter is operative to pivot about at least one axis, thereby to create motion of the image of the article within the field of view of the camera. The objective modules may be arranged in a pair of back-to-back arcs each served by and partially encircling its own optical head.
    Type: Application
    Filed: October 30, 2006
    Publication date: July 12, 2007
    Inventors: EHUD TIROSH, Boaz Kenan
  • Patent number: 7133548
    Abstract: A reticle inspection system for inspecting reticles can be used as an incoming inspection tool, and as a periodic and pre-exposure inspection tool. Mask shops can use it as an inspection tool compatible to their customers, and as a printable error detection tool. The inventive system detects two kinds of defects: (1) line width errors in the printed image; (2) surface defects. The line width errors are detected on the die area. The detection is performed by acquiring the image of the reticle under the same optical conditions as the exposure conditions, (i.e. wavelength, numerical aperture, sigma, and illumination aperture type) and by comparing multiple dies to find errors in the line width. Surface defects are detected all over the reticle. The detection of surface defects is performed by acquiring transmission and dark-field reflection images of the reticle and using the combined information to detect particles, and other surface defects.
    Type: Grant
    Filed: May 8, 2001
    Date of Patent: November 7, 2006
    Assignee: Applied Materials, Inc.
    Inventors: Boaz Kenan, Yair Eran, Avner Karpol, Emanuel Elyasaf, Ehud Tirosh
  • Publication number: 20060170910
    Abstract: Apparatus and techniques for automated optical inspection (AOI) utilizing image scanning modules with multiple objectives for each camera are provided. A scanning mechanism includes optical components to sequentially steer optical signals from each of the multiple objectives to the corresponding camera.
    Type: Application
    Filed: January 31, 2005
    Publication date: August 3, 2006
    Inventors: Gilad Almogy, Bryan Bolt, Oded Arnon, Boaz Kenan, Ehud Tirosh, Michael Corliss
  • Patent number: 7072502
    Abstract: A reticle inspection system and method for complete and fast inspection of phase shift mask reticles, both for incoming inspection and for periodic and pre-exposure inspection tool, is employable by facilities such as mask shops as an inspection tool compatible to the mask shop's customers. The inventive system and method detect phase errors in an aerial image by acquiring the image of the phase shift mask under the same optical conditions as the exposure conditions (i.e. wavelength, numerical aperture, sigma, and illumination aperture type). Images are acquired at a positive out-of-focus and a negative out-of-focus, and are compared in order to enhance possible phase error. The term “phase error” refers to the acceptable range of the phase deviation from the programmed 180° on the phase shift mask, by using the exposure system to achieve the image on the photoresist, satisfying the requirements of the wafer specification.
    Type: Grant
    Filed: June 7, 2001
    Date of Patent: July 4, 2006
    Assignee: Applied Materials, Inc.
    Inventors: Shirley Hemar, Alex Goldenshtein, Gadi Greenberg, Mula Friedman, Boaz Kenan
  • Patent number: 6924891
    Abstract: A method and apparatus for reducing speckle during inspection of articles used in the manufacture of semiconductor devices, including wafers, masks, photomasks, and reticles. The coherence of a light beam output by a coherent light source, such as a pulsed laser, is reduced by disposing elements in a light path. Examples of such elements include optical fiber bundles; optical light guides; optical gratings; an integrating sphere; and an acousto-optic modulator. These various elements may be combined as desired, such that light beams output by the element combinations have optical path length differences that are greater than a coherence length of the light beam output by the coherent light source.
    Type: Grant
    Filed: April 29, 2004
    Date of Patent: August 2, 2005
    Assignee: Applied Materials, Inc.
    Inventors: Avner Karpol, Silviu Reinhorn, Emanuel Elysaf, Shimon Yalov, Boaz Kenan
  • Publication number: 20050128473
    Abstract: A method and apparatus for reducing speckle during inspection of articles used in the manufacture of semiconductor devices, including wafers, masks, photomasks, and reticles. The coherence of a light beam output by a coherent light source, such as a pulsed laser, is reduced by disposing elements in a light path. Examples of such elements include optical fiber bundles; optical light guides; optical gratings; an integrating sphere; and an acousto-optic modulator. These various elements may be combined as desired, such that light beams output by the element combinations have optical path length differences that are greater than a coherence length of the light beam output by the coherent light source.
    Type: Application
    Filed: January 21, 2005
    Publication date: June 16, 2005
    Applicant: APPLIED MATERIALS, INC.
    Inventors: Avner Karpol, Silviu Reinhorn, Emanuel Elysaf, Shimon Yalov, Boaz Kenan
  • Publication number: 20040201842
    Abstract: A method and apparatus for reducing speckle during inspection of articles used in the manufacture of semiconductor devices, including wafers, masks, photomasks, and reticles. The coherence of a light beam output by a coherent light source, such as a pulsed laser, is reduced by disposing elements in a light path. Examples of such elements include optical fiber bundles; optical light guides; optical gratings; an integrating sphere; and an acousto-optic modulator. These various elements may be combined as desired, such that light beams output by the element combinations have optical path length differences that are greater than a coherence length of the light beam output by the coherent light source.
    Type: Application
    Filed: April 29, 2004
    Publication date: October 14, 2004
    Applicant: APPLIED MATERIALS, INC
    Inventors: Avner Karpol, Silviu Reinhorn, Emanuel ElYasaf, Shimon Yalov, Boaz Kenan
  • Patent number: 6798505
    Abstract: A method and apparatus for reducing speckle during inspection of articles used in the manufacture of semiconductor devices, including wafers, masks, photomasks, and reticles. The coherence of a light beam output by a coherent light source, such as a pulsed laser, is reduced by disposing elements in a light path. Examples of such elements include optical fiber bundles; optical light guides; optical gratings; an integrating sphere; and an acousto-optic modulator. These various elements may be combined as desired, such that light beams output by the element combinations have optical path length differences that are greater than a coherence length of the light beam output by the coherent light source.
    Type: Grant
    Filed: May 12, 2003
    Date of Patent: September 28, 2004
    Assignee: Applied Materials, Inc.
    Inventors: Avner Karpol, Silviu Reinhorn, Emanuel Elyasaf, Shimon Yalov, Boaz Kenan
  • Publication number: 20030197858
    Abstract: A method and apparatus for reducing speckle during inspection of articles used in the manufacture of semiconductor devices, including wafers, masks, photomasks, and reticles. The coherence of a light beam output by a coherent light source, such as a pulsed laser, is reduced by disposing elements in a light path. Examples of such elements include optical fiber bundles; optical light guides; optical gratings; an integrating sphere; and an acousto-optic modulator. These various elements may be combined as desired, such that light beams output by the element combinations have optical path length differences that are greater than a coherence length of the light beam output by the coherent light source.
    Type: Application
    Filed: May 12, 2003
    Publication date: October 23, 2003
    Applicant: APPLIED MATERIALS, INC
    Inventors: Avner Karpol, Silviu Reinhorn, Emanuel Elysaf, Shimon Yalov, Boaz Kenan
  • Patent number: 6587194
    Abstract: A method and apparatus for reducing speckle during inspection of articles used in the manufacture of semiconductor devices, including wafers, masks, photomasks, and reticles. The coherence of a light beam output by a coherent light source, such as a pulsed laser, is reduced by disposing elements in a light path. Examples of such elements include optical fiber bundles; optical light guides; optical gratings; an integrating sphere; and an acousto-optic modulator. These various elements may be combined as desired, such that light beams output by the element combinations have optical path length differences that are greater than a coherence length of the light beam output by the coherent light source.
    Type: Grant
    Filed: January 11, 2002
    Date of Patent: July 1, 2003
    Assignee: Applied Materials, Inc.
    Inventors: Avner Karpol, Silviu Reinhorn, Emanuel Elysaf, Shimon Yalov, Boaz Kenan
  • Patent number: 6556294
    Abstract: A method and apparatus for reducing speckle during inspection of articles used in the manufacture of semiconductor devices, including wafers, masks, photomasks, and reticles. The coherence of a light beam output by a coherent light source, such as a pulsed laser, is reduced by disposing elements in a light path. Examples of such elements include optical fiber bundles; optical light guides; optical gratings; an integrating sphere; and an acousto-optic modulator. These various elements may be combined as desired, such that light beams output by the element combinations have optical path length differences that are greater than a coherence length of the light beam output by the coherent light source.
    Type: Grant
    Filed: January 11, 2002
    Date of Patent: April 29, 2003
    Assignee: Applied Materials, Inc.
    Inventors: Avner Karpol, Silviu Reinhorn, Emanuel Elysaf, Shimon Yalov, Boaz Kenan
  • Publication number: 20020186879
    Abstract: A reticle inspection system and method for complete and fast inspection of phase shift mask reticles, both for incoming inspection and for periodic and pre-exposure inspection tool, is employable by facilities such as mask shops as an inspection tool compatible to the mask shop's customers. The inventive system and method detect phase errors in an aerial image by acquiring the image of the phase shift mask under the same optical conditions as the exposure conditions (i.e. wavelength, numerical aperture, sigma, and illumination aperture type). Images are acquired at a positive out-of-focus and a negative out-of-focus, and are compared in order to enhance possible phase error. The term “phase error” refers to the acceptable range of the phase deviation from the programmed 180° on the phase shift mask, by using the exposure system to achieve the image on the photoresist, satisfying the requirements of the wafer specification.
    Type: Application
    Filed: June 7, 2001
    Publication date: December 12, 2002
    Inventors: Shirley Hemar, Alex Goldenshtein, Gadi Greenberg, Mula Friedman, Boaz Kenan
  • Patent number: 6466315
    Abstract: A system and method are presented for optical inspection of reticles by simulating the operation of a selected stepper. The system utilizes a flying spot inspection technique and includes a scanning apparatus and a detection unit. The scanning apparatus uses a laser source similar to that of the stepper of interest. First and second light directing assemblies are accommodated in the optical paths of, respectively, incident and transmitted light, and are designed so as to provide coherence of the light substantially equal to that of the stepper.
    Type: Grant
    Filed: September 3, 1999
    Date of Patent: October 15, 2002
    Assignee: Applied Materials, Inc.
    Inventors: Avner Karpol, Boaz Kenan
  • Patent number: 6429931
    Abstract: A method and apparatus for reducing speckle during inspection of articles used in the manufacture of semiconductor devices, including wafers, masks, photomasks, and reticles. The coherence of a light beam output by a coherent light source, such as a pulsed laser, is reduced by disposing elements in a light path. Examples of such elements include optical fiber bundles; optical light guides; optical gratings; an integrating sphere; and an acousto-optic modulator. These various elements may be combined as desired, such that light beams output by the element combinations have optical path length differences that are greater than a coherence length of the light beam output by the coherent light source.
    Type: Grant
    Filed: January 11, 2002
    Date of Patent: August 6, 2002
    Assignee: Applied Materials, Inc.
    Inventors: Avner Karpol, Silviu Reinhorn, Emanuel Elysaf, Shimon Yalov, Boaz Kenan
  • Publication number: 20020080348
    Abstract: A method and apparatus for reducing speckle during inspection of articles used in the manufacture of semiconductor devices, including wafers, masks, photomasks, and reticles. The coherence of a light beam output by a coherent light source, such as a pulsed laser, is reduced by disposing elements in a light path. Examples of such elements include optical fiber bundles; optical light guides; optical gratings; an integrating sphere; and an acousto-optic modulator. These various elements may be combined as desired, such that light beams output by the element combinations have optical path length differences that are greater than a coherence length of the light beam output by the coherent light source.
    Type: Application
    Filed: January 11, 2002
    Publication date: June 27, 2002
    Applicant: APPLIED MATERIALS, INC.
    Inventors: Avner Karpol, Silviu Reinhorn, Emanuel Elysaf, Shimon Yalov, Boaz Kenan