Patents by Inventor Bogathi Vishnu Vardhana REDDY

Bogathi Vishnu Vardhana REDDY has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11036144
    Abstract: A method of determining a configuration of a projection system for a lithographic apparatus as an implementation of a quadratic programming problem with a penalty function. The method includes: receiving dependencies of one or more optical properties of the projection system on a configuration of a plurality of manipulators of the projection system; receiving a plurality of constraints which correspond to physical constraints of the manipulators; finding an initial configuration of the manipulators; and iteratively finding an output configuration of the manipulators. The iteration includes repeating the following steps: determining a set of the plurality of constraints that are violated; determining an updated configuration of the manipulators, the updated configuration of the manipulators being dependent on the set of the plurality of constraints that are violated and a penalty strength; and increasing the penalty strength. These steps are repeated until a convergence criterion is met.
    Type: Grant
    Filed: December 3, 2018
    Date of Patent: June 15, 2021
    Assignee: ASML Netherlands B. V.
    Inventors: Przemyslaw Aleksander Klosiewicz, Bogathi Vishnu Vardhana Reddy, Syed Umar Hassan Rizvi, James Robert Downes
  • Publication number: 20210011389
    Abstract: A method of determining a configuration of a projection system for a lithographic apparatus as an implementation of a quadratic programming problem with a penalty function. The method includes: receiving dependencies of one or more optical properties of the projection system on a configuration of a plurality of manipulators of the projection system; receiving a plurality of constraints which correspond to physical constraints of the manipulators; finding an initial configuration of the manipulators; and iteratively finding an output configuration of the manipulators. The iteration includes repeating the following steps: determining a set of the plurality of constraints that are violated; determining an updated configuration of the manipulators, the updated configuration of the manipulators being dependent on the set of the plurality of constraints that are violated and a penalty strength; and increasing the penalty strength. These steps are repeated until a convergence criterion is met.
    Type: Application
    Filed: December 3, 2018
    Publication date: January 14, 2021
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Przemyslaw Aleksander KLOSIEWICZ, Bogathi Vishnu Vardhana REDDY, Syed Umar Hassan RIZVI, James Robert DOWNES
  • Patent number: 10261423
    Abstract: A method of determining a configuration of a projection system for a lithographic apparatus, wherein manipulators of the projection system manipulate optical elements so as to adjust its optical properties, the method comprising: receiving dependencies of the optical properties of the projection system on a configuration of the manipulators, receiving a plurality of constraints of the manipulators, formulating a cost function, wherein the cost function represents a difference between the optical properties of the projection system for a given configuration of the manipulators and desired optical properties, wherein the cost function is formulated using the dependency of the optical properties on the configuration of the manipulators, scaling the cost function into a scaled variable space, wherein the scaling is performed by using the plurality of constraints and finding a solution configuration of the manipulators which substantially minimizes the scaled cost function subject to satisfying the plurality of co
    Type: Grant
    Filed: May 30, 2016
    Date of Patent: April 16, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Lense Hendrik-Jan Maria Swaenen, Johannes Jacobus Matheus Baselmans, Bogathi Vishnu Vardhana Reddy, Patricius Aloysius Jacobus Tinnemans, Beeri Nativ
  • Publication number: 20180107120
    Abstract: A method of determining a configuration of a projection system for a lithographic apparatus, wherein manipulators of the projection system manipulate optical elements so as to adjust its optical properties, the method comprising: receiving dependencies of the optical properties of the projection system on a configuration of the manipulators, receiving a plurality of constraints of the manipulators, formulating a cost function, wherein the cost function represents a difference between the optical properties of the projection system for a given configuration of the manipulators and desired optical properties, wherein the cost function is formulated using the dependency of the optical properties on the configuration of the manipulators, scaling the cost function into a scaled variable space, wherein the scaling is performed by using the plurality of constraints and finding a solution configuration of the manipulators which substantially minimises the scaled cost function subject to satisfying the plurality of co
    Type: Application
    Filed: May 30, 2016
    Publication date: April 19, 2018
    Applicant: ASML Netherlands B.V.
    Inventors: Lense Hendrik-Jan Maria SWAENEN, Johannes Jacobus Matheus BASELMANS, Bogathi Vishnu Vardhana REDDY, Patricius Aloysius Jacobus TINNEMANS, Beeri NATIV