Patents by Inventor Boguslaw Gajdeczko

Boguslaw Gajdeczko has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7564534
    Abstract: An alignment system uses a self-referencing interferometer that produces two overlapping and relatively rotated images of an alignment marker. Detectors detect intensities in a pupil plane where Fourier transforms of the images are caused to interfere. The positional information is derived from the phase difference between diffraction orders of the two images which manifests as intensity variations in the interfered orders. Asymmetry can also be measured by measuring intensities at two positions either side of a diffraction order.
    Type: Grant
    Filed: November 29, 2007
    Date of Patent: July 21, 2009
    Assignee: ASML Netherlands B.V.
    Inventors: Arie Jeffrey Den Boef, Maarten Hoogerland, Boguslaw Gajdeczko
  • Publication number: 20080087094
    Abstract: A pressure sensor includes a diaphragm having a displaceable elastic inner portion, wherein the inner portion displaces in response to a pressure difference between first and second sides of the diaphragm. A radiation source may be configured to transmit first and second beams of radiation. A light receiver may be configured to receive the first beam of radiation directly from the radiation source and the second beam of radiation after it reflects from the first side of the diaphragm. A control system may be coupled to the radiation source and light receiver and adapted to determine the pressure difference from the displacement of the diaphragm.
    Type: Application
    Filed: September 24, 2007
    Publication date: April 17, 2008
    Applicant: ASML Holding N.V.
    Inventors: Boguslaw Gajdeczko, Kevin Violette
  • Publication number: 20080088956
    Abstract: An alignment system uses a self-referencing interferometer that produces two overlapping and relatively rotated images of an alignment marker. Detectors detect intensities in a pupil plane where Fourier transforms of the images are caused to interfere. The positional information is derived from the phase difference between diffraction orders of the two images which manifests as intensity variations in the interfered orders. Asymmetry can also be measured by measuring intensities at two positions either side of a diffraction order.
    Type: Application
    Filed: November 29, 2007
    Publication date: April 17, 2008
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Arie Boef, Maarten Hoogerland, Boguslaw Gajdeczko
  • Patent number: 7319506
    Abstract: An alignment system uses a self-referencing interferometer that produces two overlapping and relatively rotated images of an alignment marker. Detectors detect intensities in a pupil plane where Fourier transforms of the images are caused to interfere. The positional information is derived from the phase difference between diffraction orders of the two images which manifests as intensity variations in the interfered orders. Asymmetry can also be measured by measuring intensities at two positions either side of a diffraction order.
    Type: Grant
    Filed: August 25, 2005
    Date of Patent: January 15, 2008
    Assignee: ASML Netherlands B.V.
    Inventors: Arie Jeffrey Den Boef, Maarten Hoogerland, Boguslaw Gajdeczko
  • Patent number: 7272976
    Abstract: A pressure gauge includes a diaphragm having a substantially rigid outer portion and a displaceable inner portion that displaces in response to a pressure difference between first and second sides of the diaphragm. The pressure gauge further includes a sensor located proximate to the diaphragm and adapted to sense the displacement of the diaphragm inner portion. The pressure gauge further includes a monitor and control system coupled to the sensor (wired or wireless), and adapted to determine the pressure difference from the displacement of the diaphragm. The sensor and the monitor and control system can be implemented with one or more optical sensing designs, capacitive sensing designs, or other devices used to measure sub-micron displacements. For low pressure applications, such as lithography applications, the diaphragm is sensitive to pressure changes in a range of approximately 0.1 to 0.5 inches of water.
    Type: Grant
    Filed: March 30, 2004
    Date of Patent: September 25, 2007
    Assignee: ASML Holdings N.V.
    Inventors: Boguslaw Gajdeczko, Kevin J. Violette
  • Publication number: 20060123888
    Abstract: Provided are a method and system for measuring a distance to an object. The system includes an air gauge configured to sense a distance to a surface of the object and a sensor configured to measure at least one from the group including (i) a relative position of the air gauge and (ii) a relative position of the surface of the object. Outputs of the air gauge and the sensor are combined to produce a combined air gauge reading.
    Type: Application
    Filed: December 15, 2004
    Publication date: June 15, 2006
    Applicant: ASML Holding N.V.
    Inventors: Daniel Galburt, Boguslaw Gajdeczko
  • Publication number: 20060007446
    Abstract: An alignment system uses a self-referencing interferometer that produces two overlapping and relatively rotated images of an alignment marker. Detectors detect intensities in a pupil plane where Fourier transforms of the images are caused to interfere. The positional information is derived from the phase difference between diffraction orders of the two images which manifests as intensity variations in the interfered orders. Asymmetry can also be measured by measuring intensities at two positions either side of a diffraction order.
    Type: Application
    Filed: August 25, 2005
    Publication date: January 12, 2006
    Applicant: ASML Netherlands B.V.
    Inventors: Arie Boef, Maarten Hoogerland, Boguslaw Gajdeczko
  • Publication number: 20050268698
    Abstract: An apparatus and method for precisely detecting very small distances between a measurement probe and a surface, and more particularly to a proximity sensor using a constant gas flow and sensing a mass flow rate within a pneumatic bridge to detect very small distances. Within the apparatus the use of a flow restrictor and/or snubber made of porous material and/or a mass flow rate controller enables detection of very small distances in the nanometer to sub-nanometer range. A further embodiment wherein a measurement channel of a proximity sensor is connected to multiple measurement branches.
    Type: Application
    Filed: August 8, 2005
    Publication date: December 8, 2005
    Applicant: ASML Holding N.V.
    Inventors: Boguslaw Gajdeczko, Kenneth Bogursky, Daniel Galburt, Willy Sander, Kevin Violette
  • Patent number: 6961116
    Abstract: An alignment system uses a self-referencing interferometer that produces two overlapping and relatively rotated images of an alignment markers. Detectors detect intensities in a pupil plane where Fourier transforms of the images are caused to interfere. The positional information is derived from the phase difference between diffraction orders of the two images which manifests as intensity variations in the interfered orders. Asymmetry can also be measured by measuring intensities at two positions either side of a diffraction order.
    Type: Grant
    Filed: June 9, 2003
    Date of Patent: November 1, 2005
    Assignee: ASML Netherlands B.V.
    Inventors: Arie Jeffrey Den Boef, Maarten Hoogerland, Boguslaw Gajdeczko
  • Publication number: 20050217384
    Abstract: A pressure gauge includes a diaphragm having a substantially rigid outer portion and a displaceable inner portion that displaces in response to a pressure difference between first and second sides of the diaphragm. The pressure gauge further includes a sensor located proximate to the diaphragm and adapted to sense the displacement of the diaphragm inner portion. The pressure gauge further includes a monitor and control system coupled to the sensor (wired or wireless), and adapted to determine the pressure difference from the displacement of the diaphragm. The sensor and the monitor and control system can be implemented with one or more optical sensing designs, capacitive sensing designs, or other devices used to measure sub-micron displacements. For low pressure applications, such as lithography applications, the diaphragm is sensitive to pressure changes in a range of approximately 0.1 to 0.5 inches of water.
    Type: Application
    Filed: March 30, 2004
    Publication date: October 6, 2005
    Inventors: Boguslaw Gajdeczko, Kevin Violette
  • Publication number: 20040033426
    Abstract: An alignment system uses a self-referencing interferometer that produces two overlapping and relatively rotated images of an alignment markers. Detectors detect intensities in a pupil plane where Fourier transforms of the images are caused to interfere. The positional information is derived from the phase difference between diffraction orders of the two images which manifests as intensity variations in the interfered orders. Asymmetry can also be measured by measuring intensities at two positions either side of a diffraction order.
    Type: Application
    Filed: June 9, 2003
    Publication date: February 19, 2004
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Arie Jeffrey Den Boef, Maarten Hoogerland, Boguslaw Gajdeczko