Abstract: A semiconductor memory device includes a substrate including an element separation film and an active region defined by the element separation film, a bit line structure on the substrate, a trench in the element separation film and the active region, the trench on at least one side of the bit line structure and including a first portion in the element separation film and a second portion in the active region, a bottom face of the first portion placed above a bottom face of the second portion, a single crystal storage contact filling the trench, and an information storage element electrically connected to the single crystal storage contact.

Abstract: The present invention relates to a compound represented by any one of the following formula A to formula C, and a photosensitive composition comprising the same, wherein the structure of the compound represented by any one of formula A to formula C is as described in the detailed description of the invention.

Abstract: The present invention relates to a compound represented by any one of the following formula A to formula C, and a photosensitive composition comprising the same, wherein the structure of the compound represented by any one of formula A to formula C is as described in the detailed description of the invention.

Abstract: Disclosed are a solar cell module apparatus and a method of fabricating the same. The solar cell module apparatus includes a light absorbing layer, and a reflector provided on a light incident surface of the light absorbing layer to reflect a light, which has been reflected from the light absorbing layer, toward the light absorbing layer.

Abstract: Disclosed are a solar cell module and a method of fabricating the same. The solar cell module includes a substrate, a solar cell panel located on the substrate and including a plurality of solar cells, a buffer sheet on the solar cell panel, and a bus bar connected to one of the solar cells while passing through the buffer sheet. The method of fabricating a solar cell module includes forming a solar cell panel including a plurality of solar cells on a substrate, forming a buffer sheet including a bus bar connected to one of the solar cells, and locating the buffer sheet including the bus bar on the solar cell panel. The bus bar passes through the buffer sheet.

Abstract: Provided are a novel fluorene oxime ester compound, and a photopolymerization initiator and a photoresist composition containing the same.

Abstract: Provided are a novel fluorene oxime ester compound, and a photopolymerization initiator and a photoresist composition containing the same.

Abstract: A solar cell module according to an embodiment includes a support substrate; a solar cell on the support substrate; and a bus bar on the solar cell, wherein the bus bar is prepared as a plurality of rods.

Abstract: Disclosed are a solar cell module and a method of fabricating the same. The solar cell module includes a substrate, a solar cell panel located on the substrate and including a plurality of solar cells, a buffer sheet on the solar cell panel, and a bus bar connected to one of the solar cells while passing through the buffer sheet. The method of fabricating a solar cell module includes forming a solar cell panel including a plurality of solar cells on a substrate, forming a buffer sheet including a bus bar connected to one of the solar cells, and locating the buffer sheet including the bus bar on the solar cell panel. The bus bar passes through the buffer sheet.

Abstract: Disclosed are a solar cell module apparatus and a method of fabricating the same. The solar cell module apparatus includes a light absorbing layer, and a reflector provided on a light incident surface of the light absorbing layer to reflect a light, which has been reflected from the light absorbing layer, toward the light absorbing layer.

Abstract: The present invention is related to a polymer comprising terminal sulfonic acid groups, which has a high ionic conductivity and good structural stability, does not decompose even under low humidity conditions, and is inexpensive to produce. Furthermore, the present invention is related to a polymer electrolyte and a fuel cell using the same. The polymer of the present invention has a substituent comprising a terminal sulfonic acid group comprising Formula (1) at a side chain: where n may be a number in the range of about 1 to about 5.

Abstract: Disclosed is a positive photoresist composition used for a liquid crystal display. The positive photoresist composition of the present invention includes 3 to 50% by weight of binder resin having a certain structure, 2 to 40% by weight of a photoactive compound and 10 to 94% by weight of an organic solvent. The positive photoresist composition according to the present invention may be useful to form a pattern for an organic insulator of a liquid crystal display, metal patterning, a bump, hole drilling and UV overcoat since it has good basic physical properties such as UV transmittance, film retention, pattern stability, chemical resistance and so on, as well as an excellent heat resistance.

Abstract: The present invention is related to a polymer comprising terminal sulfonic acid groups, which has a high ionic conductivity and good structural stability, does not decompose even under low humidity conditions, and is inexpensive to produce. Furthermore, the present invention is related to a polymer electrolyte and a fuel cell using the same. The polymer of the present invention has a substituent comprising a terminal sulfonic acid group comprising Formula (1) at a side chain: where n may be a number in the range of about 1 to about 5.

Abstract: Disclosed is a positive photoresist composition used for a liquid crystal display. The positive photoresist composition of the present invention includes 3 to 50% by weight of binder resin having a certain structure, 2 to 40% by weight of a photoactive compound and 10 to 94% by weight of an organic solvent. The positive photoresist composition according to the present invention may be useful to form a pattern for an organic insulator of a liquid crystal display, metal patterning, a bump, hole drilling and UV overcoat since it has good basic physical properties such as UV transmittance, film retention, pattern stability, chemical resistance and so on, as well as an excellent heat resistance.

Abstract: The present invention is related to a polymer comprising terminal sulfonic acid groups, which has a high ionic conductivity and good structural stability, does not decompose even under low humidity conditions, and is inexpensive to produce. Furthermore, the present invention is related to a polymer electrolyte and a fuel cell using the same. The polymer of the present invention has a substituent comprising a terminal sulfonic acid group comprising Formula (1) at a side chain: where n may be a number in the range of about 1 to about 5.

Abstract: A negative resist composition used in a liquid-crystal display element is disclosed. The negative resist composition according to the present invention includes a binder resin consisting of a copolymer including four predetermined monomers, a (meth)acryl monomer including at least 3 (meth)acryl groups, a (meth)acryl monomer including one or two (meth)acryl groups and a photo-initiator. The negative resist composition according to the present invention may be useful to significantly increase the manufacturing yield because it shows an extremely low brittleness during a bonding process or a hot process due to good physical properties such as film retention, pattern stability, adhesion to a substrate, and chemical resistance, as well as good flexibility upon formation of the pattern.

Abstract: The present invention is related to a polymer comprising terminal sulfonic acid groups, which has a high ionic conductivity and good structural stability, does not decompose even under low humidity conditions, and is inexpensive to produce. Furthermore, the present invention is related to a polymer electrolyte and a fuel cell using the same. The polymer of the present invention has a substituent comprising a terminal sulfonic acid group comprising Formula (1) at a side chain: where n may be a number in the range of about 1 to about 5.

Abstract: An acetal group containing norbornene-based copolymer useful for a photoresist composition, a method for producing the same, and a photoresist composition containing the same are disclosed. According to the present invention, a copolymer of the present invention has excellent transparency at a wavelength of not more than about 250 nm, excellent resolution, excellent sensitivity, dry etching resistance and excellent adhesion to the substrate.

Abstract: Disclosed is an norbornene-based copolymer for photoresist, a preparation method thereof, and a photoresist composition comprising the same. The copolymer of the present invention exhibits high transparency to light of 193 nm wavelength and an excellent etching resistance, excellent resolution due to the remarkable difference between light-exposed part and light-unexposed part in the dissolving rate and excellent adhesion to the substrate due to very hydrophilic diketone group of its own. As a result, the copolymer of the present invention is very useful as ArF exposure photoresist material in the fabrication of semiconductor devices.

Abstract: The present invention is related to a polymer comprising terminal sulfonic acid groups, which has a high ionic conductivity and good structural stability, does not decompose even under low humidity conditions, and is inexpensive to produce. Furthermore, the present invention is related to a polymer electrolyte and a fuel cell using the same. The polymer of the present invention has a substituent comprising a terminal sulfonic acid group comprising Formula (1) at a side chain: where n may be a number in the range of about 1 to about 5.