Abstract: Disclosed are a transflective liquid crystal display device and a method for manufacturing the same, capable of simply forming a reflection section and driving a liquid crystal display device with a transmission mode or a transflective mode by using the same array substrate. After preparing the upper substrate, the thin film transistor is formed in the switching region of the upper substrate. Color resin is coated on the thin film transistor, and is developed to form the color filter. The light-shielding layer is formed on the color filter to prevent current from being leaked from the thin film transistor. The lower substrate is formed in such a manner that the lower substrate is spaced by a predetermined distance from the upper substrate. The reflection plate is formed on the reflection section. The transparent electrode is formed on the reflection plate.

Abstract: A method of manufacturing liquid crystal display (LCD), comprising the steps of: forming a bottom indium tin oxide (ITO) in a pixel area of a transparent insulating substrate; forming a gate line and a storage line spaced with each other, the storage line including a first part having a first width and a second part having a second width, the second part is formed in the central portion of the pixel region and the first part is formed in the both sides of the second part and is directly contacted with the bottom ITO; depositing a gate insulating layer over the entire surface of the substrate; forming a semiconductor layer on the gate insulating layer over the gate line; forming a data line being in perpendicular to the gate line, source and drain electrodes being overlapped with both side portions of the semiconductor layer and a conductive pattern being disposed over the second part of the storage line; depositing an organic insulating layer having lower dielectric constant on the entire surface of the subst