Abstract: An optical mask for forming a pattern is provided. The optical mask includes: a substrate including a light blocking pattern formed on portions of the substrate, wherein the light blocking pattern includes a halftone layer and a light blocking layer formed on the halftone layer, and the halftone layer and the light blocking layer overlap such that at least an edge portion of the halftone layer is exposed. A pitch of the light blocking pattern may about 6 ?m, and a transmission ratio of the halftone layer may range from about 10% to about 50%.

Abstract: A photomask for exposure includes: a transparent substrate; a light blocking pattern layer positioned on the transparent substrate; a first dielectric layer positioned on the light blocking pattern layer and including a dielectric material; and a negative refractive index layer positioned on the first dielectric layer and including a metal. A surface plasmon quasi-bound mode of the photomask for exposure overlaps a wavelength range of the light source of the light exposer which irradiates light to the photomask for exposure.

Abstract: A display apparatus is provided. The display apparatus includes a display unit which outputs a plurality of content views using a plurality of image frames; an interface unit which is connected with a glasses apparatus according to a predetermined communication standard; a synchronization signal generator which generates a synchronization signal that synchronizes one of the plurality of content views with the glasses apparatus; and a controller which, when a glasses apparatus is connected, controls the display apparatus to synchronize the one of the plurality of content views with the glasses.

Abstract: An optical mask for forming a pattern is provided. The optical mask includes: a substrate including a light blocking pattern formed on portions of the substrate, wherein the light blocking pattern includes a halftone layer and a light blocking layer formed on the halftone layer, and the halftone layer and the light blocking layer overlap such that at least an edge portion of the halftone layer is exposed. A pitch of the light blocking pattern may about 6 ?m, and a transmission ratio of the halftone layer may range from about 10% to about 50%.

Abstract: A method of forming a metal pattern is disclosed. In the method, a metal layer is formed on a base substrate. A photoresist composition is coated on the metal layer to form a coating layer. The photoresist composition includes a binder resin, a photo-sensitizer, a mercaptopropionic acid compound and a solvent. The coating layer is exposed to a light. The coating layer is partially removed to form a photoresist pattern. The metal layer is patterned by using the photoresist pattern as a mask.

Abstract: A pattern mask for patterning a thin film includes a transparent or translucent substrate with a plurality of grooves formed thereon having a pitch of about 4.6 ?m to about 10.8 ?m.

Abstract: A mask may include a circuit area and a pixel area. The circuit area includes a circuit pattern. The pixel area includes a pixel pattern which is extended in a length direction and an assist pattern which is at an end portion of the pixel pattern and adjacent to the circuit area.

Abstract: Provided are a photomask, including: a substrate; an opaque pattern formed on the substrate and made of a material which does not penetrate light; a first dielectric layer formed on the substrate and the opaque pattern; and a negative refractive-index meta material layer formed on the first dielectric layer, in which a dispersion mode used in the photomask uses a Quasi bound mode, a manufacturing method of the photomask, and a manufacturing method of a substrate using the photomask.

Abstract: Provided is a photolithography mask capable of forming fine patterns beyond a critical resolution of an exposer without replacing or changing the exposer. The mask includes an at least partially light absorbing phase shift layer and uses a complex wavelength light source.

Abstract: A photoresist composition includes from about 20% to about 50% by weight of a polymer, from about 0.5% to about 1.5% by weight of a photo-acid generator, from about 0.01% to about 0.5% by weight of a photo absorber and the remainder includes an organic solvent. Also provided is a method of forming a fine pattern including forming a thin film on a substrate; forming a photoresist pattern by using a photoresist composition that includes from about 20% to about 50% by weight of a polymer, from about 0.5% to about 1.5% by weight of a photo-acid generator, from about 0.01% to about 0.5% by weight of a photo absorber and a remainder comprising an organic solvent; and patterning the thin film by using the photoresist pattern as an etch-stop layer to form a fine pattern.

Abstract: A method for forming a fine exposure pattern where a width and an interval of the pattern are each 1CD, by first exposing a photoresist by using an exposure mask where an interval ratio of a light shielding part and a light transmission part is 2CD:1CD to 4CD:1CD, and then second exposing the photoresist after the exposure mask is shifted at a predetermined interval, or second exposing the photoresist by using an exposure mask formed at a position where a light transmission part is shifted at a predetermined interval, and developing the photoresist, such that it is possible to form a display device having a pixel electrode including a plurality of fine branch electrodes having a smaller width and interval than a resolution of an exposure apparatus.

Abstract: A swivel-type mobile terminal includes a terminal body having a microphone, a display unit which is rotatably and swingably connected to the terminal body and mounted with a display window, a first receiver in the display unit for outputting audio signals when the display unit is rotated to be an open position, and a second receiver in the display unit for outputting audio signal when the display unit is folded in a position which allows the display window to be viewable by a user. In this folded position, the terminal can support phone calls while adjusting the gain of the microphone. The display is also viewable by a user while in this position.

Abstract: An apparatus and method for transmitting digital versatile disc (DVD) content to a media renderer according to a menu set by a user via a network are provided. In the apparatus and method, a media server generates two or more types of menu setting information from combinations of options available from a menu for the DVD content, generates item information for the DVD content for each piece of the menu setting information, and transmits the item information to a control point. Accordingly, a user can use various menu information items for a DVD title which is the same as can be obtained in a local DVD system while evaluating DVD content under remote control via a network.

Abstract: A swivel-type mobile terminal includes a terminal body having a microphone, a display unit which is rotatably and swingably connected to the terminal body and mounted with a display window, a first receiver in the display unit for outputting audio signals when the display unit is rotated to be an open position, and a second receiver in the display unit for outputting audio signal when the display unit is folded in a position which allows the display window to be viewable by a user. In this folded position, the terminal can support phone calls while adjusting the gain of the microphone. The display is also viewable by a user while in this position.