Patents by Inventor Bonglea Kim

Bonglea Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9159524
    Abstract: The X-ray generating apparatus 100 applies an electron beam e1 onto a target 150 to generate X-rays x1, and includes a permanent magnet lens 120 configured to focus the electron beam e1, a correction coil 130 provided on a side of the electron beam e1 with respect to the permanent magnet lens 120 and configured to correct a focus position formed by the permanent magnet lens 120 in a traveling direction of the electron beam e1, and a target 150 onto which the focused electron beam is applied. Accordingly, the apparatus configuration can be extremely compact and lightweight in comparison with general apparatuses. Furthermore, by the correction coil 130, the intensity of the magnetic field can be finely adjusted and the focus position in the traveling direction of the electron beam e1 can be finely adjusted.
    Type: Grant
    Filed: October 16, 2013
    Date of Patent: October 13, 2015
    Assignee: RIGAKU CORPORATION
    Inventors: Martin Horvarth, Jiri Marsik, Ladislav Pina, Vaclav Jelinek, Naohisa Osaka, Kazuhiko Omote, Makoto Kambe, Licai Jiang, Bonglea Kim
  • Publication number: 20140105367
    Abstract: The X-ray generating apparatus 100 applies an electron beam e1 onto a target 150 to generate X-rays x1, and includes a permanent magnet lens 120 configured to focus the electron beam e1, a correction coil 130 provided on a side of the electron beam e1 with respect to the permanent magnet lens 120 and configured to correct a focus position formed by the permanent magnet lens 120 in a traveling direction of the electron beam e1, and a target 150 onto which the focused electron beam is applied. Accordingly, the apparatus configuration can be extremely compact and lightweight in comparison with general apparatuses. Furthermore, by the correction coil 130, the intensity of the magnetic field can be finely adjusted and the focus position in the traveling direction of the electron beam e1 can be finely adjusted.
    Type: Application
    Filed: October 16, 2013
    Publication date: April 17, 2014
    Applicant: RIGAKU CORPORATION
    Inventors: Martin HORVARTH, Jiri MARSIK, Ladislav PINA, Vaclav JELINEK, Naohisa OSAKA, Kazuhiko OMOTE, Makoto KAMBE, Licai JIANG, Bonglea KIM
  • Patent number: 7651270
    Abstract: A system for x-ray optical alignment. The system includes an x-ray source, an optic, a collimation element, and alignment sensors. The x-ray source generates an x-ray beam that is directed by the optic at a sample. The collimation element is located between the optic and the sample to define the profile of the x-ray beam. The sensors receive the x-ray beam from the optic and generated signal indicative of the system alignment. The sensors may be located on a surface of the collimation element facing the optic. The inner edge of the sensors may be located at equal intervals radially about the collimation element and may form an aperture having a symmetric shape.
    Type: Grant
    Filed: August 31, 2007
    Date of Patent: January 26, 2010
    Assignee: Rigaku Innovative Technologies, Inc.
    Inventor: Bonglea Kim
  • Publication number: 20090060144
    Abstract: A system for x-ray optical alignment. The system includes an x-ray source, an optic, a collimation element, and alignment sensors. The x-ray source generates an x-ray beam that is directed by the optic at a sample. The collimation element is located between the optic and the sample to define the profile of the x-ray beam. The sensors receive the x-ray beam from the optic and generated signal indicative of the system alignment. The sensors may be located on a surface of the collimation element facing the optic. The inner edge of the sensors may be located at equal intervals radially about the collimation element and may form an aperture having a symmetric shape.
    Type: Application
    Filed: August 31, 2007
    Publication date: March 5, 2009
    Inventor: Bonglea Kim
  • Patent number: 6944270
    Abstract: The present invention provides an x-ray source including an electron-generation chamber with an electron beam source that emits electrons and a target chamber with a support structure and a target positioned within the support structure. The emitted electrons travel in a direction substantially parallel to a longitudinal axis extending between the electron-generation chamber and the target chamber towards the target and bombard the target to generate x-rays. The target is movable, while being bombarded with electrons, with respect to the support structure in at least one direction perpendicular to a longitudinal axis.
    Type: Grant
    Filed: February 26, 2004
    Date of Patent: September 13, 2005
    Assignee: Osmic, Inc.
    Inventor: Bonglea Kim
  • Publication number: 20050190887
    Abstract: The present invention provides an x-ray source including an electron-generation chamber with an electron beam source that emits electrons and a target chamber with a support structure and a target positioned within the support structure. The emitted electrons travel in a direction substantially parallel to a longitudinal axis extending between the electron-generation chamber and the target chamber towards the target and bombard the target to generate x-rays. The target is movable, while being bombarded with electrons, with respect to the support structure in at least one direction perpendicular to a longitudinal axis.
    Type: Application
    Filed: February 26, 2004
    Publication date: September 1, 2005
    Inventor: Bonglea Kim
  • Publication number: 20030128811
    Abstract: A modular x-ray lens system for use in directing x-rays comprising a radiation source which generates x-rays and a lens system which directs the x-rays, wherein the x-ray lens system may be configured to focus x-rays to a focal point and vary the intensity of said focal point.
    Type: Application
    Filed: May 14, 2002
    Publication date: July 10, 2003
    Applicant: Osmic, Inc.
    Inventors: Boris Verman, Licai Jiang, Bonglea Kim, Karsten Dan Joensen
  • Patent number: 6389100
    Abstract: A modular x-ray lens system for use in directing x-rays comprising a radiation source which generates x-rays and a lens system which directs the x-rays, wherein the x-ray lens system may be configured to focus x-rays to a focal point and vary the intensity of said focal point.
    Type: Grant
    Filed: April 9, 1999
    Date of Patent: May 14, 2002
    Assignee: Osmic, Inc.
    Inventors: Boris Verman, Licai Jiang, Bonglea Kim, Karsten Dan Joensen
  • Publication number: 20020044626
    Abstract: A modular x-ray lens system for use in directing x-rays comprising a radiation source which generates x-rays and a lens system which directs the x-rays, wherein the x-ray lens system may be configured to focus x-rays to a focal point and vary the intensity of said focal point.
    Type: Application
    Filed: April 9, 1999
    Publication date: April 18, 2002
    Inventors: BORIS VERMAN, LICAI JIANG, BONGLEA KIM, KARSTEN DAN JOENSEN