Patents by Inventor Boo Woo Kim

Boo Woo Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Exposure apparatus
    Patent number: 7190432
    Abstract: Provided is a wafer exposure apparatus used in a semiconductor device manufacturing process, the exposure apparatus including: a reflective mirror for reflecting light provided from a light source; an optical path changer for changing a path of the light provided from the reflective mirror; first mirrors installed at both sides of the optical path changer to change the path of the light; second mirrors installed at both sides of a material to change the path of the light; and third mirrors installed at both sides of a mask to enter the light reflected by the first mirrors to the mask and to enter the light passed through the mask into the second mirrors, whereby it is possible to continuously expose one surface, both surfaces or a specific surface of a wafer in a state that the wafer is once aligned.
    Type: Grant
    Filed: October 13, 2005
    Date of Patent: March 13, 2007
    Assignee: Electronics and Telecommunications Research Institute
    Inventors: Sang Gi Kim, Ju Wook Lee, Jong Moon Park, Seong Wook Yoo, Kun Sik Park, Yong Sun Yoon, Yoon Kyu Bae, Byung Won Lim, Jin Gun Koo, Boo Woo Kim
  • Exposure apparatus
    Publication number: 20060109444
    Abstract: Provided is a wafer exposure apparatus used in a semiconductor device manufacturing process, the exposure apparatus including: a reflective mirror for reflecting light provided from a light source; an optical path changer for changing a path of the light provided from the reflective mirror; first mirrors installed at both sides of the optical path changer to change the path of the light; second mirrors installed at both sides of a material to change the path of the light; and third mirrors installed at both sides of a mask to enter the light reflected by the first mirrors to the mask and to enter the light passed through the mask into the second mirrors, whereby it is possible to continuously expose one surface, both surfaces or a specific surface of a wafer in a state that the wafer is once aligned.
    Type: Application
    Filed: October 13, 2005
    Publication date: May 25, 2006
    Inventors: Sang Gi Kim, Ju Wook Lee, Jong Moon Park, Seong Wook Yoo, Kun Sik Park, Yong Sun Yoon, Yoon Kyu Bae, Byung Won Lim, Jin Gun Koo, Boo Woo Kim