Patents by Inventor Bor Kai Wang

Bor Kai Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20180052263
    Abstract: A louver structure is formed in a layer on a transparent substrate or embedded in the photosensitive substrate to form a privacy filter. The louver structure is made of an alternating arrangement of non-transparent strip elements and transparent strip elements or spaces. The louver structure is created by mask and actinic radiation, which can enable mass production and a short lead-time.
    Type: Application
    Filed: March 2, 2016
    Publication date: February 22, 2018
    Inventors: Hsichieh Chen, Jr-Nan Hu, Yawei Sun, Shoou-yu Tang, Bor Kai Wang
  • Publication number: 20160155696
    Abstract: A method for manufacturing vias in a glass substrate includes bonding, through a bonding layer, a first face of the glass substrate including a plurality of holes to a first face of a glass carrier. The bonding layer has a thickness t between the first face of the glass substrate and the first face of the glass carrier and extends into at least some of the plurality of holes to a depth h from the first face of the glass substrate. The method includes etching back the bonding layer to a depth d through the plurality of holes in the glass substrate. The depth d is less than the sum of the thickness t and the depth h. The method can include filling the plurality of holes with an electrically conductive material, and de-bonding the glass substrate from the bonding layer and the glass carrier.
    Type: Application
    Filed: February 2, 2016
    Publication date: June 2, 2016
    Inventors: Chih-Wei Tsai, Bor Kai Wang
  • Patent number: 9263300
    Abstract: A method for manufacturing vias in a glass substrate includes bonding, through a bonding layer, a first face of the glass substrate including a plurality of holes to a first face of a glass carrier. The bonding layer has a thickness t between the first face of the glass substrate and the first face of the glass carrier and extends into at least some of the plurality of holes to a depth h from the first face of the glass substrate. The method includes etching back the bonding layer to a depth d through the plurality of holes in the glass substrate. The depth d is less than the sum of the thickness t and the depth h. The method can include filling the plurality of holes with an electrically conductive material, and de-bonding the glass substrate from the bonding layer and the glass carrier.
    Type: Grant
    Filed: April 29, 2015
    Date of Patent: February 16, 2016
    Assignee: Corning Incorporated
    Inventors: Chih-Wei Tsai, Bor Kai Wang
  • Publication number: 20150318187
    Abstract: A method for manufacturing vias in a glass substrate includes bonding, through a bonding layer, a first face of the glass substrate including a plurality of holes to a first face of a glass carrier. The bonding layer has a thickness t between the first face of the glass substrate and the first face of the glass carrier and extends into at least some of the plurality of holes to a depth h from the first face of the glass substrate. The method includes etching back the bonding layer to a depth d through the plurality of holes in the glass substrate. The depth d is less than the sum of the thickness t and the depth h. The method can include filling the plurality of holes with an electrically conductive material, and de-bonding the glass substrate from the bonding layer and the glass carrier.
    Type: Application
    Filed: April 29, 2015
    Publication date: November 5, 2015
    Inventors: Chih-Wei Tsai, Bor Kai Wang