Patents by Inventor Bor-Yuan Shew

Bor-Yuan Shew has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9152036
    Abstract: An X-ray mask structure includes a unibody support substrate having at least one thinned portion surrounded by a wall portion, a top layer disposed on the at least one thinned portion of the support substrate, and a plurality of X-ray absorber patterns disposed on the top layer over the at least one thinned portion. The top layer and the at least one thinned portion form a laminated membrane, wherein the at least one thinned portion and the wall portion provide mechanical support for the top layer, and the laminated membrane provides mechanical support for the plurality of X-ray absorber patterns.
    Type: Grant
    Filed: November 15, 2013
    Date of Patent: October 6, 2015
    Assignee: NATIONAL SYNCHROTRON RADIATION RESEARCH CENTER
    Inventor: Bor Yuan Shew
  • Publication number: 20150085974
    Abstract: An X-ray mask structure includes a unibody support substrate having at least one thinned portion surrounded by a wall portion, a top layer disposed on the at least one thinned portion of the support substrate, and a plurality of X-ray absorber patterns disposed on the top layer over the at least one thinned portion. The top layer and the at least one thinned portion form a laminated membrane, wherein the at least one thinned portion and the wall portion provide mechanical support for the top layer, and the laminated membrane provides mechanical support for the plurality of X-ray absorber patterns.
    Type: Application
    Filed: November 15, 2013
    Publication date: March 26, 2015
    Applicant: NATIONAL SYNCHROTRON RADIATION RESEARCH CENTER
    Inventor: Bor Yuan SHEW
  • Patent number: 8168373
    Abstract: A method for fabricating 3D microstructure is disclosed. A matching fluid is arranged between the mask and the photoresist layer. When the mask and photoresist layer perform the relative scanning and exposure process simultaneously, the matching fluid will reduce the diffraction error, so that the gap between the mask and the photoresist layer becomes more tolerable. Besides, the matching fluid also acts as a lubricant for achieving a smooth scanning process, so as to fabricate a high-precision large-area 3D optical microstructure.
    Type: Grant
    Filed: June 11, 2009
    Date of Patent: May 1, 2012
    Assignee: National Synchrotron Radiation Research Center
    Inventor: Bor-Yuan Shew
  • Publication number: 20100285412
    Abstract: A method for fabricating 3D microstructure is disclosed. A matching fluid is arranged between the mask and the photoresist layer. When the mask and photoresist layer perform the relative scanning and exposure process simultaneously, the matching fluid will reduce the diffraction error, so that the gap between the mask and the photoresist layer becomes more tolerable. Besides, the matching fluid also acts as a lubricant for achieving a smooth scanning process, so as to fabricate a high-precision large-area 3D optical microstructure.
    Type: Application
    Filed: June 11, 2009
    Publication date: November 11, 2010
    Inventor: Bor-Yuan SHEW
  • Publication number: 20090205977
    Abstract: A method for detecting a target with a specific marker includes: putting a specimen in a reactor, wherein the specimen contains a target with a specific marker, and the reactor has a plurality of biological probes arranged on the bottom; placing the reactor between a first electrode and a second electrode, wherein the area of the first electrode is different from the area of the second electrode; providing a power to the first electrode and the second electrode to generate an electric field for promoting the target to conjugate with the biological probes; and removing the specimen unconjugated with the biological probes. A system for detecting a target with a specific marker is also disclosed. The above-mentioned method and system is appropriate for massive and parallel detection with simpler operation and lower cost.
    Type: Application
    Filed: April 18, 2008
    Publication date: August 20, 2009
    Inventors: Bor-Yuan Shew, Shih-Jen Liu, Chih-Hsiang Leng