Abstract: A measurement system to determine a deformation of an object having a front surface, a back surface and a pattern. The measurement system includes a processor system and an interferometer system. The interferometer system has a radiation source and a detector system. The source is configured to emit, to each of a plurality of locations on the object, measurement beams in order to generate, at each of the respective plurality of locations, reflected measurement beams off the front and back surfaces of the object respectively. The detector system is configured to receive the respective reflected measurement beams and output signals representative of the received reflected measurement beams to the processor system. The processor system is configured to receive the signals; determine, based on the signals as received, a characteristic of the object; and determine a deformation of the pattern based on the characteristic.

Abstract: A measurement system to determine a deformation of an object having a front surface, a back surface and a pattern. The measurement system includes a processor system and an interferometer system. The interferometer system has a radiation source and a detector system. The source is configured to emit, to each of a plurality of locations on the object, measurement beams in order to generate, at each of the respective plurality of locations, reflected measurement beams off the front and back surfaces of the object respectively. The detector system is configured to receive the respective reflected measurement beams and output signals representative of the received reflected measurement beams to the processor system. The processor system is configured to receive the signals; determine, based on the signals as received, a characteristic of the object; and determine a deformation of the pattern based on the characteristic.

Abstract: A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or more branch radiation beams for provision to one or more tools.

Abstract: A monolithic spectrometer (10) for spectrally resolving light (L), comprises a body (2) of solid material having optical surfaces (3,4,5,6a-6c,8) configured to guide the light (L) along an optical path (E1,E2,E3,E4) inside the body (2). The optical surfaces of the body (2) comprise a segmented focusing surface (6a,6b) comprising first and second continuously functional optical shapes (Ca,Cb) to focus received parts of respective beams (La,Lb) onto respective focal position (fa,fb) in an imaging plane (P) outside the body (2). The second continuously functional optical shape (Cb) is separated from the first continuously functional optical shape (Ca) by an optical discontinuity (Dab) there between.

Abstract: A monolithic spectrometer (10) for spectrally resolving light (L), comprises a body (2) of solid material having optical surfaces (3,4,5,6a-6c,8) configured to guide the light (L) along an optical path (E1,E2,E3,E4) inside the body (2). The optical surfaces of the body (2) comprise a segmented focusing surface (6a,6b) comprising first and second continuously functional optical shapes (Ca,Cb) to focus received parts of respective beams (La,Lb) onto respective focal position (fa,fb) in an imaging plane (P) outside the body (2). The second continuously functional optical shape (Cb) is separated from the first continuously functional optical shape (Ca) by an optical discontinuity (Dab) there between.

Abstract: A method of patterning lithographic substrates, the method comprising using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates, wherein the method further comprises reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly.

Abstract: A radiation alteration device includes a continuously undulating reflective surface, wherein the shape of the continuously undulating reflective surface follows a substantially periodic pattern.

Abstract: A method of patterning lithographic substrates that includes using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates. The method further includes reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly, and applying variable attenuation to EUV radiation that has been output by the free electron laser in order to further control the power of EUV radiation delivered to the lithographic apparatus.

Abstract: A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or more branch radiation beams for provision to one or more tools.

Abstract: A light beam is applied to a front surface of an optical depolarizer. The depolarizer rotates the polarization of light received on different surface positions by different amounts, so that the average incoming polarization is scrambled. The depolarizer has a first and second body that transmit first and second polarization components of the beam with mutually different speeds of light. Each body has two wedge shaped parts of variable thickness, corresponding wedge shaped parts in the two bodies providing light paths of substantially position independent lengths, but with variable rotation of polarization. The wedge shape parts of the front body form a concave input surface for the incoming beam. This prevents cross-over of light between the different wedge shaped parts.

Abstract: A method of patterning lithographic substrates that includes using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates. The method further includes reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly, and applying variable attenuation to EUV radiation that has been output by the free electron laser in order to further control the power of EUV radiation delivered to the lithographic apparatus.

Abstract: An anamorphotic telescope has mutually different magnification along directions of minimum and maximum magnification in an image plane. A spectroscope with an elongated input slit directed along one of the directions of maximum and minimum magnification may be located in the image plane. The anamorphotic telescope has a first and second reflector lens with mutually different first and second radii of curvature in directions (y, x) that optically correspond to directions of minimum and maximum magnification. At least one of the first and second reflector lens has a variable radius of curvature in one direction (x), which varies as a function of position in the other direction (y), the variable radius of curvature decreasing in a direction of the angle from the view direction to the light directed by the first reflector lens to the second reflector lens.

Abstract: A light beam is applied to a front surface of an optical depolarizer. The depolarizer rotates the polarization of light received on different surface positions by different amounts, so that the average incoming polarization is scrambled. The depolarizer has a first and second body that transmit first and second polarization components of the beam with mutually different speeds of light. Each body has two wedge shaped parts of variable thickness, corresponding wedge shaped parts in the two bodies providing light paths of substantially position independent lengths, but with variable rotation of polarization. The wedge shape parts of the front body form a concave input surface for the incoming beam. This prevents cross-over of light between the different wedge shaped parts.

Abstract: The invention concerns an illumination system for use in a stereolithography apparatus, comprising a planar support supporting a two-dimensional array of individually controllable wide-angle light-emitting diodes (LEDs); and a multilens projector array arranged relative to the array, and adapted to project a focused image of the LEDs onto a work area. The multilens projector array is arranged to project light from the LED array having a light emitting edge area image spot size which is smaller than or equal to a light emitting central area image spot size.

Abstract: The invention concerns an illumination system for use in a stereolithography apparatus, comprising: a planar support; a multilens projector array mechanically supported on the planar support over the array on a plano side, and having a work surface arranged to receive a resin applying device for applying a resin layer, the projector array comprising a stack of optical elements, including a plurality of lenslets adapted to project the LEDs onto the work surface, and a two-dimensional array of individually controllable light-emitting diodes (LEDs) arranged between the planar support and the multilens projector. According to an aspect, the planar support and the plano side are supported on contact zones arranged over substantially the entire plano side; the illumination system thus forming a rigid body.

Abstract: Apparatus and methods are used to calibrate an array of individually controllable elements within a lithographic apparatus. A calibration unit can switch between a first state in which the modulated beam of radiation passes into a projection system for projecting the modulated beam of radiation onto a substrate and a second state in which a portion of the modulated beam of radiation is inspected by the calibration unit. The calibration unit generates calibration data, or alternatively, updates calibration data, based on the inspection of the modulated beam of radiation. An array controller uses the calibration data to provide control signals to elements of an array of individually controllable elements, which are subsequently configured in response to the control signals.

Abstract: A sensor for use at substrate level in a high numerical aperture lithographic apparatus, the sensor having a transparent plate that covers a sensing element and includes elements that improve coupling of radiation into the sensing element. The improved coupling elements include a flowing liquid medium disposed between the transparent plate and the sensing element.

Abstract: A grating for EUV-radiation includes a plurality of reflecting lines. Each reflecting line includes a plurality of first reflecting dots, and a plurality of second reflecting dots arranged between each other. The first reflecting dots and the second reflecting dots are configured to reflect EUV-radiation with a mutual phase difference of 180±10 degrees mod 360 degrees.

Abstract: A lens element, for use in a projection system, includes a concave side. The lens element further includes a membrane and a nozzle, the membrane at least covering the concave side of the lens element. The nozzle is arranged for supplying and/or removing a liquid and/or a gas in between the concave side and the membrane.

Abstract: The invention concerns an illumination system for use in a stereolithography apparatus, comprising a planar support supporting a two-dimensional array of individually controllable wide-angle light-emitting diodes (LEDs); and a multilens projector array arranged relative to the array, and adapted to project a focused image of the LEDs onto a work area. The multilens projector array is arranged to project light from the LED array having a light emitting edge area image spot size which is smaller than or equal to a light emitting central area image spot size.