Patents by Inventor Boris Golovanesky
Boris Golovanesky has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7876440Abstract: Disclosed are apparatus and methods for determining overlay between a plurality of first structures in a first layer of a sample and a plurality of second structures in a second layer of the sample. Targets A, B, C and D that each include a portion of the first and second structures are provided. The target A is designed to have an offset Xa between its first and second structures portions; the target B is designed to have an offset Xb between its first and second structures portions; the target C is designed to have an offset Xc between its first and second structures portions; and the target D is designed to have an offset Xd between its first and second structures portions. Each of the offsets Xa, Xb, Xc and Xd is different from zero, and Xa is an opposite sign and differ from Xb.Type: GrantFiled: July 17, 2009Date of Patent: January 25, 2011Assignee: KLA-Tencor Technologies CorporationInventors: Walter D. Mieher, Ady Levy, Boris Golovanesky, Michael Friedmann, Ian Smith, Michael E. Adel, Anatoly Fabrikant
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Publication number: 20090284744Abstract: Disclosed are apparatus and methods for determining overlay between a plurality of first structures in a first layer of a sample and a plurality of second structures in a second layer of the sample. Targets A, B, C and D that each include a portion of the first and second structures are provided. The target A is designed to have an offset Xa between its first and second structures portions; the target B is designed to have an offset Xb between its first and second structures portions; the target C is designed to have an offset Xc between its first and second structures portions; and the target D is designed to have an offset Xd between its first and second structures portions. Each of the offsets Xa, Xb, Xc and Xd is different from zero, and Xa is an opposite sign and differ from Xb. Offset Xc is an opposite sign and differs from Xd. The offsets Xa, Xb, Xc and Xd are selected so that an overlay error, including the respective offset, is within a linear region of overlay values.Type: ApplicationFiled: July 17, 2009Publication date: November 19, 2009Applicant: KLA-TENCOR TECHNOLOGIES CORPORATIONInventors: Walter D. Mieher, Ady Levy, Boris Golovanesky, Michael Friedmann, Ian Smith, Michael E. Adel, Anatoly Fabrikant
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Patent number: 7564557Abstract: Disclosed is a combined scatterometry mark comprising a scatterometry critical dimension (CD) or profile target capable of being measured to determine CD or profile information and a scatterometry overlay target disposed over the scatterometry CD or profile target, the scatterometry overlay target cooperating with the scatterometry CD or profile target to form a scatterometry mark capable of being measured to determine overlay.Type: GrantFiled: October 29, 2007Date of Patent: July 21, 2009Assignee: KLA-Tencor Technologies Corp.Inventors: Walter D. Mieher, Ady Levy, Boris Golovanesky, Michael Friedmann, Ian Smith, Michael E. Adel, Anatoly Fabrikant
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Patent number: 7433040Abstract: Disclosed is a method for determining an overlay error between at least two layers in a multiple layer sample. An imaging optical system is used to measure a plurality of measured optical signals from a plurality of periodic targets on the sample. The targets each have a first structure in a first layer and a second structure in a second layer. There are predefined offsets between the first and second structures. A scatterometry overlay technique is then used to analyze the measured optical signals of the periodic targets and the predefined offsets of the first and second structures of the periodic targets to thereby determine an overlay error between the first and second structures of the periodic targets.Type: GrantFiled: July 30, 2007Date of Patent: October 7, 2008Assignee: KLA-Tencor Technologies Corp.Inventors: Walter D. Mieher, Ady Levy, Boris Golovanesky, Michael Friedmann, Ian Smith, Michael E. Adel, Anatoly Fabrikant, Christopher F. Bevis, Mark Ghinovker
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Patent number: 7385699Abstract: Disclosed is a method for determining an overlay error between at least two layers in a multiple layer sample. An imaging optical system is used to measure a plurality of measured optical signals from a plurality of periodic targets on the sample. The targets each have a first structure in a first layer and a second structure in a second layer. There are predefined offsets between the first and second structures. A scatterometry overlay technique is then used to analyze the measured optical signals of the periodic targets and the predefined offsets of the first and second structures of the periodic targets to thereby determine an overlay error between the first and second structures of the periodic targets.Type: GrantFiled: February 23, 2004Date of Patent: June 10, 2008Assignee: KLA-Tencor Technologies CorporationInventors: Walter D. Mieher, Ady Levy, Boris Golovanesky, Michael Friedmann, Ian Smith, Michael E. Adel, Anatoly Fabrikant, Christopher F. Bevis, Mark Ghinovker
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Patent number: 7379183Abstract: Disclosed is a method of determining an overlay error between two layers of a multiple layer sample. For a plurality of periodic targets that each have a first structure formed from a first layer and a second structure formed from a second layer of the sample, an optical system is employed to thereby measure an optical signal from each of the periodic targets. There are predefined offsets between the first and second structures. An overlay error is determined between the first and second structures by analyzing the measured optical signals from the periodic targets using a scatterometry overlay technique based on the predefined offsets.Type: GrantFiled: February 23, 2004Date of Patent: May 27, 2008Assignee: KLA-Tencor Technologies Corp.Inventors: Walter D. Mieher, Ady Levy, Boris Golovanesky, Michael Friedmann, Ian Smith, Michael E. Adel, Christopher F. Bevis, Paola Dececco, John Fielden, Noah Bareket, Kenneth P. Gross, Mark Ghinovker
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Publication number: 20080094630Abstract: Disclosed are techniques, apparatus, and targets for determining overlay error between two layers of a sample. In one embodiment, a method for determining overlay between a plurality of first structures in a first layer of a sample and a plurality of second structures in a second layer of the sample is disclosed. Targets A, B, C and D that each include a portion of the first and second structures are provided. Target A is designed to have an offset Xa between its first and second structures portions; target B is designed to have an offset Xb between its first and second structures portions; target C is designed to have an offset Xc between its first and second structures portions; and target D is designed to have an offset Xd between its first and second structures portions. Each of the offsets Xa, Xb, Xc and Xd is preferably different from zero; Xa is an opposite sign and differ from Xb; and Xc is an opposite sign and differs from Xd.Type: ApplicationFiled: December 21, 2007Publication date: April 24, 2008Applicant: KLA-Tencor Technologies CorporationInventors: Walter Mieher, Ady Levy, Boris Golovanesky, Michael Friedmann, Ian Smith, Michael Adel, Anatoly Fabrikant, Christopher Bevis, John Fielden, Noah Bareket, Kenneth Gross, Piotr Zalicki, Dan Wack, Paola Dececco, Thaddeus Dziura, Mark Ghinovker
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Publication number: 20080049226Abstract: Disclose is a combined scatterometry mark comprising a scatterometry critical dimension (CD) or profile target capable of being measured to determine CD or profile information and a scatterometry overlay target disposed over the scatterometry CD or profile target, the scatterometry overlay target cooperating with the scatterometry CD or profile target to form a scatterometry mark capable of being measured to determine overlay.Type: ApplicationFiled: October 29, 2007Publication date: February 28, 2008Applicant: KLA-TENCOR TECHNOLOGIES CORPORATIONInventors: Walter Mieher, Ady Levy, Boris Golovanesky, Michael Friedmann, Ian Smith, Michael Adel, Anatoly Fabrikant
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Publication number: 20080024766Abstract: Disclosed is a method for determining an overlay error between at least two layers in a multiple layer sample. An imaging optical system is used to measure a plurality of measured optical signals from a plurality of periodic targets on the sample. The targets each have a first structure in a first layer and a second structure in a second layer. There are predefined offsets between the first and second structures. A scatterometry overlay technique is then used to analyze the measured optical signals of the periodic targets and the predefined offsets of the first and second structures of the periodic targets to thereby determine an overlay error between the first and second structures of the periodic targets.Type: ApplicationFiled: July 30, 2007Publication date: January 31, 2008Inventors: Walter Mieher, Ady Levy, Boris Golovanesky, Michael Friedmann, Ian Smith, Michael Adel, Anatoly Fabrikant, Christopher Bevis, Mark Ghinovker
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Patent number: 7317531Abstract: Disclosed are techniques, apparatus, and targets for determining overlay error between two layers of a sample. In one embodiment, a method for determining overlay between a plurality of first structures in a first layer of a sample and a plurality of second structures in a second layer of the sample is disclosed. Targets A, B, C and D that each include a portion of the first and second structures are provided. Target A is designed to have an offset Xa between its first and second structures portions; target B is designed to have an offset Xb between its first and second structures portions; target C is designed to have an offset Xc between its first and second structures portions; and target D is designed to have an offset Xd between its first and second structures portions. Each of the offsets Xa, Xb, Xc and Xd is preferably different from zero; Xa is an opposite sign and differ from Xb; and Xc is an opposite sign and differs from Xd.Type: GrantFiled: December 5, 2003Date of Patent: January 8, 2008Assignee: KLA-Tencor Technologies CorporationInventors: Walter D. Mieher, Ady Levy, Boris Golovanesky, Michael Friedmann, Ian Smith, Michael Adel, Anatoly Fabrikant, Christopher F. Bevis, John Fielden, Noah Bareket, Kenneth P. Gross, Piotr Zalicki, Dan Wack, Paola Dececco, Thaddeus G. Dziura, Mark Ghinovker
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Patent number: 7301634Abstract: Disclosed is a method of determining an overlay error between two layers of a multiple layer sample. For a plurality of periodic targets that each have a first structure formed from a first layer and a second structure formed from a second layer of the sample, an interferometer is employed to modulate substantially a plurality of wavelengths of a broadband source and then acquiring one or more images of the periodic targets. There are predefined offsets between the first and second structures. An overlay error between the first and second structures is then determined by analyzing the one or more acquired images from the periodic targets using a scatterometry overlay technique based on the predefined offsets.Type: GrantFiled: February 23, 2004Date of Patent: November 27, 2007Assignee: KLA-Tencor Technologies CorporationInventors: Walter D. Mieher, Ady Levy, Boris Golovanesky, Michael Friedmann, Ian Smith, Michael E. Adel, Christopher F. Bevis, John Fielden, Noah Bareket, Anatoly Fabrikant, Mark Ghinovker, Piotr Zalicki, Dan Wack
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Patent number: 7289213Abstract: Disclose is a combined scatterometry mark comprising a scatterometry critical dimension (CD) or profile target capable of being measured to determine CD or profile information and a scatterometry overlay target disposed over the scatterometry CD or profile target, the scatterometry overlay target cooperating with the scatterometry CD or profile target to form a scatterometry mark capable of being measured to determine overlay.Type: GrantFiled: February 23, 2004Date of Patent: October 30, 2007Assignee: KLA-Tencor Technologies CorporationInventors: Walter D. Mieher, Ady Levy, Boris Golovanesky, Michael Friedmann, Ian Smith, Michael E. Adel, Anatoly Fabrikant
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Patent number: 7280212Abstract: Disclosed is a method of determining an overlay error between two layers of a multiple layer sample. For each of a plurality of periodic targets that each have a first structure formed from a first layer and a second structure formed from a second layer of the sample, a first optical signal is measured using a first ellipsometer or a first reflectometer and a second optical signal is measured using a second ellipsometer or a second reflectometer. There are predefined offsets between the first and second structures. An overlay error is determined between the first and second structures by analyzing the measured first and second optical signals from the periodic targets using a scatterometry overlay technique based on the predefined offsets.Type: GrantFiled: February 23, 2004Date of Patent: October 9, 2007Assignee: Kla-Tencor Technologies CorporationInventors: Walter D. Mieher, Ady Levy, Boris Golovanesky, Michael Friedmann, Ian Smith, Michael E. Adel, Mark Ghinovker, John Fielden, Noah Bareket
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Patent number: 7242477Abstract: Disclosed is a method for determining an overlay error between at least two layers in a multiple layer sample. A sample having a plurality of periodic targets that each have a first structure in a first layer and a second structure in a second layer is provided. There are predefined offsets between the first and second structures. Using a scatterometry overlay metrology, scatterometry overlay data is obtained from a first set of the periodic targets based on one or more measured optical signals from the first target set on the sample. Using an imaging overlay metrology, imaging overlay data is obtained from a second set of the periodic targets based on one or more image(s) from the second target set on the sample.Type: GrantFiled: February 23, 2004Date of Patent: July 10, 2007Assignee: KLA-Tencor Technologies CorporationInventors: Walter D. Mieher, Ady Levy, Boris Golovanesky, Michael Friedmann, Ian Smith, Michael E. Adel, Mark Ghinovker, Christopher F. Bevis, Noam Knoll, Moshe Baruch
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Publication number: 20040257571Abstract: Disclosed is a method of determining an overlay error between two layers of a multiple layer sample. For each of a plurality of periodic targets that each have a first structure formed from a first layer and a second structure formed from a second layer of the sample, a first optical signal is measured using a first ellipsometer or a first reflectometer and a second optical signal is measured using a second ellipsometer or a second reflectometer. There are predefined offsets between the first and second structures. An overlay error is determined between the first and second structures by analyzing the measured first and second optical signals from the periodic targets using a scatterometry overlay technique based on the predefined offsets.Type: ApplicationFiled: February 23, 2004Publication date: December 23, 2004Applicant: KLA-Tencor Technologies CorporationInventors: Walter D. Mieher, Ady Levy, Boris Golovanesky, Michael Friedmann, Ian Smith, Michael E. Adel, Mark Ghinovker, John Fielden, Noah Bareket
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Publication number: 20040233444Abstract: Disclosed is a method of determining an overlay error between two layers of a multiple layer sample. For a plurality of periodic targets that each have a first structure formed from a first layer and a second structure formed from a second layer of the sample, an interferometer is employed to modulate substantially a plurality of wavelengths of a broadband source and then acquiring one or more images of the periodic targets. There are predefined offsets between the first and second structures. An overlay error between the first and second structures is then determined by analyzing the one or more acquired images from the periodic targets using a scatterometry overlay technique based on the predefined offsets.Type: ApplicationFiled: February 23, 2004Publication date: November 25, 2004Applicant: KLA-Tencor Technologies CorporationInventors: Walter D. Mieher, Ady Levy, Boris Golovanesky, Michael Friedmann, Ian Smith, Michael E. Adel, Christopher F. Bevis, John Fielden, Noah Bareket, Anatoly Fabrikant, Mark Ghinovker, Piotr Zalicki, Dan Wack
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Publication number: 20040233441Abstract: Disclosed is a method for determining an overlay error between at least two layers in a multiple layer sample. A sample having a plurality of periodic targets that each have a first structure in a first layer and a second structure in a second layer is provided. There are predefined offsets between the first and second structures. Using a scatterometry overlay metrology, scatterometry overlay data is obtained from a first set of the periodic targets based on one or more measured optical signals from the first target set on the sample. Using an imaging overlay metrology, imaging overlay data is obtained from a second set of the periodic targets based on one or more image(s) from the second target set on the sample.Type: ApplicationFiled: February 23, 2004Publication date: November 25, 2004Applicant: KLA-Tencor Technologies CorporationInventors: Walter D. Mieher, Ady Levy, Boris Golovanesky, Michael Friedmann, Ian Smith, Michael E. Adel, Mark Ghinovker, Christopher F. Bevis, Noam Knoll, Moshe Baruch
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Publication number: 20040233440Abstract: Disclosed is a method for determining an overlay error between at least two layers in a multiple layer sample. An imaging optical system is used to measure a plurality of measured optical signals from a plurality of periodic targets on the sample. The targets each have a first structure in a first layer and a second structure in a second layer. There are predefined offsets between the first and second structures. A scatterometry overlay technique is then used to analyze the measured optical signals of the periodic targets and the predefined offsets of the first and second structures of the periodic targets to thereby determine an overlay error between the first and second structures of the periodic targets.Type: ApplicationFiled: February 23, 2004Publication date: November 25, 2004Applicant: KLA-Tencor Technologies CorporationInventors: Walter D. Mieher, Ady Levy, Boris Golovanesky, Michael Friedmann, Ian Smith, Michael E. Adel, Anatoly Fabrikant, Christopher F. Bevis, Mark Ghinovker
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Publication number: 20040233442Abstract: Disclosed is a method of determining an overlay error between two layers of a multiple layer sample. For a plurality of periodic targets that each have a first structure formed from a first layer and a second structure formed from a second layer of the sample, an optical system is employed to thereby measure an optical signal from each of the periodic targets. There are predefined offsets between the first and second structures. An overlay error is determined between the first and second structures by analyzing the measured optical signals from the periodic targets using a scatterometry overlay technique based on the predefined offsets.Type: ApplicationFiled: February 23, 2004Publication date: November 25, 2004Applicant: KLA-Tencor Technologies CorporationInventors: Walter D. Mieher, Ady Levy, Boris Golovanesky, Michael Friedmann, Ian Smith, Michael E. Adel, Christopher F. Bevis, Paola Dececco, John Fielden, Noah Bareket, Kenneth P. Gross, Mark Ghinovker
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Publication number: 20040233443Abstract: Disclose is a combined scatterometry mark comprising a scatterometry critical dimension (CD) or profile target capable of being measured to determine CD or profile information and a scatterometry overlay target disposed over the scatterometry CD or profile target, the scatterometry overlay target cooperating with the scatterometry CD or profile target to form a scatterometry mark capable of being measured to determine overlay.Type: ApplicationFiled: February 23, 2004Publication date: November 25, 2004Applicant: KLA-Tencor Technologies CorporationInventors: Walter D. Mieher, Ady Levy, Boris Golovanesky, Michael Friedmann, Ian Smith, Michael E. Adel, Anatoly Fabrikant