Abstract: The invention relates to a method and a substrate system for the separation of a carrier substrate from a substrate, in particular a product substrate, by irradiation of the separating layer.

Abstract: A measuring device for determining a course of a bonding wave in a gap between a first substrate and a second substrate, and a method for determining a course of a bonding wave in a gap between a first substrate and a second substrate.

Abstract: The invention relates to a device for the transfer of a transfer layer from a substrate, in particular from a growth substrate, to a carrier substrate.

Abstract: A method and a device for the separation of structures from a substrate. Furthermore, the invention relates to a method and a device for transferring structures from a first substrate to a second substrate.

Abstract: The invention relates to a method and a device for the exposure of a photosensitive coating.

Abstract: The invention relates to a device for the transfer of a transfer layer from a substrate, in particular from a growth substrate, to a carrier substrate.

Abstract: A method for the exposure of image points of a photosensitive layer comprising a photosensitive material on a substrate by means of an optical system. The method including continuously moving the image points with respect to the optical system; and controlling a plurality of secondary beams by means of the optical system individually for individual exposures of each image point, whereby the secondary beams are put either into an ON state or into an OFF state, wherein a) secondary beams in the ON state produce an individual exposure of the image point assigned to the respective secondary beam and b) secondary beams in the OFF state do not produce any individual exposure of the image point assigned to the respective secondary beam; wherein, for the generation of image points with grey tones n>1, individual exposures are carried out by different secondary beams with individual doses D.

Abstract: A method for separating a temporarily bonded substrate stack by bombardment of a joining layer of the substrate stack by means of laser beams emitted by a laser, characterised in that laser beams of the laser reflected and/or transmitted at the temporarily bonded substrate stack are detected during the bombardment of the joining layer with the laser beams. The invention also relates to a corresponding device.

Abstract: A method and device for exposing a light-sensitive layer, said method comprising: generating at least one light ray by use of at least one light source, illuminating pixels of an exposure pattern by use of at least one micromirror device having a plurality of micromirrors with respective mirror intensity profiles, and overlaying the mirror intensity profiles of adjacent micromirrors to provide a pattern intensity profile of the exposure pattern by summing the mirror intensity profiles of each illuminated pixel of the exposure pattern.

Abstract: A method and a device for aligning two lenses, wherein the method is directed to aligning first and second optical partial systems of an optical system, which are arranged so as to be located opposite to one another. The method includes the steps of: projecting alignment marks into a first image plane of the first optical partial system, projecting the alignment marks from the first image plane onto a sensitive surface of the second optical partial system, and aligning the optical partial systems relative to one another, such that projections of the alignment marks in a depth of field of the sensitive surface are imaged at ideal positions.

Abstract: A method and apparatus for embossing micro-structures and/or nano-structures. The method includes the steps of providing a structured embossing roll having end faces; coupling a crosslinking radiation into the structured embossing roll which is transparent for the crosslinking radiation, wherein the embossing roll functions as a light guide for the coupled in crosslinking radiation; providing a carrier having an embossing compound applied thereto; contacting the embossing roll with the embossing compound; coupling the crosslinking radiation out of the embossing roll; and curing the embossing compound which has been acted upon by the coupled out crosslinking radiation via the embossing roll.

Abstract: A method for exposing a light-sensitive layer to light using an optical system, wherein at least one light beam is generated by respectively at least one light source and pixels of an exposure pattern grid are illuminated by at least one micro-mirror device with a plurality of micro-mirrors. An affine distortion takes place, in particular a shearing, of the exposure pattern grid.

Abstract: A method and a device for aligning two lenses, wherein the method is directed to aligning first and second optical partial systems of an optical system, which are arranged so as to be located opposite to one another. The method includes the steps of: projecting alignment marks into a first image plane of the first optical partial system, projecting the alignment marks from the first image plane onto a sensitive surface of the second optical partial system, and aligning the optical partial systems relative to one another, such that projections of the alignment marks in a depth of field of the sensitive surface are imaged at ideal positions.

Abstract: A metrology device includes a sound sample holder and an optical system. The sound sample holder is provided for applying sound waves to a first substrate stack surface of the substrate stack. The optical system include a source, a lens field, a beam splitter, and a detector. The source is provided for outputting electromagnetic radiation, which is split into at least one first beam path and one second beam path. The lens field is provided for applying the first beam path to a substrate stack measuring surface of the substrate stack. The beam splitter is provided for forming an interference radiation made up of the first and second beam paths of the electromagnetic radiation. The detector is provided for detecting the interference radiation.

Abstract: A method and device for exposing a light-sensitive layer, said method comprising: generating at least one light ray by use of at least one light source, illuminating pixels of an exposure pattern by use of at least one micromirror device having a plurality of micromirrors with respective mirror intensity profiles, and overlaying the mirror intensity profiles of adjacent micromirrors to provide a pattern intensity profile of the exposure pattern by summing the mirror intensity profiles of each illuminated pixel of the exposure pattern.

Abstract: A method and apparatus for embossing micro-structures and/or nano-structures. The method includes the steps of providing a structured embossing roll having end faces; coupling a crosslinking radiation into the structured embossing roll which is transparent for the crosslinking radiation, wherein the embossing roll functions as a light guide for the coupled in crosslinking radiation; providing a carrier having an embossing compound applied thereto; contacting the embossing roll with the embossing compound; coupling the crosslinking radiation out of the embossing roll; and curing the embossing compound which has been acted upon by the coupled out crosslinking radiation via the embossing roll.

Abstract: A method for exposing a light-sensitive layer to light using an optical system, wherein at least one light beam is generated by respectively at least one light source and pixels of an exposure pattern grid are illuminated by at least one micro-mirror device with a plurality of micro-mirrors. An affine distortion takes place, in particular a shearing, of the exposure pattern grid.

Abstract: A metrology device and method for inspecting a substrate stack. The device includes sound application means for applying sound waves to a first substrate stack surface of the substrate stack, an optical system having a source for outputting electromagnetic radiation, which are split into at least one first beam path and one second beam path, means for loading a substrate stack measuring surface of the substrate stack, with the first beam path, interference means for forming an interference radiation made up of the first and second beam paths, a detector for detecting the interference radiation, and analysing means for analysing the interference radiation detected at the detector.

Abstract: A measuring device for determining a pressure map during application of pressure to at least one measurement layer between a first pressure body and a second pressure body the measuring device comprising: (i) at least one transmitter located on one peripheral edge of the measurement layer for emission of signals in the form of electromagnetic waves along a first signal route which runs through the measurement layer and at least one other signal route which runs through the measurement layer, and (ii) at least one receiver located on the peripheral edge for reception of the signals of the first signal route and other signal route(s), which signals are sent by the transmitter through the measurement layer and can be changed when pressure is applied. Furthermore this invention relates to a corresponding method.

Abstract: Optical coherence tomograph (OCT) probe device (1) comprising an endoscope (6) which is adapted to be coupled to a light source (2) and has a distal tip portion (6.2), the tip portion (6.2) including focussing lens means (11) and a window (5) for directing light to a subject (7) to be scanned, and for receiving light scattered at the subject (7), to send the scattered light back through the endoscope (6) so that it may be applied to a detector (3) together with reference light, said OCT probe device (1) comprising a beam splitter (13; 17) to separate said reference light from the remaining light, as well as a reference light reflector (4; 20) for reflecting the reference light back so that it is composed to the light returned from the subject (7); the beam splitter (13; 17) and the reference light reflector (4; 20) are located in the tip portion (6.2) of the endoscope means (6) behind the focussing lens means (11) through which the composed light is sent back.