Patents by Inventor Boris Simkin

Boris Simkin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Use of overlay diagnostics for enhanced automatic process control
    Patent number: 7310789
    Abstract: Disclosed are apparatus and methods for obtaining and analyzing various unique metrics or “target diagnostics” from one or more semiconductor overlay targets. In one embodiment, an overlay target is measured to obtain one or both of two specific types of target diagnostic information, systematic error metrics and/or random noise metrics. The systematic error metrics generally quantify asymmetries of the overlay target, while the random noise metrics quantify and/or qualify the spatial noise that is proximate to or associated with the overlay target.
    Type: Grant
    Filed: August 24, 2006
    Date of Patent: December 18, 2007
    Assignee: KLA-Tencor Technologies Corporation
    Inventors: Joel L. Seligson, Mark Ghinovker, John Robinson, Pavel Izikson, Michael E. Adel, Boris Simkin, David Tulipman, Vladimir Levinski
  • Use of overlay diagnostics for enhanced automatic process control
    Publication number: 20060280357
    Abstract: Disclosed are apparatus and methods for obtaining and analyzing various unique metrics or “target diagnostics” from one or more semiconductor overlay targets. In one embodiment, an overlay target is measured to obtain one or both of two specific types of target diagnostic information, systematic error metrics and/or random noise metrics. The systematic error metrics generally quantify asymmetries of the overlay target, while the random noise metrics quantify and/or qualify the spatial noise that is proximate to or associated with the overlay target.
    Type: Application
    Filed: August 24, 2006
    Publication date: December 14, 2006
    Inventors: Joel Seligson, Mark Ghinovker, John Robinson, Pavel Izikson, Michael Adel, Boris Simkin, David Tulipman, Vladimir Levinski
  • Use of overlay diagnostics for enhanced automatic process control
    Patent number: 7111256
    Abstract: Disclosed are methods and apparatus for analyzing the quality of overlay targets. In one embodiment, a method of extracting data from an overlay target is disclosed. Initially, image information or one or more intensity signals of the overlay target are provided. An overlay error is obtained from the overlay target by analyzing the image information or the intensity signal(s) of the overlay target. A systematic error metric is also obtained from the overlay target by analyzing the image information or the intensity signal(s) of the overlay target. For example, the systematic error may indicate an asymmetry metric for one or more portions of the overlay target. A noise metric is further obtained from the overlay target by applying a statistical model to the image information or the intensity signal(s) of the overlay target. Noise metric characterizes noise, such as a grainy background, associated with the overlay target.
    Type: Grant
    Filed: May 14, 2003
    Date of Patent: September 19, 2006
    Assignee: KLA-Tencor Technologies Corporation
    Inventors: Joel L. Seligson, Mark Ghinovker, John Robinson, Pavel Izikson, Michael E. Adel, Boris Simkin, David Tulipman, Vladimir Levinski
  • Use of overlay diagnostics for enhanced automatic process control
    Patent number: 6928628
    Abstract: Disclosed are methods and apparatus for analyzing the quality of overlay targets. In one embodiment, a method of extracting data from an overlay target is disclosed. Initially, image information or one or more intensity signals of the overlay target are provided. An overlay error is obtained from the overlay target by analyzing the image information or the intensity signal(s) of the overlay target. A systematic error metric is also obtained from the overlay target by analyzing the image information or the intensity signal(s) of the overlay target. For example, the systematic error may indicate an asymmetry metric for one or more portions of the overlay target. A noise metric is further obtained from the overlay target by applying a statistical model to the image information or the intensity signal(s) of the overlay target. Noise metric characterizes noise, such as a grainy background, associated with the overlay target.
    Type: Grant
    Filed: May 14, 2003
    Date of Patent: August 9, 2005
    Assignee: KLA-Tencor Technologies Corporation
    Inventors: Joel L. Seligson, Mark Ghinovker, John Robinson, Pavel Izikson, Michael E. Adel, Boris Simkin, David Tulipman
  • Use of overlay diagnostics for enhanced automatic process control
    Publication number: 20040040003
    Abstract: Disclosed are methods and apparatus for analyzing the quality of overlay targets. In one embodiment, a method of extracting data from an overlay target is disclosed. Initially, image information or one or more intensity signals of the overlay target are provided. An overlay error is obtained from the overlay target by analyzing the image information or the intensity signal(s) of the overlay target. A systematic error metric is also obtained from the overlay target by analyzing the image information or the intensity signal(s) of the overlay target. For example, the systematic error may indicate an asymmetry metric for one or more portions of the overlay target. A noise metric is further obtained from the overlay target by applying a statistical model to the image information or the intensity signal(s) of the overlay target. Noise metric characterizes noise, such as a grainy background, associated with the overlay target.
    Type: Application
    Filed: May 14, 2003
    Publication date: February 26, 2004
    Applicant: KLA-Tencor Technologies, Corporation
    Inventors: Joel L. Seligson, Mark Ghinovker, John Robinson, Pavel Izikson, Michael E. Adel, Boris Simkin, David Tulipman
  • Use of overlay diagnostics for enhanced automatic process control
    Publication number: 20040038455
    Abstract: Disclosed are methods and apparatus for analyzing the quality of overlay targets. In one embodiment, a method of extracting data from an overlay target is disclosed. Initially, image information or one or more intensity signals of the overlay target are provided. An overlay error is obtained from the overlay target by analyzing the image information or the intensity signal(s) of the overlay target. A systematic error metric is also obtained from the overlay target by analyzing the image information or the intensity signal(s) of the overlay target. For example, the systematic error may indicate an asymmetry metric for one or more portions of the overlay target. A noise metric is further obtained from the overlay target by applying a statistical model to the image information or the intensity signal(s) of the overlay target. Noise metric characterizes noise, such as a grainy background, associated with the overlay target.
    Type: Application
    Filed: May 14, 2003
    Publication date: February 26, 2004
    Applicant: KLA-Tencor Technologies, Corporation
    Inventors: Joel L. Seligson, Mark Ghinovker, John Robinson, Pavel Izikson, Michael E. Adel, Boris Simkin, David Tulipman