Patents by Inventor Boris Verman

Boris Verman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20110268252
    Abstract: An X-ray apparatus that creates a virtual source having a narrow energy bandwidth and enables a high-resolution X-ray diffraction measurement; a method of using the same; and an X-ray irradiation method are provided. An X-ray apparatus 100 includes a spectrometer 105 that focuses a divergent X-ray beam while dispersing it and a selection part 107 that is installed in a condensing position of the condensed X-ray beam for selecting an X-ray beam having a wavelength in a specific range, allowing it to pass through, and creating a virtual source. With this arrangement, it is possible to create a virtual source having a narrow energy bandwidth at a focal point 110 and by means of the virtual source a high-resolution X-ray diffraction measurement is available. By using the X-ray apparatus 100, it is possible to sufficiently separate an X-ray beam having such an extremely narrow energy bandwidth as, for example, K?1 ray from K?2 ray.
    Type: Application
    Filed: June 30, 2010
    Publication date: November 3, 2011
    Applicant: RIGAKU CORPORATION
    Inventors: Tetsuya Ozawa, Ryuji Matsuo, Licai Jiang, Boris Verman, Kazuhiko Omote
  • Publication number: 20110188636
    Abstract: A multi-beam x-ray system includes an x-ray source which emits x-rays and a housing with a first part and a second part. The second part is moveable relative to the first part and includes a plurality of optics of different performance characteristics. Each optic, through the movement of the second part relative to the first part, is positioned to a working position so that the optic receives the x-rays from the x-ray source and directs the x-rays with the desired performance attributes to a desired location.
    Type: Application
    Filed: February 3, 2010
    Publication date: August 4, 2011
    Applicant: Rigaku Innovative Technologies, Inc.
    Inventors: Boris Verman, Michael Young, Licai Jiang
  • Patent number: 7933383
    Abstract: An x-ray generating system includes a source of x-ray radiation, a waveguide bundle optic for collimating the x-ray radiation produced by the source, a focusing optic for focusing the collimated x-ray radiation to a focal point.
    Type: Grant
    Filed: April 10, 2009
    Date of Patent: April 26, 2011
    Assignee: Rigaku Innovative Technologies, Inc.
    Inventors: Boris Verman, Licai Jiang
  • Publication number: 20110085644
    Abstract: An x-ray optical system includes an x-ray source which emits x-rays, a first optical element which conditions the x-rays to form two beams and at least a second optical element which further conditions at least one of the two beams from the first optical element.
    Type: Application
    Filed: October 14, 2009
    Publication date: April 14, 2011
    Applicant: Rigaku Innovative Technology
    Inventors: Boris Verman, Yuriy Platonov, Licai Jiang
  • Publication number: 20090279670
    Abstract: An x-ray generating system includes a source of x-ray radiation, a waveguide bundle optic for collimating the x-ray radiation produced by the source, a focusing optic for focusing the collimated x-ray radiation to a focal point.
    Type: Application
    Filed: April 10, 2009
    Publication date: November 12, 2009
    Inventors: Boris Verman, Licai Jiang
  • Patent number: 7280634
    Abstract: An x-ray beam conditioning system with a first diffractive element and a second diffractive element. The two diffractive elements are arranged in a sequential configuration, and one of the diffractive elements is a crystal. The other diffractive element may be a multilayer optic.
    Type: Grant
    Filed: June 8, 2006
    Date of Patent: October 9, 2007
    Assignee: Osmic, Inc.
    Inventors: Boris Verman, Jimpei Harada
  • Patent number: 7245699
    Abstract: An x-ray optical device includes an optic and an adjustable aperture that selectively occludes a portion of an x-ray beam. The adjustable aperture may be positioned between the optic and a sample and may be integrated with the optic or located in close proximity to the optic. The adjustable aperture enables a user to easily and effectively adjust the convergence of the x-rays. In doing so, the flux and resolution of the x-ray optical device can be optimized by using an optic having the maximum convergence allowed for all potential measurements, and then selecting a convergence for a particular measurement by adjusting the aperture.
    Type: Grant
    Filed: February 26, 2004
    Date of Patent: July 17, 2007
    Assignee: Osmic, Inc.
    Inventors: Boris Verman, Licai Jiang
  • Publication number: 20060239405
    Abstract: An x-ray beam conditioning system with a first diffractive element and a second diffractive element. The two diffractive elements are arranged in a sequential configuration, and one of the diffractive elements is a crystal. The other diffractive element may be a multilayer optic.
    Type: Application
    Filed: June 8, 2006
    Publication date: October 26, 2006
    Inventors: Boris Verman, Jimpei Harada
  • Patent number: 7076026
    Abstract: The present invention provides an x-ray beam conditioning system with a Kirkpatrick-Baez diffractive optic including two optical elements, of which one of the optical elements is a crystal. The elements are arranged in a side-by-side configuration. The crystal can be a perfect crystal. One or both diffractive elements can be mosaic crystals. One element can be a multilayer optic. For example, the multilayer optic can be an elliptical mirror or a parabolic mirror with graded d-spacing. The graded d-spacing can be either lateral grading or depth grading, or both.
    Type: Grant
    Filed: June 10, 2004
    Date of Patent: July 11, 2006
    Assignee: Osmic, Inc.
    Inventors: Boris Verman, Jimpei Harada
  • Publication number: 20050025281
    Abstract: The present invention provides an x-ray beam conditioning system with a Kirkpatrick-Baez diffractive optic including two optical elements, of which one of the optical elements is a crystal. The elements are arranged in a side-by-side configuration. The crystal can be a perfect crystal. One or both diffractive elements can be mosaic crystals. One element can be a multilayer optic. For example, the multilayer optic can be an elliptical mirror or a parabolic mirror with graded d-spacing. The graded d-spacing can be either lateral grading or depth grading, or both.
    Type: Application
    Filed: June 10, 2004
    Publication date: February 3, 2005
    Inventors: Boris Verman, Jimpei Harada
  • Publication number: 20040170250
    Abstract: An x-ray optical device includes an optic and an adjustable aperture that selectively occludes a portion of an x-ray beam. The adjustable aperture may be positioned between the optic and a sample and may be integrated with the optic or located in close proximity to the optic. The adjustable aperture enables a user to easily and effectively adjust the convergence of the x-rays. In doing so, the flux and resolution of the x-ray optical device can be optimized by using an optic having the maximum convergence allowed for all potential measurements, and then selecting a convergence for a particular measurement by adjusting the aperture.
    Type: Application
    Filed: February 26, 2004
    Publication date: September 2, 2004
    Applicant: Osmic, Inc.
    Inventors: Boris Verman, Licai Jiang
  • Patent number: 6643353
    Abstract: An optical element for diffracting x-rays that includes a substrate, a diffraction structure applied to the substrate, the diffraction structure including an exterior surface facing away from the substrate and the diffraction structure capable of diffracting x-rays and a protective layer applied to the exterior surface.
    Type: Grant
    Filed: January 10, 2002
    Date of Patent: November 4, 2003
    Assignee: Osmic, Inc.
    Inventors: Boris Verman, Karsten Joensen, Yuriy Platonov, Srivatsan Seshardi
  • Publication number: 20030128811
    Abstract: A modular x-ray lens system for use in directing x-rays comprising a radiation source which generates x-rays and a lens system which directs the x-rays, wherein the x-ray lens system may be configured to focus x-rays to a focal point and vary the intensity of said focal point.
    Type: Application
    Filed: May 14, 2002
    Publication date: July 10, 2003
    Applicant: Osmic, Inc.
    Inventors: Boris Verman, Licai Jiang, Bonglea Kim, Karsten Dan Joensen
  • Publication number: 20030128810
    Abstract: An optical element for diffracting x-rays that includes a substrate, a diffraction structure applied to the substrate, the diffraction structure including an exterior surface facing away from the substrate and the diffraction structure capable of diffracting x-rays and a protective layer applied to the exterior surface.
    Type: Application
    Filed: January 10, 2002
    Publication date: July 10, 2003
    Applicant: Osmic, Inc.
    Inventors: Boris Verman, Karsten Joensen, Yuriy Platonov, Srivatsan Seshadri
  • Patent number: 6504902
    Abstract: A multilayer mirror 1 that has elliptical reflection faces and provides a divergent angle &dgr; of X-rays, is included. The elliptical reflection faces of the multilayer mirror 1 have two focal points. When an X-ray source 2 is arranged at one focal point A, and X-rays that are diverged from the X-ray source 2 are reflected at the multilayer mirror 1, the reflected X-rays converge on another focal point B. The X-ray source 2 is arranged at one focal point A of the multilayer mirror 1. Additionally, a distance L2 from the center of the reflection faces of the multilayer mirror 1 to another focal point B (in other words, convergent point of reflected X-rays) is set to make a convergent angle &thgr;c of X-rays at the focal point B nearly twice as great as the divergent angle &dgr;. With the above-noted configuration, both small angle resolution and intensity of incident X-rays to a sample may be optimized, and small angle scattering may be performed with high precision.
    Type: Grant
    Filed: April 10, 2001
    Date of Patent: January 7, 2003
    Assignee: Rigaku Corporation
    Inventors: Yoshio Iwasaki, Boris Verman, Licai Jiang
  • Patent number: 6421417
    Abstract: An electromagnetic reflector having a multilayer structure where the electromagnetic reflector is configured to reflect multiple electromagnetic frequencies.
    Type: Grant
    Filed: August 2, 1999
    Date of Patent: July 16, 2002
    Assignee: Osmic, Inc.
    Inventors: Licai Jiang, Boris Verman
  • Publication number: 20020080916
    Abstract: An electromagnetic reflector having a multilayer structure where the electromagnetic reflector is configured to reflect multiple electromagnetic frequencies.
    Type: Application
    Filed: August 2, 1999
    Publication date: June 27, 2002
    Inventors: LICAI JIANG, BORIS VERMAN
  • Patent number: 6389100
    Abstract: A modular x-ray lens system for use in directing x-rays comprising a radiation source which generates x-rays and a lens system which directs the x-rays, wherein the x-ray lens system may be configured to focus x-rays to a focal point and vary the intensity of said focal point.
    Type: Grant
    Filed: April 9, 1999
    Date of Patent: May 14, 2002
    Assignee: Osmic, Inc.
    Inventors: Boris Verman, Licai Jiang, Bonglea Kim, Karsten Dan Joensen
  • Publication number: 20020044626
    Abstract: A modular x-ray lens system for use in directing x-rays comprising a radiation source which generates x-rays and a lens system which directs the x-rays, wherein the x-ray lens system may be configured to focus x-rays to a focal point and vary the intensity of said focal point.
    Type: Application
    Filed: April 9, 1999
    Publication date: April 18, 2002
    Inventors: BORIS VERMAN, LICAI JIANG, BONGLEA KIM, KARSTEN DAN JOENSEN
  • Patent number: 6069934
    Abstract: An x-ray diffractometer system comprising an x-ray optic which directs x-rays, a sample placed into said directed x-rays, wherein said sample diffracts said directed x-rays, creating a diffraction pattern, a translation stage coupled to said sample for moving said sample within said directed x-rays, whereby the resolution, angular range, and intensity of said diffraction pattern may be adjusted, and an x-ray detector for registering said diffraction pattern.
    Type: Grant
    Filed: April 7, 1998
    Date of Patent: May 30, 2000
    Assignee: Osmic, Inc.
    Inventors: Boris Verman, Licai Jiang