Abstract: To clean components in semiconductor manufacturing equipment, such as an optical system or an electron beam system, a component is heated in a chamber. A supercritical fluid formulation is applied to the component in the chamber, which removes molecular and/or particulate contaminants. The supercritical fluid formulation can include one or more of carbon dioxide, water, HCF, alkane, alkene, nitrous oxide, methanol, ethanol, or acetone.

Abstract: To clean components in semiconductor manufacturing equipment, such as an optical system or an electron beam system, a component is heated in a chamber. A supercritical fluid formulation is applied to the component in the chamber, which removes molecular and/or particulate contaminants. The supercritical fluid formulation can include one or more of carbon dioxide, water, HCF, alkane, alkene, nitrous oxide, methanol, ethanol, or acetone.

Abstract: A power supply includes a fuel cell stack, a thermoelectric module and a burner module. The fuel cell stack generates a primary source of electricity and secondary source of heat. The thermoelectric module generates a secondary source of electricity. The burner module is juxtaposed to the fuel cell stack and the thermoelectric module, to provide primary heat to the system and to generate a temperature differential across the thermoelectric module, and to pre-heat a fuel and an oxidant for the fuel cell stack. The burner module is regulated to maintain a given system temperature, or when needed by the thermoelectric generator for secondary power generation.