Patents by Inventor Bradley D. Webb

Bradley D. Webb has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7369914
    Abstract: A computer implemented method is used for determining a product build schedule for sequential fabrication steps. The computer implemented method comprises: receiving a routing of the sequential fabrication steps; assigning a raw process time to a fabrication step in the routing; generating a cycle time for the fabrication step; receiving a start date for the sequential fabrication steps; and computing a projected shipping date for the product.
    Type: Grant
    Filed: July 14, 2006
    Date of Patent: May 6, 2008
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventor: Bradley D. Webb
  • Publication number: 20080015722
    Abstract: A computer implemented method is used for determining a product build schedule for sequential fabrication steps. The computer implemented method comprises: receiving a routing of the sequential fabrication steps; assigning a raw process time to a fabrication step in the routing; generating a cycle time for the fabrication step; receiving a start date for the sequential fabrication steps; and computing a projected shipping date for the product.
    Type: Application
    Filed: July 14, 2006
    Publication date: January 17, 2008
    Inventor: Bradley D. Webb
  • Patent number: 7181826
    Abstract: A system and method are provided for manufacturing a magnetic head. Initially, a coil structure, a first pole layer, and a gap layer are formed. A second pole layer is then deposited to form a pair of flanking portions flanking a central portion of the second pole layer. Thereafter, the second pole layer is masked with a photoresist layer. During manufacture, the flanking portions of the second pole layer work in conjunction with the photoresist layer to substantially protect the coil structure from damage.
    Type: Grant
    Filed: May 10, 2004
    Date of Patent: February 27, 2007
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Wenchein Hsiao, Edward Hin Pong Lee, Bradley D. Webb
  • Patent number: 6906893
    Abstract: A system and method are provided for manufacturing a magnetic head. Initially, a coil structure, a first pole layer, and a gap layer are formed. A second pole layer is then deposited to form a pair of flanking portions flanking a central portion of the second pole layer. Thereafter, the second pole layer is masked with a photoresist layer. During manufacture, the flanking portions of the second pole layer work in conjunction with the photoresist layer to substantially protect the coil structure from damage.
    Type: Grant
    Filed: October 8, 2002
    Date of Patent: June 14, 2005
    Assignee: Hitachi Global Storage Technologies
    Inventors: Wenchein Hsiao, Edward Hin Pong Lee, Bradley D. Webb
  • Publication number: 20040237288
    Abstract: A system and method are provided for manufacturing a magnetic head. Initially, a coil structure, a first pole layer, and a gap layer are formed. A second pole layer is then deposited to form a pair of flanking portions flanking a central portion of the second pole layer. Thereafter, the second pole layer is masked with a photoresist layer. During manufacture, the flanking portions of the second pole layer work in conjunction with the photoresist layer to substantially protect the coil structure from damage.
    Type: Application
    Filed: May 10, 2004
    Publication date: December 2, 2004
    Inventors: Wenchein Hsiao, Edward Hin Pong Lee, Bradley D. Webb
  • Publication number: 20040066577
    Abstract: A system and method are provided for manufacturing a magnetic head. Initially, a coil structure, a first pole layer, and a gap layer are formed. A second pole layer is then deposited to form a pair of flanking portions flanking a central portion of the second pole layer. Thereafter, the second pole layer is masked with a photoresist layer. During manufacture, the flanking portions of the second pole layer work in conjunction with the photoresist layer to substantially protect the coil structure from damage.
    Type: Application
    Filed: October 8, 2002
    Publication date: April 8, 2004
    Applicant: INTERNATIONAL BUSINESS MACHINES
    Inventors: Wenchein Hsiao, Edward Hin Pong Lee, Bradley D. Webb