Abstract: The present invention is directed to an apparatus and method for detecting blockage for a semiconductor fabrication system. The detector is made of a flow detector, interposed in a gaseous flow path between a gas supply and the rest of the system. A flow comparator is coupled to the flow detector, and compares the flow rate of the gas to a baseline flow rate of gas. In this manner, blockages of the system can be detected before a catastrophic failure. In one embodiment, the flow detector is a heating element coupled to a power supply. The heating element heats the gas flowing past it, thus determining the volume or flow of gas. A temperature-measuring device is coupled to the heating element, and the heating element can be selectively enabled in response to a signal from the temperature-measuring device. A power measurement device measures the power used by the heating element. Thus, the duty cycle of the heating element indicates the flow rate of the gas.

Abstract: The present invention is directed to an apparatus and method for cleaning deposited material from a semiconductor fabrication system. The apparatus is made of a heating element flow detector, interposed in a gaseous flow path between a gas supply and the rest of the system. The heating element creates atmospheric conditions in the fabrication system whereby the material deposited on the walls of the system are sublimated. The sublimated material is swept away by a gaseous flow in the system. In this manner, blockages of the system can be ameliorated without cracking the environmental seal on the fabrication device. Additionally, the throughput of the system is enhanced, since the system can be cleaned on a periodic basis, and excess material may be removed more promptly and efficiently. In one embodiment, the sublimator is a heating element coupled to a power supply. The heating element heats the gas flowing past it.