Abstract: A photoresist composition comprising: a first polymer comprising a first repeating unit comprising a hydroxy-aryl group and a second repeating unit comprising an acid-labile group; a second polymer comprising a first repeating unit comprising an acid-labile group, a second repeating unit comprising a lactone group, and a third repeating unit comprising a base-soluble group, wherein the base-soluble group has a pKa of less than or equal to 12, and wherein the base-soluble group does not comprise a hydroxy-substituted aryl group; a photoacid generator; and a solvent, wherein the first polymer and the second polymer are different from each other.

Abstract: An example optical alignment target includes a translucent or transparent substrate having a bottom surface; an opaque material formed over the bottom surface in a pattern; an enclosed channel disposed below the bottom surface; and a fluid suspension contained in the enclosed channel. The pattern has an opaque portion of an opaque material and has a gap portion devoid of the opaque material. The fluid suspension includes a carrier liquid and a light emitting material suspended in the carrier liquid. The light emitting material is selected from the group consisting of quantum dots and cerium powder.

Abstract: In some examples, a structure is contacted with polynucleotides having a variety of lengths and each including first and second adapters. The structure includes a substrate including first and second regions spaced apart from one another by a gap of at least 100 nm, a first set of capture primers coupled to the first region of the substrate, and a second set of capture primers coupled to the second region of the substrate. The first adapter of the polynucleotide is hybridized to a capture primer of the first set of capture primers. Based on that polynucleotide being sufficiently long to bridge the gap, it is amplified using the first and second sets of capture primers. Based upon that polynucleotide being insufficiently long to bridge the gap, it is not amplified. Optionally, a wall may be disposed in the gap.

Abstract: In some examples, a method includes disposing a first hydrogel within a first recess of a substrate and over a pillar. The substrate may include a second recess in which the pillar is disposed, and a wall separating the first recess from the second recess. While the first hydrogel is disposed within the first recess, the pillar may be removed. After removing the pillar, a second hydrogel may be disposed within the second recess. Also provided herein are nonlimiting examples of manners in which recesses, walls, and patterned hydrogels may be formed.

Abstract: In an example method, a positive photoresist is deposited over a substrate that includes depressions separated by interstitial regions. The positive photoresist is exposed to ultraviolet light at an angle that is non-perpendicular, non-parallel, and offset from a surface plane of the depressions such that a first portion of the positive photoresist in each depression remains soluble and a second portion of the positive photoresist in each depression is rendered insoluble. The soluble portions of the positive photoresist are removed, which exposes a first substrate portion in each depression. A first functionalized layer is deposited over the first substrate portion in each depression. The insoluble portions of the positive photoresist are removed, which exposes a second substrate portion in each depression. The second functionalized layer is selectively deposited over the second substrate portion in each depression.

Abstract: A photoresist composition comprises a first polymer comprising a first repeating unit comprising a hydroxy-aryl group and a second repeating unit comprising an acid-labile group, wherein the first polymer does not comprise a lactone group; a second polymer comprising a first repeating unit comprising a hydroxy-aryl group, a second repeating unit comprising an acid-labile group, and a third repeating unit comprising a lactone group; a photoacid generator; and a solvent.

Abstract: A photoresist composition comprising: a first polymer comprising a first repeating unit comprising a hydroxy-aryl group and a second repeating unit comprising an acid-labile group; a second polymer comprising a first repeating unit comprising an acid-labile group, a second repeating unit comprising a lactone group, and a third repeating unit comprising a base-soluble group, wherein the base-soluble group has a pKa of less than or equal to 12, and wherein the base-soluble group does not comprise a hydroxy-substituted aryl group; a photoacid generator; and a solvent, wherein the first polymer and the second polymer are different from each other.

Abstract: A bifunctional linker of general structure A-L-Z is used to covalently bond a bridge molecule to ruthenium electrodes in sensor circuits. The A group comprises a diazonium salt, a diazo group or a carbene precursor such as an imidazolium ring. L is a bivalent tether configured to adjust the spacing of Z from the ruthenium surface and to alter conductivity through the circuit. An end of the bridge molecule to be bonded to ruthenium through the linker is configured with a functional group that participates in a condensation reaction or click-chemistry with the Z group of the bifunctional linker.