Abstract: A photoresist composition comprises a first polymer comprising a first repeating unit comprising a hydroxy-aryl group and a second repeating unit comprising an acid-labile group, wherein the first polymer does not comprise a lactone group; a second polymer comprising a first repeating unit comprising a hydroxy-aryl group, a second repeating unit comprising an acid-labile group, and a third repeating unit comprising a lactone group; a photoacid generator; and a solvent.

Abstract: A photoresist composition comprising: a first polymer comprising a first repeating unit comprising a hydroxy-aryl group and a second repeating unit comprising an acid-labile group; a second polymer comprising a first repeating unit comprising an acid-labile group, a second repeating unit comprising a lactone group, and a third repeating unit comprising a base-soluble group, wherein the base-soluble group has a pKa of less than or equal to 12, and wherein the base-soluble group does not comprise a hydroxy-substituted aryl group; a photoacid generator; and a solvent, wherein the first polymer and the second polymer are different from each other.

Abstract: A bifunctional linker of general structure A-L-Z is used to covalently bond a bridge molecule to ruthenium electrodes in sensor circuits. The A group comprises a diazonium salt, a diazo group or a carbene precursor such as an imidazolium ring. L is a bivalent tether configured to adjust the spacing of Z from the ruthenium surface and to alter conductivity through the circuit. An end of the bridge molecule to be bonded to ruthenium through the linker is configured with a functional group that participates in a condensation reaction or click-chemistry with the Z group of the bifunctional linker.