Patents by Inventor Brenda Faye Ross

Brenda Faye Ross has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Composition for titanium nitride hard mask and etch residue removal
    Patent number: 9472420
    Abstract: Aqueous compositions for stripping titanium nitride (TiN or TiNxOy) hard mask and removing etch residue are low pH aqueous composition comprising solvent, a weakly coordinating anion, amine, and at least two non-oxidizing trace metal ions. The aqueous compositions contain no non-ambient oxidizer, and are exposed to air. Bifluoride, or metal corrosion inhibitor may be added to the aqueous composition. Systems and processes use the aqueous compositions for stripping titanium nitride (TiN or TiNxOy) hard mask and removing titanium nitride (TiN or TiNxOy) etch residue.
    Type: Grant
    Filed: November 19, 2014
    Date of Patent: October 18, 2016
    Assignee: Air Products and Chemicals, Inc.
    Inventors: William Jack Casteel, Jr., Seiji Inaoka, Madhukar Bhaskara Rao, Brenda Faye Ross, Yi-Chia Lee, Wen Dar Liu, Tianniu Chen
  • Composition for Titanium Nitride Hard Mask and Etch Residue Removal
    Publication number: 20150175943
    Abstract: Aqueous compositions for stripping titanium nitride(TiN or TiNxOy) hard mask and removing etch residue are low pH aqueous composition comprising solvent, a weakly coordinating anion, amine, and at least two non-oxidizing trace metal ions. The aqueous compositions contain no non-ambient oxidizer, and are exposed to air. Bifluoride, or metal corrosion inhibitor may be added to the aqueous composition. Systems and processes use the aqueous compositions for stripping titanium nitride(TiN or TiNxOy) hard mask and removing titanium nitride(TiN or TiNxOy) etch residue.
    Type: Application
    Filed: November 19, 2014
    Publication date: June 25, 2015
    Applicant: AIR PRODUCTS AND CHEMICALS, INC.
    Inventors: William Jack Casteel, JR., Seiji Inaoka, Madhukar Bhaskara Rao, Brenda Faye Ross, Yi-Chia Lee, Wen Dar Liu, Tianniu Chen
  • Process solutions containing surfactants used as post-chemical mechanical planarization treatment
    Patent number: 7452426
    Abstract: Process solutions comprising one or more surfactants are used to reduce the number of defects in the manufacture of semiconductor devices. In certain preferred embodiments, the process solution of the present invention may reduce defects when employed as a rinse solution either during or after the development of the CMP processing. Also disclosed is a method for reducing the number of defects on a plurality of post-CMP processed substrates employing the process solution of the present invention.
    Type: Grant
    Filed: September 12, 2006
    Date of Patent: November 18, 2008
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Peng Zhang, Brenda Faye Ross
  • Acetylenic diol ethylene oxide/propylene oxide adducts and processes for their manufacture
    Patent number: 7348300
    Abstract: Disclosed herein are process solutions, which may be aqueous-based, non-aqueous-based, and combinations thereof, that contain at least one alkoxylated acetylenic diol surfactant. In one aspect, the process solution comprises water and an alkoxylated acetylenic diol surfactant having the formula A: where r and t are 1 or 2, (n+m) is 1 to 30 and (p+q) is 1 to 30.
    Type: Grant
    Filed: February 1, 2005
    Date of Patent: March 25, 2008
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Kevin Rodney Lassila, Paula Ann Uhrin, Peng Zhang, Danielle Megan King Curzi, Leslie Cox Barber, Brenda Faye Ross
  • Process solutions containing surfactants used as post-chemical mechanical planarization treatment
    Patent number: 7208049
    Abstract: Process solutions comprising one or more surfactants are used to reduce the number of defects in the manufacture of semiconductor devices. In certain preferred embodiments, the process solution of the present invention may reduce defects when employed as a rinse solution either during or after the development of the CMP processing. Also disclosed is a method for reducing the number of defects on a plurality of post-CMP processed substrates employing the process solution of the present invention.
    Type: Grant
    Filed: October 20, 2003
    Date of Patent: April 24, 2007
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Peng Zhang, Brenda Faye Ross