Abstract: A method (100), an apparatus (1100), and a computer program product are disclosed for generating alignment marks. A basis pattern (120) and a high frequency component (130) are combined (140). The basis pattern is defined such that a scaled and rotated version of the basis pattern correlated with the basis pattern is substantially equal to the auto-correlation of the basis pattern within a complex multiplicative constant. The high frequency component is of sufficient energy for cross correlation without detriment to the basis pattern. The basis pattern may be generated from a basis function, which may be a logarithmic radial harmonic function (LRHF). The combination is output as at least one alignment mark having an increased maximum frequency. The method (100) may further comprise printing the at least one alignment mark on a print medium.

Abstract: A method (100), an apparatus (1100), and a computer program product are disclosed for generating alignment marks. A basis pattern (120) and a high frequency component (130) are combined (140). The basis pattern is defined such that a scaled and rotated version of the basis pattern correlated with the basis pattern is substantially equal to the auto-correlation of the basis pattern within a complex multiplicative constant. The high frequency component is of sufficient energy for cross correlation without detriment to the basis pattern. The basis pattern may be generated from a basis function, which may be a logarithmic radial harmonic function (LRHF). The combination is output as at least one alignment mark having an increased maximum frequency. The method (100) may further comprise printing the at least one alignment mark on a print medium.