Abstract: Polishing media in the form of bristles made from a porous polymer-based material, apparatus and systems including the media, and methods of forming and using the media, apparatus, and systems are disclosed. A method of manufacturing bristles for use in polishing a workpiece which includes a non-planar surface includes the steps of combining a liquid polymer material and a foaming agent to form a foamed polymeric material, and separating the foamed polymeric material into a plurality of bristles. The foaming agent is configured to impart a porosity to the polymeric material, where the porosity is characterized by a density in the range of 0.3 to 1.2 g/cm3.

Abstract: Polishing media in the form of bristles made from a porous, non-porous, or minimally porous polymer-based material, apparatus and systems including the media, and methods of forming and using the media, apparatus, and systems are disclosed. An exemplary method of manufacturing bristles for use in polishing a workpiece which includes a non-planar surface includes the steps of combining a liquid polymer comprising a TDI polyester pre-polymer having an NCO content in the range of 5% with a curative to form a polymeric material, separating the foamed polymeric material into a plurality of bristles, and stitching the bristles onto a platen.

Abstract: Polishing media in the form of bristles made from a porous polymer-based material, apparatus and systems including the media, and methods of forming and using the media, apparatus, and systems are disclosed. A method of manufacturing bristles for use in polishing a workpiece which includes a non-planar surface includes the steps of combining a liquid polymer material and a foaming agent to form a foamed polymeric material, and separating the foamed polymeric material into a plurality of bristles. The foaming agent is configured to impart a porosity to the polymeric material, where the porosity is characterized by a density in the range of 0.3 to 1.2 g/cm3.

Abstract: A polymeric material suitable for use in lapping processes, media including the polymeric material, systems including the media, and methods of forming and using the polymeric material are disclosed. The polymeric material can be used to lap hard surfaces, such as sapphire surfaces. The lapping process can be performed after a grinding process and before a polishing process.

Abstract: Polishing materials suitable for polishing hard surfaces, media including the polishing material, and methods of forming and using the polishing materials and media are disclosed. Exemplary polishing materials have a relatively high hard segments:soft segments ratio and exhibit relatively high removal rates and/or relatively high process yields.

Abstract: A polymeric material suitable for use in lapping processes, media including the polymeric material, systems including the media, and methods of forming and using the polymeric material are disclosed. The polymeric material can be used to lap hard surfaces, such as sapphire surfaces. The lapping process can be performed after a grinding process and before a polishing process.

Abstract: A polishing pad, for polishing of a work piece having portions that are non-planar, the polishing pad comprising a first side and a second side of the polishing pad. The first side is substantially flat, and the second side is configured to polish the non-planar work piece. The polishing pad further comprises a concentric annular channel in the polishing pad, wherein the concentric annular channel comprises a channel surface, wherein the second side of the polishing pad comprises an inner surface, the channel surface, and an outer surface, and wherein the channel surface is recessed relative to the inner surface and outer surface. The polishing pad further comprises a plurality of islands located within the concentric annular channel, wherein the islands comprise an island surface that is raised relative to the channel surface.

Abstract: Polishing materials suitable for polishing hard surfaces, media including the polishing material, and methods of forming and using the polishing materials and media are disclosed. Exemplary polishing materials have a relatively high hard segments:soft segments ratio and exhibit relatively high removal rates and/or relatively high process yields.

Abstract: A polishing pad, for polishing of a work piece having portions that are non-planar, the polishing pad comprising a first side and a second side of the polishing pad. The first side is substantially flat, and the second side is configured to polish the non-planar work piece. The polishing pad further comprises a concentric annular channel in the polishing pad, wherein the concentric annular channel comprises a channel surface, wherein the second side of the polishing pad comprises an inner surface, the channel surface, and an outer surface, and wherein the channel surface is recessed relative to the inner surface and outer surface. The polishing pad further comprises a plurality of islands located within the concentric annular channel, wherein the islands comprise an island surface that is raised relative to the channel surface.